C. Dahl

568 total citations
27 papers, 409 citations indexed

About

C. Dahl is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Materials Chemistry. According to data from OpenAlex, C. Dahl has authored 27 papers receiving a total of 409 indexed citations (citations by other indexed papers that have themselves been cited), including 20 papers in Electrical and Electronic Engineering, 12 papers in Atomic and Molecular Physics, and Optics and 5 papers in Materials Chemistry. Recurrent topics in C. Dahl's work include Advancements in Semiconductor Devices and Circuit Design (12 papers), Semiconductor materials and devices (12 papers) and Quantum and electron transport phenomena (8 papers). C. Dahl is often cited by papers focused on Advancements in Semiconductor Devices and Circuit Design (12 papers), Semiconductor materials and devices (12 papers) and Quantum and electron transport phenomena (8 papers). C. Dahl collaborates with scholars based in Germany, France and United States. C. Dahl's co-authors include J. P. Kotthaus, W. Schlapp, H. Nickel, Ralf Brederlow, R. Thewes, W. Weber, D. Schmitt‐Landsiedel, B. Jusserand, Andreas B. Pribil and B. Etienne and has published in prestigious journals such as Physical review. B, Condensed matter, Applied Physics Letters and IEEE Transactions on Electron Devices.

In The Last Decade

C. Dahl

26 papers receiving 391 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
C. Dahl Germany 11 291 186 72 37 32 27 409
Hao‐Hsiung Lin Taiwan 11 254 0.9× 145 0.8× 67 0.9× 13 0.4× 44 1.4× 25 303
K. Stein United States 14 601 2.1× 103 0.6× 81 1.1× 45 1.2× 35 1.1× 40 650
John J. Pekarik United States 15 812 2.8× 179 1.0× 92 1.3× 32 0.9× 40 1.3× 53 853
M. Tutt United States 11 380 1.3× 179 1.0× 43 0.6× 49 1.3× 18 0.6× 42 402
W. Hafez United States 13 517 1.8× 267 1.4× 44 0.6× 38 1.0× 42 1.3× 28 546
Arthur D. van Rheenen Norway 11 278 1.0× 161 0.9× 40 0.6× 19 0.5× 37 1.2× 45 333
B. Jagannathan United States 20 1.1k 3.7× 167 0.9× 109 1.5× 27 0.7× 82 2.6× 55 1.1k
F.-J. Tegude Germany 10 347 1.2× 177 1.0× 114 1.6× 16 0.4× 48 1.5× 33 383
J. Sarma United Kingdom 12 465 1.6× 261 1.4× 66 0.9× 26 0.7× 24 0.8× 59 514
K.-C. Wang United States 12 737 2.5× 305 1.6× 56 0.8× 72 1.9× 27 0.8× 15 762

Countries citing papers authored by C. Dahl

Since Specialization
Citations

This map shows the geographic impact of C. Dahl's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Dahl with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Dahl more than expected).

Fields of papers citing papers by C. Dahl

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Dahl. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Dahl. The network helps show where C. Dahl may publish in the future.

Co-authorship network of co-authors of C. Dahl

This figure shows the co-authorship network connecting the top 25 collaborators of C. Dahl. A scholar is included among the top collaborators of C. Dahl based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with C. Dahl. C. Dahl is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Langheinrich, W., Michael Friedrich, Laura K. Diebel, et al.. (2025). Industrially Fabricated Single-Electron Quantum Dots in Si/Si—Ge Heterostructures. IEEE Electron Device Letters. 46(5). 868–871. 4 indexed citations
2.
Friedrich, Michael, W. Langheinrich, Maik Simon, et al.. (2023). Fabrication of gate electrodes for scalable quantum computing using CMOS industry compatible e-beam lithography and numerical simulation of the resulting quantum device. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 36–36. 2 indexed citations
3.
Pregl, Sebastian, et al.. (2022). High-G Acceleration Sensors for the Automotive Industry. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 19. 1–6.
5.
Böck, J., Klaus Aufinger, S. Boguth, et al.. (2015). SiGe HBT and BiCMOS process integration optimization within the DOTSEVEN project. 121–124. 125 indexed citations
6.
Tilke, A., et al.. (2005). Visualizing the Doping Profile of a Silicon Germanium HBT With Polysilicon Emitter Using Electron Holography. IEEE Transactions on Electron Devices. 52(6). 1067–1071. 4 indexed citations
7.
Tilke, A., et al.. (2005). As-doped polysilicon emitters with interfacial oxides and correlation to bipolar device characteristics. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(5). 1877–1882. 1 indexed citations
8.
Tilke, A., et al.. (2004). Quarter micron BiCMOS technology platform with implanted-base- or SiGe-bipolar transistor for wireless communication ICs. Solid-State Electronics. 48(12). 2243–2249. 10 indexed citations
9.
Brederlow, Ralf, W. Weber, C. Dahl, D. Schmitt‐Landsiedel, & R. Thewes. (2002). A physically based model for low-frequency noise of poly-silicon resistors. 89–92. 8 indexed citations
10.
Brederlow, Ralf, W. Weber, C. Dahl, D. Schmitt‐Landsiedel, & R. Thewes. (2001). Low-frequency noise of integrated polysilicon resistors. IEEE Transactions on Electron Devices. 48(6). 1180–1187. 35 indexed citations
11.
Brederlow, Ralf, et al.. (1998). Influence of Fluorinated Gate Oxides on the Low Frequency Noise of MOS Transistors under Analog Operation. European Solid-State Device Research Conference. 472–475. 9 indexed citations
12.
Dahl, C., B. Jusserand, & B. Etienne. (1996). Raman scattering by plasmons in deep etched quantum wires. Solid-State Electronics. 40(1-8). 261–264. 6 indexed citations
13.
Jusserand, B., et al.. (1996). Folded and confined one-dimensional plasmons in modulated wires. Physical review. B, Condensed matter. 54(16). R11098–R11101. 9 indexed citations
14.
Dahl, C., B. Jusserand, & B. Etienne. (1995). Selection rules in Raman scattering by plasmons in quantum wires. Physical review. B, Condensed matter. 51(23). 17211–17214. 11 indexed citations
15.
Dahl, C., S. Manus, J. P. Kotthaus, H. Nickel, & W. Schlapp. (1995). Edge magnetoplasmons in single two-dimensional electron disks at microwave frequencies: Determination of the lateral depletion length. Applied Physics Letters. 66(17). 2271–2273. 14 indexed citations
16.
Dahl, C., B. Jusserand, A. Izraël, et al.. (1994). Plasmons in the modulated and confined 2DEG: A Raman scattering study. Superlattices and Microstructures. 15(4). 441–445. 8 indexed citations
17.
Dahl, C., J. P. Kotthaus, H. Nickel, & W. Schlapp. (1993). Magnetoplasma resonances in two-dimensional electron rings. Physical review. B, Condensed matter. 48(20). 15480–15483. 36 indexed citations
18.
Dahl, C., J. P. Kotthaus, H. Nickel, & W. Schlapp. (1992). Coulomb coupling in arrays of electron disks. Physical review. B, Condensed matter. 46(23). 15590–15593. 23 indexed citations
19.
Dahl, C., et al.. (1991). Dimensional resonances in elliptic electron disks. Solid State Communications. 80(9). 673–676. 27 indexed citations
20.
Dahl, C.. (1990). Plasmons in periodically modulated inversion layers. Physical review. B, Condensed matter. 41(9). 5763–5769. 25 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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