D.S. Macintyre

1.1k citations

45 papers · 848 indexed · h-index 16

Electrical and Electronic Engineering top 5%
- Advancements in Photolithography Techniques 18
- Semiconductor materials and devices 18
- Advancements in Semiconductor Devices and Circuit Design 13
- Integrated Circuits and Semiconductor Failure Analysis 11
- Photonic and Optical Devices 6
Atomic and Molecular Physics, and Optics top 10%
Surfaces, Coatings and Films top 10%
- Optical Coatings and Gratings 7
Biomedical Engineering top 10%
- Nanofabrication and Lithography Techniques 13
- Advanced Surface Polishing Techniques 6
Structural Biology

Co-authors: S. Thoms Marc Sorel R.M. De La Rue M. Gnan Iain Thayne Haiping Zhou David A. J. Moran B. Casey
Cited by: Electrical and Electronic Engineering Atomic and Molecular Physics, and Optics Surfaces, Coatings and Films
Journals: Microelectronic Engineering (12 papers)Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (4 papers)IEEE Electron Device Letters (3 papers)
Partner nations: United Kingdom United States Italy

In The Last Decade

D.S. Macintyre

44 papers receiving 821 citations

Peers

Countries citing papers authored by D.S. Macintyre

Since Specialization

Citations

This map shows the geographic impact of D.S. Macintyre's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D.S. Macintyre with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D.S. Macintyre more than expected).

Fields of papers citing papers by D.S. Macintyre

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D.S. Macintyre. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D.S. Macintyre. The network helps show where D.S. Macintyre may publish in the future.

