E. Rije

458 citations

12 papers · 370 indexed · h-index 9

Electrical and Electronic Engineering
- Semiconductor materials and devices 7
- Ferroelectric and Negative Capacitance Devices 4
- Silicon and Solar Cell Technologies 3
Atomic and Molecular Physics, and Optics
- Semiconductor materials and interfaces 4
Materials Chemistry
- Electronic and Structural Properties of Oxides 4
- Ferroelectric and Piezoelectric Materials 3
Electronic, Optical and Magnetic Materials
- Copper Interconnects and Reliability 2
Biomedical Engineering
- Advanced Sensor and Energy Harvesting Materials 3

Co-authors: S. Mantl U. Breuer St. Lenk Qing‐Tai Zhao Rainer Waser M. Roeckerath J. Schubert Stephen Ducharme
Cited by: Electrical and Electronic Engineering Atomic and Molecular Physics, and Optics Materials Chemistry
Journals: Applied Physics Letters (4 papers)Journal of The Electrochemical Society (2 papers)Journal of Applied Physics (2 papers)
Partner nations: Germany Belgium United States

In The Last Decade

E. Rije

12 papers receiving 353 citations

Peers

Countries citing papers authored by E. Rije

Since Specialization

Citations

This map shows the geographic impact of E. Rije's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by E. Rije with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites E. Rije more than expected).

Fields of papers citing papers by E. Rije

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by E. Rije. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by E. Rije. The network helps show where E. Rije may publish in the future.

Co-authorship network

The 25 scholars most cited alongside E. Rije, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with E. Rije Line = papers co-authored together E. Rije links everyone, so they are left out of the graph.

All Works

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12 of 12 papers shown

#	Work
1	Ferroelectric field effect transistors using very thin ferroelectric polyvinylidene fluoride copolymer films as gate dielectrics Journal of Applied Physics ·Andreas Gerber,Малкин Артем Юрьевич,Rainer Waser,Timothy J. Reece,E. Rije,Stephen Ducharme,H. Kohlstedt	2010	24
2	Photoconductivity of Hf-based binary metal oxides Microelectronic Engineering ·S. Shamuilia,H. Seshadri,A. Stesmans,Ezikwa Tenas Godswill,Stephen A. Campbell,Mohamed Boutchich,J. M. J. Lopes,M. Roeckerath,T. Heeg,E. Rije,S. Mantl	2008	2
3	Fast Polarization Switching and Influence of Platinum Electrodes in Ultrathin Langmuir Films of Poly(Vinylidene Fluoride-Trifluoroethylene) Ferroelectrics ·Tibor Klestenitz,E. Rije	2008	2
4	Thin Films of HfO[sub 2] for High-k Gate Oxide Applications from Engineered Alkoxide- and Amide-Based MOCVD Precursors Journal of The Electrochemical Society ·Reji Thomas,E. Rije,P. Ehrhart,A.P. Milanov,R. Bhakta,Ali Motamedi,Anjana Devi,Roland A. Fischer,Rainer Waser	2007	20
5	Liquid Injection MOCVD of Dysprosium Scandate Films Journal of The Electrochemical Society ·Reji Thomas,P. Ehrhart,M. Roeckerath,Sven Van Elshocht,E. Rije,M. Luysberg,Markus Boese,J. Schubert,Matty Caymax,Rainer Waser	2007	27
6	Amorphous lanthanum lutetium oxide thin films as an alternative high-κ gate dielectric Applied Physics Letters ·J. M. J. Lopes,M. Roeckerath,T. Heeg,E. Rije,J. Schubert,S. Mantl,V. V. Afanas’ev,S. Shamuilia,A. Stesmans,Yufei Jia,Darrell G. Schlom	2006	71
7	Dysprosium scandate thin films as an alternate amorphous gate oxide prepared by metal-organic chemical vapor deposition Applied Physics Letters ·Reji Thomas,P. Ehrhart,M. Luysberg,Markus Boese,Rainer Waser,M. Roeckerath,E. Rije,J. Schubert,Sven Van Elshocht,Matty Caymax	2006	39
8	Low-voltage operation of metal-ferroelectric-insulator-semiconductor diodes incorporating a ferroelectric polyvinylidene fluoride copolymer Langmuir-Blodgett film Journal of Applied Physics ·Andreas Gerber,H. Kohlstedt,Малкин Артем Юрьевич,Rainer Waser,Timothy J. Reece,Stephen Ducharme,E. Rije	2006	45
9	Surface characterisation and interface studies of high-k materials by XPS and TOF-SIMS Applied Surface Science ·Astrid Besmehn,A. Schöll,E. Rije,U. Breuer	2005	11
10	Tuning of NiSi∕Si Schottky barrier heights by sulfur segregation during Ni silicidation Applied Physics Letters ·Qing‐Tai Zhao,U. Breuer,E. Rije,St. Lenk,S. Mantl	2005	114
11	Tuning of silicide Schottky barrier heights by segregation of sulfur atoms Qing‐Tai Zhao,E. Rije,U. Breuer,St. Lenk,S. Mantl	2004	11
12	Full silicidation process for making CoSi2 on SiO2 Applied Physics Letters ·Qing‐Tai Zhao,E. Rije,St. Lenk,H.L. Bay,S. Mantl	2004	4

About E. Rije

E. Rije is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials and Polymers and Plastics, having authored 12 papers that have together received 370 indexed citations. Recurring topics across this work include Semiconductor materials and devices (7 papers), Semiconductor materials and interfaces (4 papers), Ferroelectric and Negative Capacitance Devices (4 papers), Electronic and Structural Properties of Oxides (4 papers), Silicon and Solar Cell Technologies (3 papers), Advanced Sensor and Energy Harvesting Materials (3 papers), Ferroelectric and Piezoelectric Materials (3 papers) and Copper Interconnects and Reliability (2 papers). The work is most often cited by research in Electrical and Electronic Engineering (312 citations), Atomic and Molecular Physics, and Optics (127 citations), Materials Chemistry (165 citations), Electronic, Optical and Magnetic Materials (39 citations) and Biomedical Engineering (75 citations). E. Rije has collaborated with scholars based in Germany, Belgium and United States. Frequent co-authors include S. Mantl, U. Breuer, St. Lenk, Qing‐Tai Zhao, Rainer Waser, M. Roeckerath, J. Schubert, Stephen Ducharme, Timothy J. Reece and Andreas Gerber. Their work appears in journals such as Applied Physics Letters, Journal of The Electrochemical Society, Journal of Applied Physics, Microelectronic Engineering and Applied Surface Science.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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