K. Joshi

1.3k total citations
36 papers, 951 citations indexed

About

K. Joshi is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electrochemistry. According to data from OpenAlex, K. Joshi has authored 36 papers receiving a total of 951 indexed citations (citations by other indexed papers that have themselves been cited), including 27 papers in Electrical and Electronic Engineering, 6 papers in Atomic and Molecular Physics, and Optics and 5 papers in Electrochemistry. Recurrent topics in K. Joshi's work include Semiconductor materials and devices (22 papers), Advancements in Semiconductor Devices and Circuit Design (21 papers) and Integrated Circuits and Semiconductor Failure Analysis (15 papers). K. Joshi is often cited by papers focused on Semiconductor materials and devices (22 papers), Advancements in Semiconductor Devices and Circuit Design (21 papers) and Integrated Circuits and Semiconductor Failure Analysis (15 papers). K. Joshi collaborates with scholars based in India, United States and Taiwan. K. Joshi's co-authors include Souvik Mahapatra, Subhadeep Mukhopadhyay, Nilesh Goel, B. E. Conway, H. P. Dhar, Muhammad A. Alam, Roger Parsons, Ankit Jain, Ahmad E. Islam and Sujay B. Desai and has published in prestigious journals such as Electrochimica Acta, IEEE Transactions on Electron Devices and Journal of Applied Polymer Science.

In The Last Decade

K. Joshi

36 papers receiving 908 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
K. Joshi India	13	672	139	107	95	85	36	951
C. Törnkvist Sweden	12	428 0.6×	479 3.4×	73 0.7×	69 0.7×	122 1.4×	26	680
Marek Przasnyski Poland	6	365 0.5×	205 1.5×	150 1.4×	273 2.9×	65 0.8×	9	650
E. Levart France	14	179 0.3×	57 0.4×	38 0.4×	273 2.9×	57 0.7×	33	433
K. Chandrasekaran Singapore	15	357 0.5×	108 0.8×	44 0.4×	49 0.5×	45 0.5×	51	587
A.P. Lehnen United States	7	164 0.2×	159 1.1×	59 0.6×	106 1.1×	43 0.5×	9	381
Mark B. Jensen United States	12	70 0.1×	172 1.2×	78 0.7×	65 0.7×	63 0.7×	21	378
Tibor Erdey-Grúz Hungary	3	87 0.1×	98 0.7×	71 0.7×	53 0.6×	128 1.5×	5	431
E Honig Netherlands	11	107 0.2×	82 0.6×	114 1.1×	47 0.5×	97 1.1×	22	440
S. J. O’Shea Singapore	13	353 0.5×	133 1.0×	344 3.2×	22 0.2×	301 3.5×	28	715

Countries citing papers authored by K. Joshi

Since Specialization

Citations

This map shows the geographic impact of K. Joshi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by K. Joshi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites K. Joshi more than expected).

Fields of papers citing papers by K. Joshi

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by K. Joshi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by K. Joshi. The network helps show where K. Joshi may publish in the future.

Co-authorship network of co-authors of K. Joshi

This figure shows the co-authorship network connecting the top 25 collaborators of K. Joshi. A scholar is included among the top collaborators of K. Joshi based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with K. Joshi. K. Joshi is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Joshi, K., et al.. (2018). Study of dynamic TDDB in scaled FinFET technologies. P–GD.5. 8 indexed citations

Liao, P. J., et al.. (2017). Circuit-based reliability consideration in FinFET technology. 1–7. 5 indexed citations

Liao, P. J., et al.. (2017). Study of junction degradation and lifetime assessment in FinFETs. 49. 2B–1.1. 3 indexed citations

Chang, S. W., et al.. (2017). SILC degradation model to predict area scaling for gate dielectric breakdown in advanced technologies. 3C–2.1. 3 indexed citations

Liao, P. J., et al.. (2016). Study of oxygen vacancy in high-k gate dielectric by charge injection technique. 4B–3. 1 indexed citations

Ho, Tung‐Yuan, et al.. (2016). Time dependent junction degradation in FinFET. 1. 21–23. 2 indexed citations

Mahapatra, Souvik, Nilesh Goel, Sujay B. Desai, et al.. (2013). A Comparative Study of Different Physics-Based NBTI Models. IEEE Transactions on Electron Devices. 60(3). 901–916. 223 indexed citations

Desai, Sujay B., et al.. (2013). A comprehensive AC / DC NBTI model: Stress, recovery, frequency, duty cycle and process dependence. XT.2.1–XT.2.11. 37 indexed citations

Yang, Jiaqi, K. Joshi, Subhadeep Mukhopadhyay, et al.. (2012). Intrinsic correlation between PBTI and TDDB degradations in nMOS HK/MG dielectrics. 5D.4.1–5D.4.7. 25 indexed citations

10.

Joshi, K., Subhadeep Mukhopadhyay, Nilesh Goel, & Souvik Mahapatra. (2012). A consistent physical framework for N and P BTI in HKMG MOSFETs. 5A.3.1–5A.3.10. 84 indexed citations

11.

Joshi, K., Shih‐Ya Hung, Subhadeep Mukhopadhyay, et al.. (2012). Scaled Gate Stacks for Sub-20-nm CMOS Logic Applications Through Integration of Thermal IL and ALD HfOx. IEEE Electron Device Letters. 34(1). 3–5. 9 indexed citations

12.

Mahapatra, Souvik, Nilesh Goel, & K. Joshi. (2012). A physics based model for NBTI in p-MOSFETs. 8. 1–4. 3 indexed citations

13.

Mahapatra, Souvik, Ahmad E. Islam, S. Deora, et al.. (2011). A critical re-evaluation of the usefulness of R-D framework in predicting NBTI stress and recovery. 6A.3.1–6A.3.10. 85 indexed citations

14.

Mahapatra, Souvik, Ahmad E. Islam, S. Deora, et al.. (2011). Characterization and modeling of NBTI stress, recovery, material dependence and AC degradation using R-D framework. 1–7. 7 indexed citations

15.

Joshi, K., et al.. (1995). Ceric-Induced Grafting of Acrylonitrile onto Sodium Salt of Partially Carboxymethylated Starch. Journal of Macromolecular Science Part A. 32(1). 133–146. 3 indexed citations

16.

Dhar, H. P., B. E. Conway, & K. Joshi. (1974). ChemInform Abstract: ON THE FORM OF ADSORPTION ISOTHERMS FOR SUBSTITUTIONAL ADSORPTION OF MOLECULES OF DIFFERENT SIZES. Chemischer Informationsdienst. 5(2). 1 indexed citations

17.

Joshi, K., et al.. (1974). Adsorption of Ortho-, Meta- and Para-toluidines from KI solution. Journal of Electroanalytical Chemistry. 54(2). 371–378. 2 indexed citations

18.

Joshi, K., et al.. (1965). Studies on cation‐exchange membrane. II. Sorption of electrolyte by rubber‐based cation‐exchange membrane from CNSL resin. Journal of Applied Polymer Science. 9(3). 941–946. 1 indexed citations

19.

Joshi, K., et al.. (1964). Studies on cation exchange membranes. I. Effect of porosity on the rate of exchange in rubber-based cation exchange membranes from CNSL resin. Journal of Applied Polymer Science. 8(3). 1491–1496. 4 indexed citations

20.

Joshi, K. & Roger Parsons. (1961). The diffuse double layer in mixed electrolytes. Electrochimica Acta. 4(2-4). 129–140. 73 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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