Jae Seok Hur

747 total citations
24 papers, 553 citations indexed

About

Jae Seok Hur is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Jae Seok Hur has authored 24 papers receiving a total of 553 indexed citations (citations by other indexed papers that have themselves been cited), including 23 papers in Electrical and Electronic Engineering, 17 papers in Materials Chemistry and 8 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Jae Seok Hur's work include Thin-Film Transistor Technologies (17 papers), ZnO doping and properties (15 papers) and Semiconductor materials and devices (14 papers). Jae Seok Hur is often cited by papers focused on Thin-Film Transistor Technologies (17 papers), ZnO doping and properties (15 papers) and Semiconductor materials and devices (14 papers). Jae Seok Hur collaborates with scholars based in South Korea and United States. Jae Seok Hur's co-authors include Jae Kyeong Jeong, Taikyu Kim, Min Hee Cho, Cheol Hee Choi, Bong Jin Kuh, Min Jae Kim, Yongsung Kim, Sang‐Wook Kim, Daewon Ha and Jun Hyung Lim and has published in prestigious journals such as Advanced Materials, Advanced Functional Materials and ACS Applied Materials & Interfaces.

In The Last Decade

Jae Seok Hur

24 papers receiving 548 citations

Peers

Jae Seok Hur
Peixiong Gao China
Deepak Kumar Jarwal India
Hyun-Mo Lee South Korea
Takaaki Miyasako Japan
Yahui Duan China
Young Bum Yoo South Korea
Zidong Guo China
Guodong Xia China
Seonghwan Hong South Korea
Xiang Xiao China
Peixiong Gao China
Jae Seok Hur
Citations per year, relative to Jae Seok Hur Jae Seok Hur (= 1×) peers Peixiong Gao

Countries citing papers authored by Jae Seok Hur

Since Specialization
Citations

This map shows the geographic impact of Jae Seok Hur's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jae Seok Hur with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jae Seok Hur more than expected).

Fields of papers citing papers by Jae Seok Hur

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jae Seok Hur. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jae Seok Hur. The network helps show where Jae Seok Hur may publish in the future.

