V. Hopfe

485 total citations
38 papers, 372 citations indexed

About

V. Hopfe is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, V. Hopfe has authored 38 papers receiving a total of 372 indexed citations (citations by other indexed papers that have themselves been cited), including 17 papers in Electrical and Electronic Engineering, 13 papers in Materials Chemistry and 12 papers in Mechanics of Materials. Recurrent topics in V. Hopfe's work include Metal and Thin Film Mechanics (10 papers), Thin-Film Transistor Technologies (7 papers) and Surface Roughness and Optical Measurements (6 papers). V. Hopfe is often cited by papers focused on Metal and Thin Film Mechanics (10 papers), Thin-Film Transistor Technologies (7 papers) and Surface Roughness and Optical Measurements (6 papers). V. Hopfe collaborates with scholars based in Germany, United Kingdom and Switzerland. V. Hopfe's co-authors include David W. Sheel, P. Klobes, Andreas Heilmann, O. Stenzel, M. K. Meyer, Wulf Grählert, E. H. Korte, Alexander V. Tikhonravov, A. Baier and Ralf Petrich and has published in prestigious journals such as Applied Surface Science, Journal of Physics D Applied Physics and Thin Solid Films.

In The Last Decade

V. Hopfe

36 papers receiving 356 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
V. Hopfe Germany 13 175 143 71 71 67 38 372
H.‐J. Tiller Germany 9 158 0.9× 97 0.7× 41 0.6× 31 0.4× 60 0.9× 38 344
С. А. Смирнов Russia 12 268 1.5× 151 1.1× 241 3.4× 70 1.0× 67 1.0× 66 509
Jan Janča Czechia 16 351 2.0× 280 2.0× 262 3.7× 147 2.1× 166 2.5× 78 676
John I. B. Wilson United Kingdom 11 214 1.2× 401 2.8× 15 0.2× 45 0.6× 74 1.1× 23 536
Richard Clergereaux France 12 300 1.7× 152 1.1× 61 0.9× 63 0.9× 63 0.9× 46 451
Pu Sen Wang United States 12 113 0.6× 147 1.0× 16 0.2× 32 0.5× 87 1.3× 33 347
B. E. E. Kastenmeier United States 10 477 2.7× 188 1.3× 52 0.7× 22 0.3× 220 3.3× 14 548
Fujun Gou China 12 215 1.2× 329 2.3× 20 0.3× 20 0.3× 130 1.9× 103 529
D. A. Pawlik United States 12 183 1.0× 209 1.5× 7 0.1× 26 0.4× 58 0.9× 20 334
Masahito Nawata Japan 13 340 1.9× 441 3.1× 20 0.3× 19 0.3× 70 1.0× 34 542

Countries citing papers authored by V. Hopfe

Since Specialization
Citations

This map shows the geographic impact of V. Hopfe's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by V. Hopfe with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites V. Hopfe more than expected).

Fields of papers citing papers by V. Hopfe

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by V. Hopfe. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by V. Hopfe. The network helps show where V. Hopfe may publish in the future.

