Akira Ohsawa

941 total citations
41 papers, 716 citations indexed

About

Akira Ohsawa is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Akira Ohsawa has authored 41 papers receiving a total of 716 indexed citations (citations by other indexed papers that have themselves been cited), including 30 papers in Electrical and Electronic Engineering, 16 papers in Materials Chemistry and 10 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Akira Ohsawa's work include Silicon and Solar Cell Technologies (21 papers), Semiconductor materials and devices (13 papers) and Silicon Nanostructures and Photoluminescence (10 papers). Akira Ohsawa is often cited by papers focused on Silicon and Solar Cell Technologies (21 papers), Semiconductor materials and devices (13 papers) and Silicon Nanostructures and Photoluminescence (10 papers). Akira Ohsawa collaborates with scholars based in Japan and Hungary. Akira Ohsawa's co-authors include Nobuo Toyokura, Akito Hara, Tetsuo Fukuda, Masaki Aoki, Hiroshi Watanabe, Hisao Yamamoto, Yasuo Yamaguchi, K. Maruyama, Y. Otani and Junichi Koike and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Akira Ohsawa

41 papers receiving 673 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Akira Ohsawa Japan 15 538 240 204 133 87 41 716
Temel Büyüklimanli United States 15 509 0.9× 156 0.7× 197 1.0× 58 0.4× 76 0.9× 37 625
L. Švob France 14 465 0.9× 222 0.9× 328 1.6× 94 0.7× 27 0.3× 36 588
F. Pierre France 11 214 0.4× 151 0.6× 183 0.9× 83 0.6× 62 0.7× 43 412
M. A. Shahid United Kingdom 11 390 0.7× 311 1.3× 231 1.1× 41 0.3× 83 1.0× 38 614
Ch. Dieker Germany 15 699 1.3× 475 2.0× 427 2.1× 87 0.7× 100 1.1× 39 890
Hideo Sunami Japan 12 452 0.8× 137 0.6× 190 0.9× 63 0.5× 86 1.0× 40 566
Susumu Ninomiya Japan 6 319 0.6× 135 0.6× 343 1.7× 63 0.5× 84 1.0× 7 474
M. Tapiero France 15 413 0.8× 250 1.0× 382 1.9× 76 0.6× 23 0.3× 32 657
J. S. Christensen Norway 16 617 1.1× 293 1.2× 382 1.9× 131 1.0× 61 0.7× 45 808
L. Grazulis United States 11 393 0.7× 283 1.2× 224 1.1× 45 0.3× 112 1.3× 53 522

Countries citing papers authored by Akira Ohsawa

Since Specialization
Citations

This map shows the geographic impact of Akira Ohsawa's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Akira Ohsawa with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Akira Ohsawa more than expected).

Fields of papers citing papers by Akira Ohsawa

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Akira Ohsawa. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Akira Ohsawa. The network helps show where Akira Ohsawa may publish in the future.

Co-authorship network of co-authors of Akira Ohsawa

This figure shows the co-authorship network connecting the top 25 collaborators of Akira Ohsawa. A scholar is included among the top collaborators of Akira Ohsawa based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Akira Ohsawa. Akira Ohsawa is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Novosad, V., Y. Otani, Akira Ohsawa, et al.. (2000). Novel magnetostrictive memory device. Journal of Applied Physics. 87(9). 6400–6402. 70 indexed citations
2.
Ohsawa, Akira, et al.. (1995). Behavior of Fe Impurity during HCl Oxidation. Journal of The Electrochemical Society. 142(10). 3486–3492. 11 indexed citations
3.
Ohsawa, Akira. (1994). Self-Organizing map using spatial interpolation of feature patterns and its application to face judgement. Medical Entomology and Zoology. 94(339). 1–6. 1 indexed citations
4.
Fukuda, Tetsuo, et al.. (1994). A Czochralski Silicon Growth Technique which Reduces Carbon to the Order of 1014 per Cubic Centimeter. Journal of The Electrochemical Society. 141(8). 2216–2220. 15 indexed citations
5.
Hara, Akito, Masaki Aoki, Tetsuo Fukuda, & Akira Ohsawa. (1993). Hydrogen effects on oxygen precipitation in Czochralski silicon crystals. Journal of Applied Physics. 74(2). 913–916. 12 indexed citations
6.
Hara, Akito, Masato Aoki, Takashi Fukuda, & Akira Ohsawa. (1993). Ultrashallow Hydrogen-Like Thermal Donors in Silicon Crystals. Materials science forum. 117-118. 219–224. 2 indexed citations
7.
Hara, Akito, Masaki Aoki, Tetsuo Fukuda, & Akira Ohsawa. (1992). Oxygen Precipitation Control by Hydrogen and Preannealing at 425℃ in Czochralski Silicon Crystals. 1 indexed citations
8.
Fukuda, Tetsuo & Akira Ohsawa. (1992). Mechanical strength of silicon crystals with oxygen and/or germanium impurities. Applied Physics Letters. 60(10). 1184–1186. 21 indexed citations
9.
Aoki, Masaki, Akito Hara, & Akira Ohsawa. (1992). Fundamental properties of intrinsic gettering of iron in a silicon wafer. Journal of Applied Physics. 72(3). 895–898. 61 indexed citations
10.
Aoki, Masaki, Akito Hara, & Akira Ohsawa. (1991). Intrinsic Gettering of Iron Impurities in Silicon Wafers. Japanese Journal of Applied Physics. 30(12S). 3580–3580. 19 indexed citations
11.
Hara, Akito, et al.. (1989). Enhancement of Oxygen Precipitation in Quenched Czochralski Silicon Crystals. MRS Proceedings. 163. 1 indexed citations
12.
Ohsawa, Akira, et al.. (1988). Reflection electron microscopy observation of the Si-SiO2 interface. Journal of Applied Physics. 63(8). 2637–2640. 4 indexed citations
13.
Ohsawa, Akira, et al.. (1987). Catastrophic breakdown in silicon oxides: The effect of Fe impurities at the SiO2-Si interface. Journal of Applied Physics. 62(5). 1960–1963. 44 indexed citations
14.
Ohsawa, Akira, et al.. (1986). Silicon surface roughness—Structural observation by reflection electron microscopy. Applied Physics Letters. 48(12). 779–781. 12 indexed citations
15.
Ohsawa, Akira, et al.. (1983). Instrument measuring temperature dependence of minority-carrier lifetime without contact. Review of Scientific Instruments. 54(2). 210–212. 8 indexed citations
16.
Ohsawa, Akira, et al.. (1982). Influence of carbon and oxygen on donor formation at 700 °C in Czochralski-grown silicon. Journal of Applied Physics. 53(8). 5733–5737. 30 indexed citations
17.
Ohsawa, Akira, et al.. (1981). Microdefects distribution in Czochralski-grown silicon crystals. Applied Physics Letters. 38(10). 787–788. 12 indexed citations
18.
Ohsawa, Akira, et al.. (1980). Oxygen striation and thermally induced microdefects in Czochralski-grown silicon crystals. Applied Physics Letters. 37(2). 157–159. 13 indexed citations
19.
Ohsawa, Akira, et al.. (1980). Determination of oxygen concentration profiles in silicon crystals observed by scanning IR absorption using semiconductor laser. Applied Physics Letters. 36(2). 147–148. 16 indexed citations
20.
Ohsawa, Akira, Yasuo Yamaguchi, Hiroshi Watanabe, & H. Itoh. (1976). Polarized Neutron Diffraction Study of CoS2. I Magnetic Moment Distribution of CoS2. Journal of the Physical Society of Japan. 40(4). 986–991. 19 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026