Immediate Impact

16 standout
Sub-graph 1 of 8

Citing Papers

A novel liquid film shearing polishing technique for silicon carbide and its processing damage mechanisms
2025 Standout
Atomic-scale understanding of graphene oxide lubrication-assisted grinding of GaN crystals
2025 Standout
1 intermediate paper

Works of S. Ramarajan being referenced

Hydroxyl Radical Formation in H[sub 2]O[sub 2]-Amino Acid Mixtures and Chemical Mechanical Polishing of Copper
2000

Author Peers

Author Last Decade Papers Cites
S. Ramarajan 329 139 158 160 11 352
H. P. Amanapu 325 209 89 223 14 397
Byoung-Jun Cho 307 188 136 149 16 365
T. Bibby 272 93 191 110 11 309
Uday Mahajan 320 209 178 86 15 364
Wonseop Choi 303 213 146 78 15 342
F. Calame 290 191 135 192 14 385
Lianjun Hu 256 186 96 122 17 323
Jiunnjye Tsaur 226 161 49 231 17 349
Alborz Amirsadeghi 231 62 77 119 15 328
Karey Holland 279 96 211 119 12 319

All Works

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Rankless by CCL
2026