Co-authorship network

The 25 scholars most cited alongside D.S. Macintyre, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with D.S. Macintyre Line = papers co-authored together D.S. Macintyre links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	InAs FinFETs With H_finnm Fabricated Using a Top–Down Etch Process IEEE Electron Device Letters ·N. Hristea,X. Li,S. W. Chang,Babu Kesavan,T. Vasen,P. Ramvall,R. Contreras‐Guerrero,Juan Salvador Rojas-Ramírez,M. Holland,G. Doornbos,Mojtaba Firuzjaeyan,D.S. Macintyre,S. Thoms,Ravi Droopad,Yee‐Chia Yeo,C.H. Diaz,Iain Thayne,M. Passlack	2016	19
2	Multi-wavelength filters in silicon using superposition sidewall Bragg grating devices Optics Letters ·Michael J. Strain,S. Thoms,D.S. Macintyre,Marc Sorel	2014	33
3	Emission characteristics of photonic crystal light-emitting diodes Applied Optics ·Ali Z. Khokhar,B Sivasenapathi,Feng Cheng Chang,I. M. Watson,Faiz Rahman,D.S. Macintyre,Hong-Li Li,D. Massoubre,Zheng Gong,Erdan Gu,Nigel P. Johnson,Richard M. De La Rue,Martin D. Dawson,Steven Abbott,Martin D. B. Charlton,О. А. Дойникова	2011	5
4	Electron Mobility in Surface- and Buried-Channel Flatband $\hbox{In}_{0.53}\hbox{Ga}_{0.47}\hbox{As}$ MOSFETs With ALD $\hbox{Al}_{2}\hbox{O}_{3}$ Gate Dielectric IEEE Electron Device Letters ·Anton Yanagisawa,M. Holland,Xu Li,Gary W. Paterson,Haiping Zhou,张玉书,D.S. Macintyre,S. Thoms,A. Asenov,Byungha Shin,Jaesoo Ahn,Paul C. McIntyre,Iain Thayne	2011	34
5	Electrical type conversion of p-type HgCdTe induced by nanoimprinting Journal of Applied Physics ·Mariusz Martyniuk,Richard H. Sewell,A. Wyler,Gilberto A. Umana‐Membreno,C.A. Musca,J.M. Dell,J. Antoszewski,L. Faraone,D.S. Macintyre,S. Thoms,C. N. Ironside	2011	2
6	Comparison of hydrogen silsesquioxane development methods for sub-10 nm electron beam lithography using accurate linewidth inspection Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·D.S. Macintyre,S. Thoms	2011	2
7	Micro-/nano-photonic device structures applied to communications, sensing and consumer optoelectronics ENLIGHTEN (Jurnal Bimbingan dan Konseling Islam) ·R.M. De La Rue,Basudev Lahiri,Antonio Samarelli,成之池上,Ali Z. Khokhar,Rafal Dylewicz,Philippe Velha,D.S. Macintyre,Nigel P. Johnson,Faiz Rahman,Marc Sorel	2010	1
8	Linewidth metrology for sub-10-nm lithography Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·S. Thoms,D.S. Macintyre	2010	4
9	Deep sub-micron and self-aligned flatband III–V MOSFETs ENLIGHTEN (Jurnal Bimbingan dan Konseling Islam) ·Richard J. Hill,X. Li,Haiping Zhou,D.S. Macintyre,S. Thoms,M. Holland,Pasquale Longo,David A. J. Moran,A. J. Craven,C.R. Stanley,A. Asenov,Ravi Droopad,M. Passlack,Iain Thayne	2009	1
10	Fabrication of low-loss photonic wires in silicon-on-insulator using hydrogen silsesquioxane electron-beam resist Electronics Letters ·M. Gnan,S. Thoms,D.S. Macintyre,R.M. De La Rue,Marc Sorel	2008	151
11	Effect of lithography stitching errors on Silicon-on-Insulator photonic wires M. Gnan,Marc Sorel,D.S. Macintyre,P. Pottier,道磨大関,R.M. De La Rue	2007	1
12	High resolution e-beam lithography using a thin titanium layer to promote resist adhesion Microelectronic Engineering ·D.S. Macintyre,Ian Young,Andrew Glidle,Xiehong Cao,John Weaver,S. Thoms	2006	12
13	Nanometre scale overlay and stitch metrology using an optical microscope Microelectronic Engineering ·D.S. Macintyre,S. Thoms	2006	3
14	Low damage sputter deposition of tungsten for decanano compound semiconductor transistors Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Xiehong Cao,D.S. Macintyre,S. Thoms,Hatice KAYA ÖZDEN,Hongyu Zhou,C. D. W. Wilkinson,M. Holland,李本荣,F. McEwan,Cueva Alvarez,Alessandro Midolo	2005	2
15	Imprint lithography issues in the fabrication of high electron mobility transistors Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·S. Thoms,D.S. Macintyre,David A. J. Moran,Iain Thayne	2004	3
16	Fabrication of ultrashort T gates using a PMMA/LOR/UVIII resist stack Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Г.И. Бубнова,D.S. Macintyre,Xiehong Cao,Baudouin Massart,David A. J. Moran,Helen Gray Crotwell,M. Holland,C.R. Stanley,Iain Thayne,S. Thoms	2003	25
17	Nanoimprint lithography process optimization for the fabrication of high electron mobility transistors Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·D.S. Macintyre,A. S. Afanasiev,C.K. Lee,Baudouin Massart,David A. J. Moran,Xiehong Cao,K. Elgaid,C.R. Stanley,Iain Thayne,S. Thoms	2003	11
18	Novel technologies for the realisation of GaAs pHEMTs with 120 nm self-aligned and nanoimprinted T-gates Microelectronic Engineering ·David A. J. Moran,Baudouin Massart,Helen Gray Crotwell,K. Elgaid,D.S. Macintyre,S. Thoms,C.R. Stanley,Iain Thayne	2003	11
19	Effect of resist sensitivity ratio on T-gate fabrication Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·R.S. Madurapperuma,D.S. Macintyre,S. Thoms	2001	10
20	<title>Evaluation of Shipley UV5 resist for electron beam lithography</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·S. Thoms,D.S. Macintyre,Yifang Chen	1999	1

About D.S. Macintyre

D.S. Macintyre is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Biomedical Engineering, Atomic and Molecular Physics, and Optics and Condensed Matter Physics, having authored 45 papers that have together received 848 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (18 papers), Semiconductor materials and devices (18 papers), Nanofabrication and Lithography Techniques (13 papers), Advancements in Semiconductor Devices and Circuit Design (13 papers), Integrated Circuits and Semiconductor Failure Analysis (11 papers), Optical Coatings and Gratings (7 papers), Photonic and Optical Devices (6 papers) and Advanced Surface Polishing Techniques (6 papers). The work is most often cited by research in Electrical and Electronic Engineering (686 citations), Atomic and Molecular Physics, and Optics (355 citations), Surfaces, Coatings and Films (77 citations), Biomedical Engineering (312 citations) and Structural Biology (9 citations). D.S. Macintyre has collaborated with scholars based in United Kingdom, United States and Italy. Frequent co-authors include S. Thoms, Marc Sorel, R.M. De La Rue, M. Gnan, Iain Thayne, Haiping Zhou, David A. J. Moran, B. Casey, Richard J. Hill and Xu Li. Their work appears in journals such as Microelectronic Engineering, Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, IEEE Electron Device Letters, Electronics Letters and Optics Letters.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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