Katsuyoshi Endo

2.6k total citations
124 papers, 1.9k citations indexed

About

Katsuyoshi Endo is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Materials Chemistry. According to data from OpenAlex, Katsuyoshi Endo has authored 124 papers receiving a total of 1.9k indexed citations (citations by other indexed papers that have themselves been cited), including 54 papers in Electrical and Electronic Engineering, 53 papers in Biomedical Engineering and 39 papers in Materials Chemistry. Recurrent topics in Katsuyoshi Endo's work include Advanced Surface Polishing Techniques (38 papers), Diamond and Carbon-based Materials Research (24 papers) and Semiconductor materials and devices (21 papers). Katsuyoshi Endo is often cited by papers focused on Advanced Surface Polishing Techniques (38 papers), Diamond and Carbon-based Materials Research (24 papers) and Semiconductor materials and devices (21 papers). Katsuyoshi Endo collaborates with scholars based in Japan, United States and Tunisia. Katsuyoshi Endo's co-authors include Kazuya Yamamura, Hui Deng, Yuzo Mori, Kazuto Yamauchi, Yuji Ohkubo, Yasuhisa Sano, Hidekazu Mimura, Kenji Tamasaku, Tetsuya Ishikawa and Makina Yabashi and has published in prestigious journals such as Physical review. B, Condensed matter, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Katsuyoshi Endo

108 papers receiving 1.9k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Katsuyoshi Endo Japan 25 822 787 669 450 281 124 1.9k
Conal E. Murray United States 20 427 0.5× 1.6k 2.0× 1.1k 1.7× 277 0.6× 212 0.8× 104 2.6k
T. Osipowicz Singapore 25 414 0.5× 1.8k 2.2× 1.0k 1.5× 267 0.6× 110 0.4× 191 2.7k
B. C. Larson United States 20 231 0.3× 548 0.7× 1.3k 1.9× 271 0.6× 507 1.8× 51 2.2k
Kenta Arima Japan 27 1.1k 1.3× 1.1k 1.4× 1.0k 1.6× 96 0.2× 228 0.8× 130 2.0k
Patrice Gergaud France 23 401 0.5× 1.0k 1.3× 819 1.2× 130 0.3× 231 0.8× 194 1.9k
M. Menyhárd Hungary 23 202 0.2× 902 1.1× 861 1.3× 270 0.6× 413 1.5× 165 2.0k
G. Möbus United Kingdom 22 297 0.4× 313 0.4× 637 1.0× 105 0.2× 169 0.6× 88 1.3k
Jingtao Zhu China 21 270 0.3× 449 0.6× 402 0.6× 227 0.5× 87 0.3× 114 1.2k
Geoffrey H. Campbell United States 23 276 0.3× 314 0.4× 938 1.4× 111 0.2× 634 2.3× 73 1.9k
S. Okayama Japan 8 204 0.2× 633 0.8× 432 0.6× 141 0.3× 101 0.4× 27 1.3k

Countries citing papers authored by Katsuyoshi Endo

Since Specialization
Citations

This map shows the geographic impact of Katsuyoshi Endo's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Katsuyoshi Endo with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Katsuyoshi Endo more than expected).

Fields of papers citing papers by Katsuyoshi Endo

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Katsuyoshi Endo. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Katsuyoshi Endo. The network helps show where Katsuyoshi Endo may publish in the future.