Co-authorship network of co-authors of V. Hopfe

This figure shows the co-authorship network connecting the top 25 collaborators of V. Hopfe. A scholar is included among the top collaborators of V. Hopfe based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with V. Hopfe. V. Hopfe is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Hopfe, V. & David W. Sheel. (2007). Atmospheric‐Pressure Plasmas for Wide‐Area Thin‐Film Deposition and Etching. Plasma Processes and Polymers. 4(3). 253–265. 31 indexed citations
2.
Hopfe, V. & David W. Sheel. (2007). Atmospheric-Pressure PECVD Coating and Plasma Chemical Etching for Continuous Processing. IEEE Transactions on Plasma Science. 35(2). 204–214. 22 indexed citations
3.
Hopfe, V., et al.. (2006). Plasmachemische Gasphasenabscheidung und Plasmaätzen bei Atmosphärendruck. Vakuum in Forschung und Praxis. 18(4). 30–33. 2 indexed citations
4.
Hopfe, V., et al.. (2005). Remote Microwave PECVD for Continuous, Wide‐Area Coating Under Atmospheric Pressure. Chemical Vapor Deposition. 11(11-12). 497–509. 21 indexed citations
5.
Hopfe, V., David W. Sheel, Philip A. Martin, et al.. (2003). In-situ monitoring for CVD processes. Thin Solid Films. 442(1-2). 60–65. 14 indexed citations
6.
Hopfe, V.. (2002). Laser CVD – Status und industrielles Potential für Faserbeschichtungen. Vakuum in Forschung und Praxis. 14(4). 206–206.
7.
Hopfe, V., et al.. (1999). FTIR based process control for industrial reactors. Journal de Physique IV (Proceedings). 9(PR8). Pr8–995. 3 indexed citations
8.
Hopfe, V., et al.. (1996). Laser based coating and modification of carbon fibres: application of industrial lasers to manufacturing of composite materials. Applied Surface Science. 106. 60–66. 18 indexed citations
9.
Hopfe, V., et al.. (1995). Monitoring of SiC Deposition in an Industrial CVI/CVD Reactor by In-Situ FTIR Spectroscopy. Journal de Physique IV (Proceedings). 5(C5). C5–97. 4 indexed citations
10.
Werner, Jörg G., et al.. (1994). Changes of the optical properties of plasma polymer silver composite films caused by laser-annealing. Thin Solid Films. 237(1-2). 193–199. 9 indexed citations
11.
Hopfe, V., E. H. Korte, P. Klobes, & Wulf Grählert. (1993). Optical Data of Rough-Surfaced Ceramics: Infrared Specular and Diffuse Reflectance versus Spectra Simulation. Applied Spectroscopy. 47(4). 423–429. 14 indexed citations
12.
Hopfe, V., et al.. (1993). Infrared reflection studies of ceramics: characterization of SiC layers on graphite substrates. Analytical and Bioanalytical Chemistry. 346(1-3). 99–103. 4 indexed citations
13.
Stenzel, O., et al.. (1992). A hybrid method for determination of optical thin film constants. Thin Solid Films. 207(1-2). 324–329. 23 indexed citations
14.
Hopfe, V., et al.. (1992). IR-laser CVD of TiB2, TiCx and TiCxNy coatings on carbon fibres. Applied Surface Science. 54. 78–83. 20 indexed citations
15.
Hopfe, V., et al.. (1992). p- and s-polarized FTIR reflectance spectroscopy at oblique incidence by Kramers-Kronig transformation. Journal of Physics D Applied Physics. 25(2). 288–294. 12 indexed citations
16.
Hopfe, V., et al.. (1990). In-situ FTIR emission spectroscopy on chemical vapour deposition processes. Journal of Molecular Structure. 217. 115–130. 5 indexed citations
17.
Heilmann, Andreas, et al.. (1988). Optical properties of plasma-polymer-silver composite films and their simulation by means of effective-medium theories. Journal of Physics D Applied Physics. 21(6). 986–994. 40 indexed citations
18.
Hopfe, V., et al.. (1988). Zum Einfluß der Halogenmodifizierung auf das acide Verhalten von γ‐Al2O3. Zeitschrift für anorganische und allgemeine Chemie. 562(1). 145–152. 1 indexed citations
19.
Ebert, I., et al.. (1982). Investigation of the Interaction of Quartz with Hydrogen under Supply of Mechanical Energy (II) Investigation by IR Spectroscopy. Crystal Research and Technology. 17(10). 1259–1266. 2 indexed citations
20.
Danzer, Klaus, et al.. (1982). Möglichkeiten der Erhöhung der Informationsmenge spektroskopischer Analysenmethoden mit Hilfe der Rechentechnik. Zeitschrift für Chemie. 22(9). 332–338. 5 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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