Guoshun Pan

1.5k total citations
41 papers, 1.3k citations indexed

About

Guoshun Pan is a scholar working on Biomedical Engineering, Materials Chemistry and Electrical and Electronic Engineering. According to data from OpenAlex, Guoshun Pan has authored 41 papers receiving a total of 1.3k indexed citations (citations by other indexed papers that have themselves been cited), including 35 papers in Biomedical Engineering, 24 papers in Materials Chemistry and 14 papers in Electrical and Electronic Engineering. Recurrent topics in Guoshun Pan's work include Advanced Surface Polishing Techniques (33 papers), Diamond and Carbon-based Materials Research (20 papers) and Advanced machining processes and optimization (12 papers). Guoshun Pan is often cited by papers focused on Advanced Surface Polishing Techniques (33 papers), Diamond and Carbon-based Materials Research (20 papers) and Advanced machining processes and optimization (12 papers). Guoshun Pan collaborates with scholars based in China, Australia and United States. Guoshun Pan's co-authors include Hua Gong, Xiao‐Lei Shi, Chunli Zou, Yan Zhou, Jianbin Luo, Li Xu, Guihai Luo, Xinchun Lu, Dan Guo and Yan Zhou and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Langmuir.

In The Last Decade

Guoshun Pan

40 papers receiving 1.2k citations

Peers

Guoshun Pan
Hua Gong China
Y.C. Liu Singapore
Fredrik Östlund Switzerland
Keesam Shin South Korea
Rassin Grantab United States
D. Sporn Germany
Hua Gong China
Guoshun Pan
Citations per year, relative to Guoshun Pan Guoshun Pan (= 1×) peers Hua Gong

Countries citing papers authored by Guoshun Pan

Since Specialization
Citations

This map shows the geographic impact of Guoshun Pan's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Guoshun Pan with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Guoshun Pan more than expected).

Fields of papers citing papers by Guoshun Pan

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Guoshun Pan. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Guoshun Pan. The network helps show where Guoshun Pan may publish in the future.

Co-authorship network of co-authors of Guoshun Pan

This figure shows the co-authorship network connecting the top 25 collaborators of Guoshun Pan. A scholar is included among the top collaborators of Guoshun Pan based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Guoshun Pan. Guoshun Pan is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Chen, Gaopan, et al.. (2024). In-situ investigation into the atomic-scale removal behavior of gallium nitride. Applied Surface Science. 679. 161266–161266. 1 indexed citations
2.
Chen, Gaopan, et al.. (2023). Particles Manipulation to Improve Removal Efficiency of Fused Silica in Chemical Mechanical Polishing. Silicon. 15(16). 6997–7004. 3 indexed citations
3.
Gao, Bin, et al.. (2021). Picosecond Laser-Assisted Chemical Mechanical Polishing (CMP): Aiming at the Si-Face of Single-Crystal 6H-SiC Wafer. ECS Journal of Solid State Science and Technology. 10(4). 44008–44008. 20 indexed citations
4.
Zhang, Xin, Guoshun Pan, Weiqi Wang, & Dan Guo. (2019). Polishing behavior of PS/SiO2 Core-Shell nanoparticles with different shell thickness on fused silica Chemical Mechanical Polishing. IOP Conference Series Materials Science and Engineering. 563(2). 22048–22048. 4 indexed citations
5.
Zhou, Yan, et al.. (2019). Characteristics of Slurry Recycling in Chemical Mechanical Polishing (CMP) of Fused Silica (FS). ECS Journal of Solid State Science and Technology. 8(3). P196–P201. 5 indexed citations
6.
Zhou, Yan, et al.. (2018). Study on Pad Performance Deterioration in Chemical Mechanical Polishing (CMP) of Fused Silica. ECS Journal of Solid State Science and Technology. 7(6). P295–P298. 13 indexed citations
8.
Wang, Rongrong, Dan Guo, Guoxin Xie, & Guoshun Pan. (2016). Atomic Step Formation on Sapphire Surface in Ultra-precision Manufacturing. Scientific Reports. 6(1). 29964–29964. 26 indexed citations
9.
Shi, Xiao‐Lei, Chunli Zou, Guoshun Pan, et al.. (2016). Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with S2O82−-Fe2+ based slurry. Tribology International. 110. 441–450. 53 indexed citations
10.
Chen, Hao, et al.. (2016). Mechanical model of nanoparticles for material removal in chemical mechanical polishing process. Friction. 4(2). 153–164. 43 indexed citations
11.
Guo, Dan, et al.. (2015). In situ observation of colloidal particle behavior between two planar surfaces. Colloids and Surfaces A Physicochemical and Engineering Aspects. 482. 656–661. 15 indexed citations
12.
Zhou, Yan, Guoshun Pan, Xiao‐Lei Shi, et al.. (2015). AFM and XPS studies on material removal mechanism of sapphire wafer during chemical mechanical polishing (CMP). Journal of Materials Science Materials in Electronics. 26(12). 9921–9928. 35 indexed citations
13.
Shi, Xiao‐Lei, Guoshun Pan, Yan Zhou, et al.. (2014). Characterization of colloidal silica abrasives with different sizes and their chemical–mechanical polishing performance on 4H-SiC (0001). Applied Surface Science. 307. 414–427. 91 indexed citations
15.
Shi, Xiao‐Lei, Guoshun Pan, Yan Zhou, Chunli Zou, & Hua Gong. (2013). Extended study of the atomic step-terrace structure on hexagonal SiC (0001) by chemical-mechanical planarization. Applied Surface Science. 284. 195–206. 49 indexed citations
16.
Gong, Hua, Guoshun Pan, Zhonghua Gu, Chunli Zou, & Yan Liu. (2013). Effect of Modified Silica Abrasive Particles on Nanosized Particle Deposition in Final Polishing of Silicon Wafers. Tribology Transactions. 57(2). 366–372. 9 indexed citations
17.
Guo, Dan, et al.. (2011). Probing Particle Movement in CMP with Fluorescence Technique. Journal of The Electrochemical Society. 158(6). H681–H685. 14 indexed citations
18.
Xu, Wenhu, Xinchun Lu, Guoshun Pan, Yuanzhong Lei, & Jianbin Luo. (2010). Ultrasonic flexural vibration assisted chemical mechanical polishing for sapphire substrate. Applied Surface Science. 256(12). 3936–3940. 84 indexed citations
19.
Xu, Wenhu, Xinchun Lu, Guoshun Pan, Yuanzhong Lei, & Jianbin Luo. (2010). Effects of the ultrasonic flexural vibration on the interaction between the abrasive particles; pad and sapphire substrate during chemical mechanical polishing (CMP). Applied Surface Science. 257(7). 2905–2911. 67 indexed citations
20.
Xu, Jun, et al.. (2005). Nano-deformation of a Ni–P coating surface after nanoparticle impacts. Applied Surface Science. 252(16). 5846–5854. 8 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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