Co-authorship network of co-authors of Katsuyoshi Endo

This figure shows the co-authorship network connecting the top 25 collaborators of Katsuyoshi Endo. A scholar is included among the top collaborators of Katsuyoshi Endo based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Katsuyoshi Endo. Katsuyoshi Endo is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Ohkubo, Yuji, Katsuyoshi Endo, & Kazuya Yamamura. (2018). Adhesive-free adhesion between heat-assisted plasma-treated fluoropolymers (PTFE, PFA) and plasma-jet-treated polydimethylsiloxane (PDMS) and its application. Scientific Reports. 8(1). 18058–18058. 62 indexed citations
2.
Arima, Kenta, Katsuyoshi Endo, Kazuto Yamauchi, et al.. (2011). Mechanism of atomic-scale passivation and flattening of semiconductor surfaces by wet-chemical preparations. Journal of Physics Condensed Matter. 23(39). 394202–394202. 5 indexed citations
3.
Hattori, Azusa N., Takeshi Okamoto, Junji Murata, et al.. (2010). Formation of wide and atomically flat graphene layers on ultraprecision-figured 4H-SiC(0001) surfaces. Surface Science. 605(5-6). 597–605. 22 indexed citations
4.
Yamamura, Kazuya, et al.. (2006). Improvement of Thickness Uniformity of Quartz Crystal Wafer by Numerically Controlled Plasma CVM. Seimitsu kougakkaishi rombunshuu/Seimitsu kougakkaishi/Seimitsu Kougakkaishi rombunshuu. 72(7). 934–938. 1 indexed citations
5.
Morita, Kenichi, Hidekazu Goto, Kazuto Yamauchi, Katsuyoshi Endo, & Yuzo Mori. (2006). Development of Cleaning Method Using High-Speed Shear Flow of Ultrapure Water. Seimitsu kougakkaishi rombunshuu/Seimitsu kougakkaishi/Seimitsu Kougakkaishi rombunshuu. 72(1). 89–94.
6.
Yumoto, Hirokatsu, Hidekazu Mimura, Satoshi Matsuyama, et al.. (2005). Fabrication of Ultraprecisely Figured Elliptical Mirror for Nano-Focusing of Hard X-ray and Evaluation of Focusing Properties. Seimitsu kougakkaishi rombunshuu/Seimitsu kougakkaishi/Seimitsu Kougakkaishi rombunshuu. 71(9). 1137–1140. 1 indexed citations
7.
Yamamura, Kazuya, et al.. (2005). Improvement of Thickness Uniformity of Quartz Wafer by Numerically Controlled Plasma CVM. Seimitsu kougakkaishi rombunshuu/Seimitsu kougakkaishi/Seimitsu Kougakkaishi rombunshuu. 71(4). 455–459.
8.
Mori, Yuzo, Kazuto Yamauchi, Hidekazu Mimura, et al.. (2004). Flattening Si (001) surface by EEM (Elastic Emission Machining). Seimitsu kougakkaishi rombunshuu/Seimitsu kougakkaishi/Seimitsu Kougakkaishi rombunshuu. 70(3). 391–396. 1 indexed citations
9.
Kataoka, Toshihiko, et al.. (2002). Measurement of Ultra Fine Defects on the Si Wafer Surface Using a Laser Light Scattering Method.. Journal of the Japan Society for Precision Engineering. 68(10). 1337–1341. 1 indexed citations
10.
Kataoka, Toshihiko, et al.. (2002). Inspection of Ultra Fine Particles on the Si Wafer Surface Using a Laser Light Scattering Method.. Journal of the Japan Society for Precision Engineering. 68(2). 264–268. 1 indexed citations
11.
Sasaki, Satoshi, et al.. (2002). Measurement of Nanodefects on Si Wafer Surface Using System for Measuring Particle Diameter by Light-Scattering Method.. Journal of the Japan Society for Precision Engineering. 68(9). 1200–1205.
12.
Sasaki, Satoshi, et al.. (2001). Measurement of Nano-fine Particles on Si Wafer Surface by Laser Light Scattering Method.. Journal of the Japan Society for Precision Engineering. 67(11). 1818–1823. 1 indexed citations
13.
Kataoka, Toshihiko, et al.. (2000). Light Scattering by Small particles and Small Defects on the Silicon Wafer Surface. Calculations of Scattering Light Intensity and Optical Image through a Lens.. Journal of the Japan Society for Precision Engineering. 66(11). 1716–1722. 2 indexed citations
14.
Toyota, Hiromichi, et al.. (2000). . Journal of the Japan Society for Precision Engineering. 66(12). 1906–1910. 2 indexed citations
15.
Sasaki, Satoshi, Yuzo Mori, Toshiyuki Kataoka, et al.. (1999). Designing a New Apparatus for Measuring Particle Sizer of Nanometer Order by Light-Scattering. (5th Report). Evaluation of the Surface by Measuring Particles on a Si Wafer before and after Cleaning.. Journal of the Japan Society for Precision Engineering. 65(10). 1435–1439.
16.
Yamauchi, Kazuto, Toshihiko Kataoka, Katsuyoshi Endo, et al.. (1998). A Study on EEM(Elastic Emission Machining) - Influences of Dissolved Oxygen to Si Wafer Surface.. Journal of the Japan Society for Precision Engineering. 64(6). 907–912. 1 indexed citations
17.
Kataoka, Toshihiko, et al.. (1997). Measurement of Ultra Fine Particles on the Si Wafer Surface Using a Laser Light Scattering Method.. Journal of the Japan Society for Precision Engineering. 63(8). 1117–1121. 1 indexed citations
18.
Mori, Yuzo, et al.. (1996). Designing a New Apparatus for Measuring Particle Sizes of Nanometer Order by Light-scattering (4th Report). Journal of the Japan Society for Precision Engineering. 62(8). 1198–1202.
19.
Mori, Yuzo, Toshihiko Kataoka, Katsuyoshi Endo, et al.. (1995). Thickness and Strain Measurement of Native Oxide on Si Surface by Photo-reflectance Spectra.. Journal of the Japan Society for Precision Engineering. 61(3). 396–400. 1 indexed citations
20.
Goto, Hidekazu, Yuzo Mori, Kikuji Hirose, et al.. (1987). CO2 laser-induced surface oxidation and etching of Si and Si3N4.. Journal of the Japan Society for Precision Engineering. 53(11). 1765–1771. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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