C. L. Standley

472 total citations
10 papers, 371 citations indexed

About

C. L. Standley is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Materials Chemistry. According to data from OpenAlex, C. L. Standley has authored 10 papers receiving a total of 371 indexed citations (citations by other indexed papers that have themselves been cited), including 6 papers in Electrical and Electronic Engineering, 5 papers in Computational Mechanics and 3 papers in Materials Chemistry. Recurrent topics in C. L. Standley's work include Ion-surface interactions and analysis (5 papers), Semiconductor materials and devices (5 papers) and Copper Interconnects and Reliability (2 papers). C. L. Standley is often cited by papers focused on Ion-surface interactions and analysis (5 papers), Semiconductor materials and devices (5 papers) and Copper Interconnects and Reliability (2 papers). C. L. Standley collaborates with scholars based in United States. C. L. Standley's co-authors include W. Patrick, W. L. Guthrie, R. F. Kruh, L. I. Maissel, Reese E. Jones, Young Soo Kim and L. V. Gregor and has published in prestigious journals such as The Journal of Chemical Physics, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

C. L. Standley

10 papers receiving 337 citations

Peers

C. L. Standley

BE

EEE

MC

ME

AMPO

L.F. Donaghey United States

Charles E. Wicks United States

V. Vukanović United States

I. E. Campbell United States

K. Hisano Japan

Th. Heumann Germany

Lalitha Sirdeshmukh India

S. Öberg Sweden

J. N. Agar United Kingdom

Abhishek B. Solanki India

L.F. Donaghey United States

C. L. Standley

54 ×0.3

BE

198 ×1.2

EEE

291 ×2.2

MC

159 ×1.5

ME

41 ×0.6

AMPO

Citations per year, relative to C. L. Standley C. L. Standley (= 1×) peers L.F. Donaghey

Countries citing papers authored by C. L. Standley

Since Specialization

Citations

This map shows the geographic impact of C. L. Standley's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. L. Standley with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. L. Standley more than expected).

Fields of papers citing papers by C. L. Standley

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. L. Standley. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. L. Standley. The network helps show where C. L. Standley may publish in the future.

Co-authorship network of co-authors of C. L. Standley

This figure shows the co-authorship network connecting the top 25 collaborators of C. L. Standley. A scholar is included among the top collaborators of C. L. Standley based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with C. L. Standley. C. L. Standley is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

Sort: Min cites: Since: Top N: Style:

10 of 10 papers shown

1.

Patrick, W., et al.. (1991). Application of Chemical Mechanical Polishing to the Fabrication of VLSI Circuit Interconnections. Journal of The Electrochemical Society. 138(6). 1778–1784. 184 indexed citations

2.

Maissel, L. I., C. L. Standley, & L. V. Gregor. (1972). Sputter-etching of Heterogeneous Surfaces. IBM Journal of Research and Development. 16(1). 67–70. 8 indexed citations

3.

Maissel, L. I., Reese E. Jones, & C. L. Standley. (1970). Re-emission of Sputtered SiO[₂] During Growth and Its Relation to Film Quality. IBM Journal of Research and Development. 14(2). 176–181. 28 indexed citations

4.

Standley, C. L., Reese E. Jones, & L. I. Maissel. (1970). Sputtered SiO2 deposited over a step. Thin Solid Films. 5(5-6). 355–364. 8 indexed citations

5.

Jones, Reese E., C. L. Standley, & L. I. Maissel. (1967). Self-sticking coefficients of SiO2 films deposited through rf sputtering. Vacuum. 17(3). 165–165. 1 indexed citations

6.

Jones, Reese E., C. L. Standley, & L. I. Maissel. (1967). Re-emission Coefficients of Si and SiO2 Films Deposited through rf and dc Sputtering. Journal of Applied Physics. 38(12). 4656–4662. 29 indexed citations

7.

Standley, C. L. & L. I. Maissel. (1964). Some Observations on Conduction through Thin Tantalum Oxide Films. Journal of Applied Physics. 35(5). 1530–1534. 23 indexed citations

8.

Kruh, R. F. & C. L. Standley. (1962). An X-Ray Diffraction Study of Aqueous Zinc Chloride Solutions. Inorganic Chemistry. 1(4). 941–943. 41 indexed citations

9.

Standley, C. L. & R. F. Kruh. (1961). On the Structure of Ferric Chloride Solutions. The Journal of Chemical Physics. 34(4). 1450–1451. 27 indexed citations

10.

Kim, Young Soo, et al.. (1961). X-Ray Diffraction Study of Liquid Mercury-Indium Alloys. The Journal of Chemical Physics. 34(4). 1464–1465. 22 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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