V.A. Kudryashov

575 total citations
46 papers, 472 citations indexed

About

V.A. Kudryashov is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, V.A. Kudryashov has authored 46 papers receiving a total of 472 indexed citations (citations by other indexed papers that have themselves been cited), including 25 papers in Electrical and Electronic Engineering, 18 papers in Surfaces, Coatings and Films and 18 papers in Biomedical Engineering. Recurrent topics in V.A. Kudryashov's work include Advancements in Photolithography Techniques (19 papers), Electron and X-Ray Spectroscopy Techniques (14 papers) and Nuclear Physics and Applications (7 papers). V.A. Kudryashov is often cited by papers focused on Advancements in Photolithography Techniques (19 papers), Electron and X-Ray Spectroscopy Techniques (14 papers) and Nuclear Physics and Applications (7 papers). V.A. Kudryashov collaborates with scholars based in Russia, Singapore and United Kingdom. V.A. Kudryashov's co-authors include Xiaocong Yuan, M. Haese-Seiller, R. Kampmann, Paul Lee, Wai Chye Cheong, K. Radhakrishnan, Avinash K. Srivastava, В. А. Грибков, Nam Quoc Ngo and Miao He and has published in prestigious journals such as Optics Letters, Optics Express and Surface Science.

In The Last Decade

V.A. Kudryashov

43 papers receiving 445 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
V.A. Kudryashov Russia 10 171 163 119 117 83 46 472
J. P. Silverman United States 11 174 1.0× 242 1.5× 96 0.8× 74 0.6× 61 0.7× 32 519
T. Rao United States 14 294 1.7× 261 1.6× 215 1.8× 121 1.0× 71 0.9× 54 643
C. E. Reinhardt United States 10 159 0.9× 264 1.6× 108 0.9× 139 1.2× 98 1.2× 24 533
Johannes Wolf Germany 12 97 0.6× 102 0.6× 98 0.8× 262 2.2× 22 0.3× 23 502
Stefan Günster Germany 11 84 0.5× 191 1.2× 94 0.8× 42 0.4× 21 0.3× 29 328
Runze Qi China 12 63 0.4× 111 0.7× 82 0.7× 127 1.1× 24 0.3× 65 394
Tomasz Fok Poland 11 43 0.3× 210 1.3× 183 1.5× 135 1.2× 87 1.0× 69 495
John Sinsheimer United States 13 146 0.9× 90 0.6× 82 0.7× 70 0.6× 41 0.5× 24 429
John J. Uebbing United States 10 222 1.3× 150 0.9× 135 1.1× 57 0.5× 41 0.5× 13 408
K. Shirasawa Japan 14 108 0.6× 300 1.8× 180 1.5× 93 0.8× 14 0.2× 45 610

Countries citing papers authored by V.A. Kudryashov

Since Specialization
Citations

This map shows the geographic impact of V.A. Kudryashov's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by V.A. Kudryashov with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites V.A. Kudryashov more than expected).

Fields of papers citing papers by V.A. Kudryashov

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by V.A. Kudryashov. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by V.A. Kudryashov. The network helps show where V.A. Kudryashov may publish in the future.

Co-authorship network of co-authors of V.A. Kudryashov

This figure shows the co-authorship network connecting the top 25 collaborators of V.A. Kudryashov. A scholar is included among the top collaborators of V.A. Kudryashov based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with V.A. Kudryashov. V.A. Kudryashov is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kampmann, R., M. Haese-Seiller, V.A. Kudryashov, et al.. (2006). Horizontal ToF-neutron reflectometer REFSANS at FRM-II Munich/Germany: First tests and status. Physica B Condensed Matter. 385-386. 1161–1163. 44 indexed citations
2.
Kampmann, R., et al.. (2004). 2D-MWPC for the new reflectometer REFSANS/FRM-II: performance of the prototype. Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment. 529(1-3). 342–347. 16 indexed citations
3.
Tao, Shaohua, et al.. (2003). Optimized polarization-selective computer-generated hologram with fewer phase combinations. Optics Express. 11(11). 1252–1252. 3 indexed citations
4.
He, Miao, Xiaocong Yuan, Nam Quoc Ngo, J. Bu, & V.A. Kudryashov. (2003). Simple reflow technique for fabrication of a microlens array in solgel glass. Optics Letters. 28(9). 731–731. 64 indexed citations
5.
Грибков, В. А., et al.. (2002). Operation of nx2 dense plasma focus device with argon filling as a possible radiation source for micro-machining. IEEE Transactions on Plasma Science. 30(3). 1331–1338. 74 indexed citations
6.
Kudryashov, V.A., Philip D. Prewett, & A. G. Michette. (2000). <title>Investigation of process latitude in e-beam lithography for positive CAR UVIII using novel volumetric linewidth measurement</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4226. 124–132. 1 indexed citations
7.
Kudryashov, V.A., Philip D. Prewett, & A. G. Michette. (1999). A new e-beam method for grey scale 3D optical elements. Microelectronic Engineering. 46(1-4). 209–212. 7 indexed citations
8.
Aristov, V. V., et al.. (1998). Microfabrication of ultrathin free-standing platinum foils. Surface Science. 402-404. 337–340. 4 indexed citations
9.
Kudryashov, V.A., Philip D. Prewett, & A. G. Michette. (1998). Low voltage e-beam irradiation: a new tool for suppression of airborne contamination effects in positive chemically amplified resists. Microelectronic Engineering. 41-42. 203–206. 2 indexed citations
10.
Kudryashov, V.A., et al.. (1996). Electron beam lithography using chemically-amplified resist: Resolution and profile control. Microelectronic Engineering. 30(1-4). 305–308. 12 indexed citations
11.
Kudryashov, V.A., et al.. (1994). New microlithography technologies based on resist irradiation by low energy electrons. Microelectronic Engineering. 23(1-4). 307–310. 5 indexed citations
12.
Kudryashov, V.A., et al.. (1992). The experimental study of the main technical parameters influencing the possible resolution of electron beam lithography. Microelectronic Engineering. 17(1-4). 33–36. 2 indexed citations
13.
Charalambous, P., et al.. (1991). The proximity effect in electron beam nanolithography. Microelectronic Engineering. 13(1-4). 221–224. 2 indexed citations
14.
Aristov, V. V., et al.. (1989). Electron beam lithography resolution upon exposure of superthick resist layers. Microelectronic Engineering. 9(1-4). 231–233. 2 indexed citations
15.
Kudryashov, V.A., et al.. (1987). Spectral and energy characteristics of four-photon parametric scattering in sodium vapor. Soviet Journal of Quantum Electronics. 17(4). 478–482. 7 indexed citations
16.
Kudryashov, V.A., et al.. (1985). Four-photon parametric luminescence during noncollinear two-frequency excitation. JETPL. 41. 66. 1 indexed citations
17.
Aristov, V. V., A. Erko, & V.A. Kudryashov. (1985). Prospects of high resolution x-ray lithography. Microelectronic Engineering. 3(1-4). 589–595. 1 indexed citations
18.
Aristov, V. V., et al.. (1985). Photoelectron exposure of x-ray resists. Microelectronic Engineering. 3(1-4). 597–601. 2 indexed citations
19.
Gukasov, Arsen, et al.. (1979). Multilayer neutron monochromator-polarizer. Journal of Experimental and Theoretical Physics. 50. 862. 1 indexed citations
20.
Kudryashov, V.A., et al.. (1975). Convolution and correlation of optical signals by nonlinearoptics techniques. Soviet Journal of Quantum Electronics. 5(12). 1429–1430. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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