W. Tsai

463 total citations
21 papers, 369 citations indexed

About

W. Tsai is a scholar working on Mechanics of Materials, Electrical and Electronic Engineering and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, W. Tsai has authored 21 papers receiving a total of 369 indexed citations (citations by other indexed papers that have themselves been cited), including 13 papers in Mechanics of Materials, 11 papers in Electrical and Electronic Engineering and 8 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in W. Tsai's work include Metal and Thin Film Mechanics (13 papers), Semiconductor materials and devices (11 papers) and Copper Interconnects and Reliability (7 papers). W. Tsai is often cited by papers focused on Metal and Thin Film Mechanics (13 papers), Semiconductor materials and devices (11 papers) and Copper Interconnects and Reliability (7 papers). W. Tsai collaborates with scholars based in United States, Canada and Taiwan. W. Tsai's co-authors include M. Delfino, D. Hodul, J. A. Fair, T. Smy, Michael J. Brett, S. Salimian, S. K. Dew, C. B. Cooper, M. Riaziat and A. R. Ellingboe and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

W. Tsai

19 papers receiving 353 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
W. Tsai United States 11 202 149 134 74 55 21 369
Ken’etsu Yokogawa Japan 13 501 2.5× 105 0.7× 168 1.3× 49 0.7× 70 1.3× 34 532
P. Kamiński Poland 14 351 1.7× 55 0.4× 138 1.0× 32 0.4× 140 2.5× 68 455
K. Tao China 11 182 0.9× 122 0.8× 141 1.1× 86 1.2× 131 2.4× 39 351
T. Merchant United States 11 249 1.2× 37 0.2× 143 1.1× 51 0.7× 51 0.9× 15 342
Naganori Ishihara Japan 12 137 0.7× 42 0.3× 81 0.6× 70 0.9× 144 2.6× 42 408
Donard de Cogan United Kingdom 12 264 1.3× 56 0.4× 47 0.4× 22 0.3× 143 2.6× 66 362
K. Tsukamoto Japan 13 463 2.3× 52 0.3× 87 0.6× 32 0.4× 126 2.3× 52 518
Katsuya Nomura Japan 12 274 1.4× 30 0.2× 96 0.7× 36 0.5× 121 2.2× 29 386
Miyako Matsui Japan 12 530 2.6× 230 1.5× 155 1.2× 106 1.4× 19 0.3× 42 578
Michael Martin United States 12 93 0.5× 69 0.5× 288 2.1× 22 0.3× 47 0.9× 28 533

Countries citing papers authored by W. Tsai

Since Specialization
Citations

This map shows the geographic impact of W. Tsai's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by W. Tsai with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites W. Tsai more than expected).

Fields of papers citing papers by W. Tsai

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by W. Tsai. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by W. Tsai. The network helps show where W. Tsai may publish in the future.

