Byeong‐Ok Cho

465 total citations
15 papers, 413 citations indexed

About

Byeong‐Ok Cho is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, Byeong‐Ok Cho has authored 15 papers receiving a total of 413 indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Electrical and Electronic Engineering, 8 papers in Materials Chemistry and 3 papers in Mechanics of Materials. Recurrent topics in Byeong‐Ok Cho's work include Semiconductor materials and devices (13 papers), Plasma Diagnostics and Applications (8 papers) and Electronic and Structural Properties of Oxides (6 papers). Byeong‐Ok Cho is often cited by papers focused on Semiconductor materials and devices (13 papers), Plasma Diagnostics and Applications (8 papers) and Electronic and Structural Properties of Oxides (6 papers). Byeong‐Ok Cho collaborates with scholars based in South Korea and United States. Byeong‐Ok Cho's co-authors include Jane P. Chang, Sang Heup Moon, Sung‐Wook Hwang, Lin Sha, Jianjun Wang, Junghyun Ryu, Chang‐Koo Kim, Igor Levin, M. L. Steigerwald and R. L. Opila and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Byeong‐Ok Cho

15 papers receiving 405 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Byeong‐Ok Cho South Korea 13 376 179 129 76 38 15 413
L. R. Thompson United States 8 216 0.6× 160 0.9× 63 0.5× 24 0.3× 49 1.3× 26 323
T. Heitz France 10 277 0.7× 422 2.4× 130 1.0× 19 0.3× 57 1.5× 23 497
H. W. Krautter United States 8 314 0.8× 208 1.2× 24 0.2× 78 1.0× 20 0.5× 12 362
Yoshihisa Tawada Japan 12 394 1.0× 325 1.8× 35 0.3× 53 0.7× 22 0.6× 22 489
Gert J. Leusink United States 13 370 1.0× 201 1.1× 23 0.2× 43 0.6× 23 0.6× 55 416
D. Rapakoulias Greece 12 320 0.9× 257 1.4× 58 0.4× 9 0.1× 21 0.6× 36 404
Inoh Hwang South Korea 9 127 0.3× 156 0.9× 17 0.1× 70 0.9× 129 3.4× 29 272
K. P. Bastos Brazil 11 296 0.8× 143 0.8× 35 0.3× 47 0.6× 5 0.1× 29 336
Motonobu Sato Japan 10 180 0.5× 287 1.6× 20 0.2× 41 0.5× 64 1.7× 25 352
V. Raballand Germany 8 257 0.7× 94 0.5× 56 0.4× 50 0.7× 26 0.7× 11 349

Countries citing papers authored by Byeong‐Ok Cho

Since Specialization
Citations

This map shows the geographic impact of Byeong‐Ok Cho's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Byeong‐Ok Cho with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Byeong‐Ok Cho more than expected).

Fields of papers citing papers by Byeong‐Ok Cho

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Byeong‐Ok Cho. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Byeong‐Ok Cho. The network helps show where Byeong‐Ok Cho may publish in the future.

Co-authorship network of co-authors of Byeong‐Ok Cho

This figure shows the co-authorship network connecting the top 25 collaborators of Byeong‐Ok Cho. A scholar is included among the top collaborators of Byeong‐Ok Cho based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Byeong‐Ok Cho. Byeong‐Ok Cho is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

15 of 15 papers shown
1.
Cho, Byeong‐Ok, et al.. (2003). Origin and effect of impurity incorporation in plasma-enhanced ZrO2 deposition. Journal of Applied Physics. 93(11). 9345–9351. 35 indexed citations
2.
Ryu, Junghyun, Byeong‐Ok Cho, Sung‐Wook Hwang, Sang Heup Moon, & Chang‐Koo Kim. (2003). Trajectories of ions inside a Faraday cage located in a high density plasma etcher. Korean Journal of Chemical Engineering. 20(2). 407–413. 24 indexed citations
3.
Cho, Byeong‐Ok, et al.. (2002). Material characteristics of electrically tunable zirconium oxide thin films. Journal of Applied Physics. 93(1). 745–749. 28 indexed citations
4.
Cho, Byeong‐Ok, Jianjun Wang, & Jane P. Chang. (2002). Metalorganic precursor decomposition and oxidation mechanisms in plasma-enhanced ZrO2 deposition. Journal of Applied Physics. 92(8). 4238–4244. 27 indexed citations
5.
Sha, Lin, Byeong‐Ok Cho, & Jane P. Chang. (2002). Ion-enhanced chemical etching of ZrO2 in a chlorine discharge. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 20(5). 1525–1531. 36 indexed citations
6.
Cho, Byeong‐Ok, Jianjun Wang, Lin Sha, & Jane P. Chang. (2002). Tuning the electrical properties of zirconium oxide thin films. Applied Physics Letters. 80(6). 1052–1054. 65 indexed citations
7.
Cho, Byeong‐Ok, et al.. (2001). Sidewall-angle effect on the bottom etch profile in SiO2 etching using a CF4 plasma. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(1). 172–178. 13 indexed citations
8.
Cho, Byeong‐Ok, et al.. (2001). Angular dependence of the redeposition rates during SiO2 etching in a CF4 plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 19(3). 730–735. 23 indexed citations
9.
Cho, Byeong‐Ok, Jane P. Chang, M. L. Steigerwald, et al.. (2001). Material and Electrical Characterization of Carbon-Doped Ta2O5 Films for Embedded DRAM Applications. MRS Proceedings. 672. 1 indexed citations
10.
Cho, Byeong‐Ok, et al.. (2001). Spectroscopic study of plasma using zirconium tetra-tert-butoxide for the plasma enhanced chemical vapor deposition of zirconium oxide. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 19(6). 2751–2761. 35 indexed citations
11.
Cho, Byeong‐Ok, et al.. (2000). Angular dependence of SiO2 etching in a fluorocarbon plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 18(6). 2791–2798. 49 indexed citations
12.
Cho, Byeong‐Ok, et al.. (2000). Direct pattern etching for micromachining applications without the use of a resist mask. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 2769–2773. 11 indexed citations
13.
Cho, Byeong‐Ok, Sung‐Wook Hwang, Junghyun Ryu, & Sang Heup Moon. (1999). More vertical etch profile using a Faraday cage in plasma etching. Review of Scientific Instruments. 70(5). 2458–2461. 26 indexed citations
14.
Cho, Byeong‐Ok. (1999). Fabrication Method for Surface Gratings Using a Faraday Cage in a Conventional Plasma Etching Apparatus. Electrochemical and Solid-State Letters. 2(3). 129–129. 18 indexed citations
15.
Cho, Byeong‐Ok, et al.. (1999). Expression of the Si Etch Rate in a  CF 4 Plasma with Four Internal Process Variables. Journal of The Electrochemical Society. 146(1). 350–358. 22 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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