Vladimir Bliznetsov

754 total citations
37 papers, 566 citations indexed

About

Vladimir Bliznetsov is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Vladimir Bliznetsov has authored 37 papers receiving a total of 566 indexed citations (citations by other indexed papers that have themselves been cited), including 29 papers in Electrical and Electronic Engineering, 21 papers in Electronic, Optical and Magnetic Materials and 9 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Vladimir Bliznetsov's work include Semiconductor materials and devices (22 papers), Copper Interconnects and Reliability (14 papers) and Metamaterials and Metasurfaces Applications (7 papers). Vladimir Bliznetsov is often cited by papers focused on Semiconductor materials and devices (22 papers), Copper Interconnects and Reliability (14 papers) and Metamaterials and Metasurfaces Applications (7 papers). Vladimir Bliznetsov collaborates with scholars based in Singapore and South Korea. Vladimir Bliznetsov's co-authors include Yuan Dong, Shiyang Zhu, Yuan Hsing Fu, Zhengji Xu, Ting Hu, Qunying Lin, Won Jong Yoo, Navab Singh, Wan Sik Hwang and Ganesh S. Samudra and has published in prestigious journals such as Applied Physics Letters, Journal of The Electrochemical Society and Optics Express.

In The Last Decade

Vladimir Bliznetsov

37 papers receiving 539 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Vladimir Bliznetsov Singapore 13 355 249 171 139 110 37 566
Chan Choy Chum Singapore 12 288 0.8× 378 1.5× 273 1.6× 170 1.2× 193 1.8× 17 665
Yeow Teck Toh Singapore 9 117 0.3× 263 1.1× 220 1.3× 219 1.6× 140 1.3× 18 472
X. S. Rao Singapore 9 167 0.5× 270 1.1× 116 0.7× 136 1.0× 147 1.3× 23 451
Qian Xie China 12 500 1.4× 282 1.1× 243 1.4× 129 0.9× 175 1.6× 60 929
Ronghui Lin Saudi Arabia 14 157 0.4× 343 1.4× 159 0.9× 135 1.0× 64 0.6× 27 587
Weikang Pan China 13 112 0.3× 329 1.3× 129 0.8× 143 1.0× 225 2.0× 21 486
Paul Hines United States 6 215 0.6× 279 1.1× 321 1.9× 169 1.2× 127 1.2× 8 540
Linke Jian Singapore 8 266 0.7× 361 1.4× 195 1.1× 84 0.6× 179 1.6× 13 519
Haesung Park South Korea 10 142 0.4× 194 0.8× 181 1.1× 104 0.7× 126 1.1× 26 435
Febiana Tjiptoharsono Singapore 11 157 0.4× 241 1.0× 242 1.4× 191 1.4× 67 0.6× 24 454

Countries citing papers authored by Vladimir Bliznetsov

Since Specialization
Citations

This map shows the geographic impact of Vladimir Bliznetsov's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Vladimir Bliznetsov with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Vladimir Bliznetsov more than expected).

Fields of papers citing papers by Vladimir Bliznetsov

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Vladimir Bliznetsov. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Vladimir Bliznetsov. The network helps show where Vladimir Bliznetsov may publish in the future.