Co-authorship network of co-authors of Jae Seok Hur

This figure shows the co-authorship network connecting the top 25 collaborators of Jae Seok Hur. A scholar is included among the top collaborators of Jae Seok Hur based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jae Seok Hur. Jae Seok Hur is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Hur, Jae Seok, et al.. (2025). Design of an Atomic Layer-Deposited In2O3/Ga2O3 Channel Structure for High-Performance Thin-Film Transistors. ACS Applied Materials & Interfaces. 17(4). 6541–6549. 3 indexed citations
2.
Hur, Jae Seok, Sungsoo Lee, Ji‐Won Moon, et al.. (2024). Oxide and 2D TMD semiconductors for 3D DRAM cell transistors. Nanoscale Horizons. 9(6). 934–945. 10 indexed citations
3.
Choi, Cheol Hee, et al.. (2024). Advances in n-type crystalline oxide channel layers for thin-film transistors: materials, fabrication techniques, and device performance. Journal of Physics D Applied Physics. 58(1). 13001–13001. 7 indexed citations
4.
Hur, Jae Seok, et al.. (2024). (Invited) Advancements in High-Performance Metal-Oxide TFTs Via Atomic-Layer Deposition: A Path Towards Next-Gen Display and Memory Technology. ECS Meeting Abstracts. MA2024-02(34). 2400–2400. 1 indexed citations
5.
6.
Cho, Jaehun, Min Jae Kim, Jae Seok Hur, et al.. (2024). Tailoring Subthreshold Swing in A‐IGZO Thin‐Film Transistors for Amoled Displays: Impact of Conversion Mechanism on Peald Deposition Sequences. Small Methods. 8(8). e2301185–e2301185. 10 indexed citations
7.
Kim, Min Jae, Jae Seok Hur, Cheol Hee Choi, et al.. (2024). Growth of Highly‐Ordered‐Crystalline Indium‐Gallium‐Oxide Thin‐Film via Plasma‐Enhanced ALD for High Performance Top‐Gate Field‐Effect Transistors. Small Methods. 9(7). e2402070–e2402070. 3 indexed citations
8.
Hur, Jae Seok, et al.. (2023). P‐154: Late‐News Poster: High‐Performance Indium‐Gallium Oxide Thin‐Film‐Transistors via Plasma‐Enhanced Atomic‐Layer‐Deposition. SID Symposium Digest of Technical Papers. 54(1). 1826–1828. 1 indexed citations
9.
10.
Lee, Ho Young, Jae Seok Hur, Cheol Hee Choi, et al.. (2023). Comparative Study on Indium Precursors for Plasma-Enhanced Atomic Layer Deposition of In2O3 and Application to High-Performance Field-Effect Transistors. ACS Applied Materials & Interfaces. 15(44). 51399–51410. 25 indexed citations
11.
Xu, Hongwei, Hee‐Sung Han, Jae Seok Hur, et al.. (2023). Low-power driven broadband phototransistor with a PbS/IGO/HfO2 stack. Journal of Materials Chemistry C. 11(4). 1569–1578. 6 indexed citations
12.
Cho, Min Hoe, Cheol Hee Choi, Min Jae Kim, et al.. (2023). High-Performance Indium-Based Oxide Transistors with Multiple Channels Through Nanolaminate Structure Fabricated by Plasma-Enhanced Atomic Layer Deposition. ACS Applied Materials & Interfaces. 15(15). 19137–19151. 31 indexed citations
13.
Kim, Taikyu, et al.. (2023). High Mobility IZTO Thin‐Film Transistors Based on Spinel Phase Formation at Low Temperature through a Catalytic Chemical Reaction. Small Methods. 7(7). e2201522–e2201522. 28 indexed citations
14.
Kim, Taikyu, Cheol Hee Choi, Jae Seok Hur, et al.. (2022). Progress, Challenges, and Opportunities in Oxide Semiconductor Devices: A Key Building Block for Applications Ranging from Display Backplanes to 3D Integrated Semiconductor Chips. Advanced Materials. 35(43). e2204663–e2204663. 155 indexed citations
15.
Xu, Hongwei, Taikyu Kim, Min Jae Kim, et al.. (2022). High-Performance Broadband Phototransistor Based on TeOx/IGTO Heterojunctions. ACS Applied Materials & Interfaces. 14(2). 3008–3017. 14 indexed citations
16.
Hur, Jae Seok, Min Jae Kim, Seung Hee Lee, et al.. (2022). High-Performance Thin-Film Transistor with Atomic Layer Deposition (ALD)-Derived Indium–Gallium Oxide Channel for Back-End-of-Line Compatible Transistor Applications: Cation Combinatorial Approach. ACS Applied Materials & Interfaces. 14(43). 48857–48867. 51 indexed citations
17.
Cho, Jae Hoon, et al.. (2022). Improvement in carrier mobility through band-gap engineering in atomic-layer-deposited In-Ga-Zn-O stacks. Journal of Alloys and Compounds. 903. 163876–163876. 28 indexed citations
18.
Choi, Cheol Hee, Taikyu Kim, Jae Seok Hur, et al.. (2022). Hydrogen-Doping-Enabled Boosting of the Carrier Mobility and Stability in Amorphous IGZTO Transistors. ACS Applied Materials & Interfaces. 14(51). 57016–57027. 26 indexed citations
19.
Jung, Jae Min, et al.. (2021). Acrylate-based nanocomposite zirconium-dispersed polymer dielectric for flexible oxide thin-film transistors with a curvature radius of 2 mm. Organic Electronics. 98. 106302–106302. 6 indexed citations
20.
Hur, Jae Seok, et al.. (2019). Stretchable Polymer Gate Dielectric by Ultraviolet-Assisted Hafnium Oxide Doping at Low Temperature for High-Performance Indium Gallium Tin Oxide Transistors. ACS Applied Materials & Interfaces. 11(24). 21675–21685. 45 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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