Immediate Impact

1 from Science/Nature 9 standout
Sub-graph 1 of 3

Citing Papers

High-kGate Dielectrics for Emerging Flexible and Stretchable Electronics
2018 Standout
A liquid metal reaction environment for the room-temperature synthesis of atomically thin metal oxides
2017 StandoutScience
2 intermediate papers

Works of J. Kluth being referenced

Bulk Properties of MOCVD-Deposited HfO[sub 2] Layers for High k Dielectric Applications
2004

Author Peers

Author Last Decade Papers Cites
J. Kluth 19 1 2 7 6 20
A. Nardulli 16 1 2 7 7 18
Wei Zhou 14 1 2 6 5 14
M. K. Hamzah 12 3 8 5 20
Tomohiko Oka 17 1 4 8 7 26
X. Ye 10 3 5 6 24
Sung-Joo Hong 24 1 4 11 7 25
S.Z. Chen 12 3 13 5 27
R. Bolam 18 2 3 4 5 18
R. Matsuo 16 5 6 4 19
S. Biagi 15 1 13 8 28

All Works

Loading papers...

Rankless by CCL
2026