Co-authorship network of co-authors of Vladimir Bliznetsov

This figure shows the co-authorship network connecting the top 25 collaborators of Vladimir Bliznetsov. A scholar is included among the top collaborators of Vladimir Bliznetsov based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Vladimir Bliznetsov. Vladimir Bliznetsov is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Zhong, Qize, Yuan Dong, Dongdong Li, et al.. (2020). Large-area Metalens Directly Patterned on a 12-inch Glass Wafer using Immersion Lithography for Mass Production. Th2A.8–Th2A.8. 8 indexed citations
2.
Zhong, Qize, Vladimir Bliznetsov, Navab Singh, et al.. (2019). 1550nm-Wavelength Metalens Demonstrated on 12-Inch Si CMOS Platform. 1–2. 6 indexed citations
3.
Xu, Zhengji, Yuan Dong, Ting Hu, et al.. (2019). CMOS-compatible all-Si metasurface polarizing bandpass filters on 12-inch wafers. Optics Express. 27(18). 26060–26060. 35 indexed citations
4.
Bliznetsov, Vladimir, et al.. (2015). Deep SiO2etching with Al and AlN masks for MEMS devices. Journal of Micromechanics and Microengineering. 25(8). 87002–87002. 19 indexed citations
5.
Deng, Wei, et al.. (2013). Control of corrosion on aluminum MEMS structures after post etch clean. 97. 736–740. 2 indexed citations
6.
Bliznetsov, Vladimir, et al.. (2011). High-throughput anisotropic plasma etching of polyimide for MEMS. Journal of Micromechanics and Microengineering. 21(6). 67003–67003. 11 indexed citations
7.
Bliznetsov, Vladimir, et al.. (2008). Etching of TiN-based gates for advanced complementary metal-oxide-semiconductor devices. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 26(4). 1440–1444. 1 indexed citations
8.
Jiang, Yu, Navab Singh, T. Y. Liow, et al.. (2008). Ge-Rich (70%) SiGe Nanowire MOSFET Fabricated Using Pattern-Dependent Ge-Condensation Technique. IEEE Electron Device Letters. 29(6). 595–598. 22 indexed citations
9.
Bliznetsov, Vladimir, L. K. Bera, N. Balasubramanian, et al.. (2007). Plasma Etching for Sub-45-nm TaN Metal Gates on High-$k$ Dielectrics. IEEE Transactions on Semiconductor Manufacturing. 20(2). 143–149. 19 indexed citations
10.
Ang, Kah‐Wee, King-Jien Chui, Vladimir Bliznetsov, et al.. (2006). Thin body silicon-on-insulator N-MOSFET with silicon-carbon source/drain regions for performance enhancement. 497–500. 24 indexed citations
11.
Leong, Wai Yie, et al.. (2005). Effects of plasma treatments on structural and electrical properties of methyl-doped silicon oxide low dielectric constant film. Thin Solid Films. 496(2). 402–411. 4 indexed citations
12.
Bliznetsov, Vladimir, et al.. (2005). Integrated process of photoresist trimming and dielectric hard mask etching for sub-50 nm gate patterning. Thin Solid Films. 504(1-2). 117–120. 1 indexed citations
13.
Bliznetsov, Vladimir, R. Rakesh Kumar, L. K. Bera, et al.. (2005). Overcoming Challenges in Metal Gate Etching for Sub-45 nm Technology Node. 1 indexed citations
14.
Hwang, Wan Sik, et al.. (2005). Investigation of etching properties of metal nitride/high-k gate stacks using inductively coupled plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 23(4). 964–970. 42 indexed citations
15.
Yu, Ming, S. Balakumar, Vladimir Bliznetsov, et al.. (2005). A method of fabricating metal-insulator-metal (MIM) capacitor in Cu/low-k backend interconnection process for RF application. Thin Solid Films. 504(1-2). 257–260. 8 indexed citations
16.
Ang, Kah‐Wee, King-Jien Chui, Vladimir Bliznetsov, et al.. (2005). Lattice strain analysis of transistor structures with silicon–germanium and silicon–carbon source∕drain stressors. Applied Physics Letters. 86(9). 90 indexed citations
17.
18.
Tsang, C.F., Yi Su, & Vladimir Bliznetsov. (2004). Comparative studies of physical and chemical properties of plasma-treated CVD low k SiOCH dielectrics. Thin Solid Films. 462-463. 269–274. 7 indexed citations
19.
Krishnamoorthy, Ahila, Vladimir Bliznetsov, Huay Ling Tay, & Bo Yu. (2002). Effect of Etching Process Deviations and Photoresist Stripping on Contact Yield of Copper Dual Damascene Metallization. Journal of The Electrochemical Society. 149(12). G656–G656. 2 indexed citations
20.
Bliznetsov, Vladimir, et al.. (1992). Reactive ion etching of deep trenches in silicon. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1783. 584–584. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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