Immediate Impact

5 standout
Sub-graph 1 of 3

Citing Papers

Research and Technologies for next-generation high-temperature data centers – State-of-the-arts and future perspectives
2022 Standout
Halogen Etch of Ti3AlC2 MAX Phase for MXene Fabrication
2021 Standout
2 intermediate papers

Works of H. Aochi being referenced

Advanced metallization technology for 256M DRAM
1995
A 45-ns 16-Mbit DRAM with triple-well structure
1989

Author Peers

Author Last Decade Papers Cites
H. Aochi 27 2 3 3 3 27
F. Roscher 28 2 4 5 2 28
Curtis Zwenger 21 2 5 2 23
N. Nidhi 16 2 4 2 4 19
Nance Ericson 28 2 3 3 31
E. Fraile 23 5 3 5 2 29
D. Coolbaugh 28 4 1 4 3 28
Seitaro Kawai 33 2 4 3 33
J. Kuss 32 2 3 2 32
D. Bisello 22 2 4 26
C. Fuchs 20 5 4 4 4 22

All Works

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Rankless by CCL
2026