A. Walkiewicz‐Pietrzykowska

700 citations

38 papers · 633 indexed · h-index 17

Materials Chemistry top 10%
Electrical and Electronic Engineering top 10%
Mechanics of Materials top 5%
Electronic, Optical and Magnetic Materials top 10%
Ceramics and Composites top 10%

Co-authors: A. M. Wróbel Yoshinori Hatanaka Toru Aoki Paweł Uznański Agustín R. González‐Elipe J.E. Klemberg-Sapieha Y. Nakanishi J. Cotrino
Topics: Copper Interconnects and Reliability (21 papers)Diamond and Carbon-based Materials Research (20 papers)Semiconductor materials and devices (14 papers)
Cited by: Ceramics and Composites Electronic, Optical and Magnetic Materials Mechanics of Materials
Journals: Chemistry of Materials Physical Review B Journal of The Electrochemical Society
Partner nations: Poland Japan Canada

In The Last Decade

A. Walkiewicz‐Pietrzykowska

38 papers receiving 622 citations

Peers

Countries citing papers authored by A. Walkiewicz‐Pietrzykowska

Since Specialization

Citations

This map shows the geographic impact of A. Walkiewicz‐Pietrzykowska's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by A. Walkiewicz‐Pietrzykowska with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites A. Walkiewicz‐Pietrzykowska more than expected).

Fields of papers citing papers by A. Walkiewicz‐Pietrzykowska

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by A. Walkiewicz‐Pietrzykowska. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by A. Walkiewicz‐Pietrzykowska. The network helps show where A. Walkiewicz‐Pietrzykowska may publish in the future.