Co-authorship network of co-authors of W. Tsai

This figure shows the co-authorship network connecting the top 25 collaborators of W. Tsai. A scholar is included among the top collaborators of W. Tsai based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with W. Tsai. W. Tsai is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Lii, Ding‐Fwu, et al.. (2001). Investigation of Ti1-x Alx N Films as Diffusion Barrier Between Cu and Si. Surface Engineering. 17(4). 295–299. 1 indexed citations
2.
Tait, R. Niall, S. K. Dew, W. Tsai, et al.. (1996). Simulation of uniformity and lifetime effects in collimated sputtering. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(2). 679–686. 4 indexed citations
3.
Delfino, M., et al.. (1995). Correlation of electrical resistivity and grain size in sputtered titanium films. Thin Solid Films. 254(1-2). 285–290. 44 indexed citations
4.
Tsai, W., et al.. (1994). Effect of electron cyclotron resonance H/sup +/, Ne/sup +/, Ar/sup +/, and Xe/sup +/ plasma precleaning on titanium silicide formation. IEEE Transactions on Electron Devices. 41(8). 1396–1404. 4 indexed citations
5.
Tsai, W., et al.. (1994). Bombardment and gas rarefaction effects on the properties of sputtered Ti thin films. Thin Solid Films. 253(1-2). 386–390. 11 indexed citations
6.
Dew, S. K., et al.. (1994). Compositional variations in Ti-W films sputtered over topographical features. Journal of Applied Physics. 75(12). 8114–8120. 11 indexed citations
7.
Dew, S. K., et al.. (1993). Experimental study and computer simulation of collimated sputtering of titanium thin films over topographical features. Journal of Applied Physics. 74(2). 1339–1344. 27 indexed citations
8.
Delfino, M., et al.. (1993). Hydrogenating silicon dioxide in an electron cyclotron plasma. Applied Physics Letters. 63(25). 3426–3428. 8 indexed citations
9.
Tsai, W., M. Delfino, J. A. Fair, & D. Hodul. (1993). Temperature dependence of the electrical resistivity of reactively sputtered TiN films. Journal of Applied Physics. 73(9). 4462–4467. 42 indexed citations
10.
Dew, S. K., et al.. (1993). Properties of titanium and aluminum thin films deposited by collimated sputtering. Thin Solid Films. 236(1-2). 267–273. 15 indexed citations
11.
Delfino, M., et al.. (1993). Study of silicon surfaces bombarded with noble gas ions in an electron cyclotron resonance plasma. Journal of Applied Physics. 74(8). 5217–5224. 9 indexed citations
12.
Tsai, W., et al.. (1993). Correlation of plasma and surface chemistry during electron cyclotron resonance hydrogen etching of native silicon oxide. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 11(5). 2525–2529. 17 indexed citations
13.
Delfino, M., S. Salimian, D. Hodul, A. R. Ellingboe, & W. Tsai. (1992). Plasma cleaned Si analyzed in situ by x-ray photoelectron spectroscopy, secondary ion mass spectrometry, and actinometry. Journal of Applied Physics. 71(2). 1001–1009. 36 indexed citations
14.
Tsai, W., J. A. Fair, & D. Hodul. (1992). Ti / TiN Reactive Sputtering: Plasma Emission, X‐Ray Diffraction and Modeling. Journal of The Electrochemical Society. 139(7). 2004–2007. 10 indexed citations
15.
Tan, N. X., A. J. Bourdillon, & W. Tsai. (1992). A precursor method for reacting and aligning Bi2Sr2Ca2Cu3O10. AIP conference proceedings. 251. 437–447.
16.
Delfino, M., et al.. (1992). X-ray photoemission analysis and electrical contact properties of NF3 plasma cleaned Si surfaces. Journal of Applied Physics. 72(8). 3718–3725. 14 indexed citations
17.
Tsai, W., et al.. (1992). Electron cyclotron resonance plasma-enhanced filament-assisted diamond growth. Applied Physics Letters. 60(12). 1444–1446. 5 indexed citations
18.
Tan, N. X., A. J. Bourdillon, & W. Tsai. (1991). DIFFUSION TEXTURE GROWTH OF Bi-Pb-Sr-Ca-Cu-O SUPERCONDUCTORS. Modern Physics Letters B. 5(27). 1817–1827. 2 indexed citations
19.
Tsai, W., et al.. (1991). Diamond MESFET using ultrashallow RTP boron doping. IEEE Electron Device Letters. 12(4). 157–159. 57 indexed citations
20.
Tsai, W., et al.. (1988). Random testing revisited. Information and Software Technology. 30(7). 402–417. 52 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by Ken’etsu Yokogawa Breakdown of academic impact, for papers by P. Kamiński Breakdown of academic impact, for papers by K. Tao Breakdown of academic impact, for papers by T. Merchant Breakdown of academic impact, for papers by Naganori Ishihara Breakdown of academic impact, for papers by Donard de Cogan Breakdown of academic impact, for papers by K. Tsukamoto Breakdown of academic impact, for papers by Katsuya Nomura Breakdown of academic impact, for papers by Miyako Matsui Breakdown of academic impact, for papers by Michael Martin
Rankless by CCL
2026