William D. Heavlin

841 total citations · 1 hit paper
17 papers, 467 citations indexed

About

William D. Heavlin is a scholar working on Electrical and Electronic Engineering, Industrial and Manufacturing Engineering and Artificial Intelligence. According to data from OpenAlex, William D. Heavlin has authored 17 papers receiving a total of 467 indexed citations (citations by other indexed papers that have themselves been cited), including 7 papers in Electrical and Electronic Engineering, 4 papers in Industrial and Manufacturing Engineering and 2 papers in Artificial Intelligence. Recurrent topics in William D. Heavlin's work include Advancements in Photolithography Techniques (4 papers), Integrated Circuits and Semiconductor Failure Analysis (3 papers) and Advancements in Semiconductor Devices and Circuit Design (3 papers). William D. Heavlin is often cited by papers focused on Advancements in Photolithography Techniques (4 papers), Integrated Circuits and Semiconductor Failure Analysis (3 papers) and Advancements in Semiconductor Devices and Circuit Design (3 papers). William D. Heavlin collaborates with scholars based in United States, Canada and China. William D. Heavlin's co-authors include Andrew Tomkins, Min Zhang, Thomas W. Prior, Susanna M. Grzeschik, Ching H. Wang, Ana Radovanović, Zoran Krivokapić, Minjie Fan, Patrick Riley and Jason Hickey and has published in prestigious journals such as Proceedings of the National Academy of Sciences, Technometrics and Annals of Neurology.

In The Last Decade

William D. Heavlin

16 papers receiving 440 citations

Hit Papers

Reviewer bias in single- versus double-blind peer review 2017 2026 2020 2023 2017 50 100 150 200 250
What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

  1. Reviewer bias in single- versus double-blind peer review
    2017 296 citations Andrew Tomkins, Min Zhang et al. Proceedings of the National Academy of Sciences profile →

Peers

William D. Heavlin
Hermann Schier Germany
M. A. Zulueta Spain
Phillip Li United States
Ryan Chute United States
Adrián A. Díaz‐Faes Spain
Meijun Liu China
David Chavalarias France
Mohammad Hosseini United States
Barbara Kline Pope United States
Michael Park United States
Hermann Schier Germany
William D. Heavlin
Citations per year, relative to William D. Heavlin William D. Heavlin (= 1×) peers Hermann Schier

Countries citing papers authored by William D. Heavlin

Since Specialization
Citations

This map shows the geographic impact of William D. Heavlin's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by William D. Heavlin with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites William D. Heavlin more than expected).

Fields of papers citing papers by William D. Heavlin

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by William D. Heavlin. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by William D. Heavlin. The network helps show where William D. Heavlin may publish in the future.

Co-authorship network of co-authors of William D. Heavlin

This figure shows the co-authorship network connecting the top 25 collaborators of William D. Heavlin. A scholar is included among the top collaborators of William D. Heavlin based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with William D. Heavlin. William D. Heavlin is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

17 of 17 papers shown
1.
Heavlin, William D., et al.. (2022). Case‐Control Study on a Decade of Ground‐Based Magnetometers in California Reveals Modest Signal 24–72 hr Prior to Earthquakes. Journal of Geophysical Research Solid Earth. 127(10). 13 indexed citations
2.
Heavlin, William D.. (2021). On Ensembles, I-Optimality, and Active Learning. Journal of Statistical Theory and Practice. 15(3). 1 indexed citations
3.
Tomkins, Andrew, Min Zhang, & William D. Heavlin. (2017). Reviewer bias in single- versus double-blind peer review. Proceedings of the National Academy of Sciences. 114(48). 12708–12713. 296 indexed citations breakdown →
4.
Radovanović, Ana, William D. Heavlin, & Sila Kiliccote. (2016). Optimized Risk-Aware Nomination Strategy in Demand Response Markets. 99–108. 1 indexed citations
5.
Radovanović, Ana & William D. Heavlin. (2012). Risk-aware revenue maximization in display advertising. 91–100. 18 indexed citations
6.
Grzeschik, Susanna M., et al.. (2005). Hydroxyurea enhances SMN2 gene expression in spinal muscular atrophy cells. Annals of Neurology. 58(2). 194–202. 89 indexed citations
7.
Krivokapić, Zoran, et al.. (2002). Intrafield effects and device manufacturability: a statistical simulation approach. 2. 36–39. 1 indexed citations
8.
Krivokapić, Zoran & William D. Heavlin. (2002). Manufacturability of single and double-gate ultrathin silicon film fully depleted SOI technologies. IEEE Transactions on Semiconductor Manufacturing. 15(2). 144–150. 2 indexed citations
9.
Krivokapić, Zoran & William D. Heavlin. (1999). Intra-field effects on device and circuit manufacturability: a statistical simulation approach. IEEE Transactions on Semiconductor Manufacturing. 12(4). 437–451. 1 indexed citations
10.
Heavlin, William D., et al.. (1998). COLUMNWISE CONSTRUCTION OF RESPONSE SURFACE DESIGNS. 1 indexed citations
11.
Capodieci, Luigi, et al.. (1998). Novel methodology for postexposure bake calibration and optimization based on electrical linewidth measurement and process metamodeling. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 16(6). 3752–3758. 7 indexed citations
12.
Krivokapić, Zoran, William D. Heavlin, & David F. Kyser. (1995). <title>Process capabilities of critical dimensions at gate mask</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2440. 480–491. 3 indexed citations
13.
Heavlin, William D. & Thomas Pyzdek. (1994). Pyzdek's Guide to SPC: Volume Two, Applications and Special Topics. Technometrics. 36(4). 422–422. 1 indexed citations
14.
Heavlin, William D.. (1994). Pyzdek's Guide to SPC: Volume Two, Applications and Special Topics. Technometrics. 36(4). 422–424. 2 indexed citations
15.
Heavlin, William D., et al.. (1985). On yield-optimizing design rules. IEEE Circuits and Devices Magazine. 1(2). 7–12. 5 indexed citations
16.
Heavlin, William D., et al.. (1982). The psychometric foundations of goal attainment scaling. Community Mental Health Journal. 18(3). 230–241. 25 indexed citations
17.
Heavlin, William D.. (1981). A Parametric Analysis of Structured and Unstructured Q-Sort Data.. Defense Technical Information Center (DTIC). 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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