Co-authorship network of co-authors of A. Walkiewicz‐Pietrzykowska

This figure shows the co-authorship network connecting the top 25 collaborators of A. Walkiewicz‐Pietrzykowska. A scholar is included among the top collaborators of A. Walkiewicz‐Pietrzykowska based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with A. Walkiewicz‐Pietrzykowska. A. Walkiewicz‐Pietrzykowska is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Self-Restructuring of Polyhydromethylsiloxanes by the Hydride Transfer Process: A New Approach to the Cross-Linking of Polysiloxanes and to the Fabrication of Thin Polysiloxane Coatings 2022 ·Materials ·Urszula Mizerska,Sławomir Rubinsztajn,Julian Chojnowski,Marek Cypryk,Paweł Uznański,A. Walkiewicz‐Pietrzykowska,Witold Fortuniak	5
2	Surface modification of silicon oxycarbide films produced by remote hydrogen microwave plasma chemical vapour deposition from tetramethyldisiloxane precursor 2018 ·Surface and Coatings Technology ·Paweł Uznański,(unknown),A. Walkiewicz‐Pietrzykowska,Joanna Zakrzewska,A. M. Wróbel,Jacek Balcerzak,J. Tyczkowski	18
3	Silicon Carbide, Silicon Carbonitride, and Silicon Oxycarbide Thin Films Formed by Remote Hydrogen Microwave Plasma CVD 2017 ·Current Organic Chemistry ·A. Walkiewicz‐Pietrzykowska,Paweł Uznański,A. M. Wróbel	9
4	Silicon Oxycarbide Films Produced by Remote Microwave Hydrogen Plasma CVD using a Tetramethyldisiloxane Precursor: Growth Kinetics, Structure, Surface Morphology, and Properties 2015 ·Chemical Vapor Deposition ·A. M. Wróbel,Paweł Uznański,A. Walkiewicz‐Pietrzykowska	6
5	Silicon Oxycarbide Thin Films by Remote Microwave Hydrogen Plasma CVD Using a Tetramethyldisiloxane Precursor 2015 ·Chemical Vapor Deposition ·A. M. Wróbel,Paweł Uznański,A. Walkiewicz‐Pietrzykowska,(unknown),(unknown)	9
6	Thin a‐SiC:H Films Formed by Remote Hydrogen Microwave Plasma CVD using Dimethylsilane and Trimethylsilane Precursors 2014 ·Chemical Vapor Deposition ·A. M. Wróbel,A. Walkiewicz‐Pietrzykowska,Paweł Uznański	8
7	a‐SiC:H Films by Remote Hydrogen Microwave Plasma CVD From Ethylsilane Precursors^** 2013 ·Chemical Vapor Deposition ·A. M. Wróbel,A. Walkiewicz‐Pietrzykowska,Paweł Uznański,(unknown)	11
8	Amorphous Hydrogenated Silicon Carbide (a‐SiC:H) Coatings Produced by Remote Hydrogen Microwave Plasma CVD from Bis(dimethylsilyl)ethane ‐ a Novel Single‐Source Precursor 2011 ·Chemical Vapor Deposition ·A. M. Wróbel,A. Walkiewicz‐Pietrzykowska,Paweł Uznański,(unknown)	4
9	Reactivity of organosilicon precursors in remote hydrogen microwave plasma chemical vapor deposition of silicon carbide and silicon carbonitride thin‐film coatings 2009 ·Applied Organometallic Chemistry ·A. M. Wróbel,A. Walkiewicz‐Pietrzykowska,Iwona Blaszczyk‐Lezak	13
10	Growth Mechanism and Chemical Structure of Amorphous Hydrogenated Silicon Carbide (a‐SiC:H) Films Formed by Remote Hydrogen Microwave Plasma CVD From a Triethylsilane Precursor: Part 1 2009 ·Chemical Vapor Deposition ·A. M. Wróbel,A. Walkiewicz‐Pietrzykowska,(unknown),I. J. Väyrynen,F. J. Ferrer,Agustín R. González‐Elipe	23
11	Hard and High-Temperature-Resistant Silicon Carbonitride Coatings Based on N-Silyl-Substituted Cyclodisilazane Rings 2008 ·Journal of The Electrochemical Society ·A. M. Wróbel,Iwona Blaszczyk‐Lezak,A. Walkiewicz‐Pietrzykowska,Toru Aoki,(unknown)	20
12	Deposition of Thin Films of SiO_xC_yH in a Surfatron Microwave Plasma Reactor with Hexamethyldisiloxane as Precursor 2005 ·Chemical Vapor Deposition ·A. Walkiewicz‐Pietrzykowska,J. Cotrino,Agustín R. González‐Elipe	27
13	Silicon Carbonitride Films by Remote Hydrogen-Nitrogen Plasma CVD from a Tetramethyldisilazane Source 2004 ·Journal of The Electrochemical Society ·A. M. Wróbel,(unknown),A. Walkiewicz‐Pietrzykowska,Dariusz M. Bieliński,Toru Aoki,Yoshinori Hatanaka	29
14	Remote Hydrogen Plasma Chemical Vapor Deposition from (Dimethylsilyl)(trimethylsilyl)methane. 2. Property−Structure Relationships for Resulting Silicon−Carbon Films 2003 ·Chemistry of Materials ·A. M. Wróbel,A. Walkiewicz‐Pietrzykowska,Dariusz M. Bieliński,J.E. Klemberg-Sapieha,Y. Nakanishi,Toru Aoki,Yoshinori Hatanaka	19
15	Remote hydrogen–nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride filmsElectronic supplementary information (ESI) available: deconvoluted emission and IR spectra of a-Si–N–C–H films. See http://www.rsc.org/suppdata/jm/b2/b211415c/ 2003 ·Journal of Materials Chemistry ·A. M. Wróbel,(unknown),A. Walkiewicz‐Pietrzykowska,A. Tracz,J.E. Klemberg-Sapieha,Toru Aoki,Yoshinori Hatanaka	52
16	Mechanical and Tribological Properties of Thin Remote Microwave Plasma CVD a-Si:N:C Films from a Single-Source Precursor 2002 ·Tribology Letters ·Dariusz M. Bieliński,A. M. Wróbel,A. Walkiewicz‐Pietrzykowska	23
17	Mechanism of Amorphous Silica Film Formation from Tetraethoxysilane in Atomic Oxygen‐Induced Chemical Vapor Deposition 1998 ·Journal of The Electrochemical Society ·A. M. Wróbel,A. Walkiewicz‐Pietrzykowska,Sunil Wickramanayaka,Yoshinori Hatanaka	23
18	Mechanism of the Initiation Step in Atomic Hydrogen-Induced CVD of Amorphous Hydrogenated Silicon–Carbon Films from Single-Source Precursors 1998 ·Chemical Vapor Deposition ·A. M. Wróbel,A. Walkiewicz‐Pietrzykowska	15
19	ALKYLSILANES AND ALKYLCARBOSILANES AS SINGLE-SOURCE PRECURSORS FOR THE FORMATION OF A-SI:C:H THIN-FILM MATERIALS BY ATOMIC HYDROGEN-INDUCED CHEMICAL V APOUR DEPOSITION 1997 ·Polish Journal of Chemistry ·A. Walkiewicz‐Pietrzykowska,A. M. Wróbel,M. Κryszewski	6
20	Conversion of tetraethoxysilane (TEOS) to silica film‐forming precursors in atomic oxygen‐induced chemical vapor deposition 1996 ·Chemical Vapor Deposition ·A. M. Wróbel,A. Walkiewicz‐Pietrzykowska,(unknown),(unknown)	8

About A. Walkiewicz‐Pietrzykowska

A. Walkiewicz‐Pietrzykowska is a scholar working on Ceramics and Composites, Electronic, Optical and Magnetic Materials and Materials Chemistry, having authored 38 papers that have together received 633 indexed citations. Recurring topics across this work include Copper Interconnects and Reliability (21 papers), Diamond and Carbon-based Materials Research (20 papers) and Semiconductor materials and devices (14 papers). The work is most often cited by research in Ceramics and Composites (69 citations), Electronic, Optical and Magnetic Materials (212 citations) and Mechanics of Materials (274 citations). A. Walkiewicz‐Pietrzykowska has collaborated with scholars based in Poland, Japan and Canada. Frequent co-authors include A. M. Wróbel, Yoshinori Hatanaka, Toru Aoki, Paweł Uznański, Agustín R. González‐Elipe, J.E. Klemberg-Sapieha, Y. Nakanishi, J. Cotrino, Dariusz M. Bieliński and Iwona Blaszczyk‐Lezak. Their work appears in journals such as Chemistry of Materials, Physical Review B and Journal of The Electrochemical Society.

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