D.S. Macintyre

1.1k total citations
45 papers, 848 citations indexed

About

D.S. Macintyre is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, D.S. Macintyre has authored 45 papers receiving a total of 848 indexed citations (citations by other indexed papers that have themselves been cited), including 41 papers in Electrical and Electronic Engineering, 20 papers in Biomedical Engineering and 14 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in D.S. Macintyre's work include Advancements in Photolithography Techniques (18 papers), Semiconductor materials and devices (18 papers) and Nanofabrication and Lithography Techniques (13 papers). D.S. Macintyre is often cited by papers focused on Advancements in Photolithography Techniques (18 papers), Semiconductor materials and devices (18 papers) and Nanofabrication and Lithography Techniques (13 papers). D.S. Macintyre collaborates with scholars based in United Kingdom, United States and Italy. D.S. Macintyre's co-authors include S. Thoms, Marc Sorel, R.M. De La Rue, M. Gnan, Iain Thayne, Haiping Zhou, David A. J. Moran, B. Casey, Richard J. Hill and Xu Li and has published in prestigious journals such as Nano Letters, Journal of Applied Physics and Optics Letters.

In The Last Decade

D.S. Macintyre

44 papers receiving 821 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
D.S. Macintyre United Kingdom 16 686 355 312 125 77 45 848
M. Tortonese United States 12 485 0.7× 831 2.3× 311 1.0× 72 0.6× 50 0.6× 14 967
Mariusz Graczyk Sweden 13 451 0.7× 214 0.6× 524 1.7× 119 1.0× 67 0.9× 33 680
L. Manin-Ferlazzo France 6 446 0.7× 301 0.8× 577 1.8× 181 1.4× 140 1.8× 9 938
Vladimir A. Bolaños Quiñones Germany 14 389 0.6× 327 0.9× 362 1.2× 47 0.4× 35 0.5× 18 733
Veronica Savu Switzerland 15 369 0.5× 173 0.5× 485 1.6× 127 1.0× 55 0.7× 42 683
M. Ishida Japan 15 368 0.5× 400 1.1× 266 0.9× 264 2.1× 93 1.2× 29 881
Arvind Sharma India 18 600 0.9× 325 0.9× 238 0.8× 213 1.7× 34 0.4× 58 834
P. Hudek Germany 14 548 0.8× 333 0.9× 341 1.1× 86 0.7× 108 1.4× 89 779
M A F van den Boogaart Switzerland 16 344 0.5× 229 0.6× 442 1.4× 140 1.1× 44 0.6× 35 643
Mark A. Wendman United States 8 242 0.4× 493 1.4× 226 0.7× 87 0.7× 16 0.2× 10 628

Countries citing papers authored by D.S. Macintyre

Since Specialization
Citations

This map shows the geographic impact of D.S. Macintyre's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D.S. Macintyre with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D.S. Macintyre more than expected).

Fields of papers citing papers by D.S. Macintyre

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D.S. Macintyre. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D.S. Macintyre. The network helps show where D.S. Macintyre may publish in the future.

Co-authorship network of co-authors of D.S. Macintyre

This figure shows the co-authorship network connecting the top 25 collaborators of D.S. Macintyre. A scholar is included among the top collaborators of D.S. Macintyre based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with D.S. Macintyre. D.S. Macintyre is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Li, X., S. W. Chang, T. Vasen, et al.. (2016). InAs FinFETs With Hfinnm Fabricated Using a Top–Down Etch Process. IEEE Electron Device Letters. 37(3). 261–264. 19 indexed citations
2.
Strain, Michael J., S. Thoms, D.S. Macintyre, & Marc Sorel. (2014). Multi-wavelength filters in silicon using superposition sidewall Bragg grating devices. Optics Letters. 39(2). 413–413. 33 indexed citations
3.
Khokhar, Ali Z., I. M. Watson, Faiz Rahman, et al.. (2011). Emission characteristics of photonic crystal light-emitting diodes. Applied Optics. 50(19). 3233–3233. 5 indexed citations
4.
Holland, M., Xu Li, Gary W. Paterson, et al.. (2011). Electron Mobility in Surface- and Buried-Channel Flatband $\hbox{In}_{0.53}\hbox{Ga}_{0.47}\hbox{As}$ MOSFETs With ALD $\hbox{Al}_{2}\hbox{O}_{3}$ Gate Dielectric. IEEE Electron Device Letters. 32(4). 494–496. 34 indexed citations
5.
Martyniuk, Mariusz, Richard H. Sewell, Gilberto A. Umana‐Membreno, et al.. (2011). Electrical type conversion of p-type HgCdTe induced by nanoimprinting. Journal of Applied Physics. 109(9). 2 indexed citations
6.
Macintyre, D.S. & S. Thoms. (2011). Comparison of hydrogen silsesquioxane development methods for sub-10 nm electron beam lithography using accurate linewidth inspection. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 29(6). 06F307–06F307. 2 indexed citations
7.
Rue, R.M. De La, Basudev Lahiri, Antonio Samarelli, et al.. (2010). Micro-/nano-photonic device structures applied to communications, sensing and consumer optoelectronics. ENLIGHTEN (Jurnal Bimbingan dan Konseling Islam). 1–3. 1 indexed citations
8.
Thoms, S. & D.S. Macintyre. (2010). Linewidth metrology for sub-10-nm lithography. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 28(6). C6H6–C6H10. 4 indexed citations
9.
Hill, Richard J., X. Li, Haiping Zhou, et al.. (2009). Deep sub-micron and self-aligned flatband III–V MOSFETs. ENLIGHTEN (Jurnal Bimbingan dan Konseling Islam). 44. 251–252. 1 indexed citations
10.
Gnan, M., S. Thoms, D.S. Macintyre, R.M. De La Rue, & Marc Sorel. (2008). Fabrication of low-loss photonic wires in silicon-on-insulator using hydrogen silsesquioxane electron-beam resist. Electronics Letters. 44(2). 115–116. 151 indexed citations
11.
Gnan, M., et al.. (2007). Effect of lithography stitching errors on Silicon-on-Insulator photonic wires. 1–1. 1 indexed citations
12.
Macintyre, D.S., Ian Young, Andrew Glidle, et al.. (2006). High resolution e-beam lithography using a thin titanium layer to promote resist adhesion. Microelectronic Engineering. 83(4-9). 1128–1131. 12 indexed citations
13.
Macintyre, D.S. & S. Thoms. (2006). Nanometre scale overlay and stitch metrology using an optical microscope. Microelectronic Engineering. 83(4-9). 1051–1054. 3 indexed citations
14.
Cao, Xiehong, D.S. Macintyre, S. Thoms, et al.. (2005). Low damage sputter deposition of tungsten for decanano compound semiconductor transistors. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(6). 3138–3142. 2 indexed citations
15.
Thoms, S., D.S. Macintyre, David A. J. Moran, & Iain Thayne. (2004). Imprint lithography issues in the fabrication of high electron mobility transistors. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(6). 3271–3274. 3 indexed citations
16.
Macintyre, D.S., Xiehong Cao, David A. J. Moran, et al.. (2003). Fabrication of ultrashort T gates using a PMMA/LOR/UVIII resist stack. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 21(6). 3012–3016. 25 indexed citations
17.
Macintyre, D.S., David A. J. Moran, Xiehong Cao, et al.. (2003). Nanoimprint lithography process optimization for the fabrication of high electron mobility transistors. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 21(6). 2783–2787. 11 indexed citations
18.
Moran, David A. J., K. Elgaid, D.S. Macintyre, et al.. (2003). Novel technologies for the realisation of GaAs pHEMTs with 120 nm self-aligned and nanoimprinted T-gates. Microelectronic Engineering. 67-68. 769–774. 11 indexed citations
19.
Macintyre, D.S., et al.. (2001). Effect of resist sensitivity ratio on T-gate fabrication. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(6). 2494–2498. 10 indexed citations
20.
Thoms, S., D.S. Macintyre, & Yifang Chen. (1999). <title>Evaluation of Shipley UV5 resist for electron beam lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3741. 138–147. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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