T.‐M. Lu

1.8k total citations
76 papers, 1.4k citations indexed

About

T.‐M. Lu is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, T.‐M. Lu has authored 76 papers receiving a total of 1.4k indexed citations (citations by other indexed papers that have themselves been cited), including 47 papers in Electrical and Electronic Engineering, 26 papers in Atomic and Molecular Physics, and Optics and 24 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in T.‐M. Lu's work include Semiconductor materials and devices (32 papers), Copper Interconnects and Reliability (17 papers) and Metal and Thin Film Mechanics (15 papers). T.‐M. Lu is often cited by papers focused on Semiconductor materials and devices (32 papers), Copper Interconnects and Reliability (17 papers) and Metal and Thin Film Mechanics (15 papers). T.‐M. Lu collaborates with scholars based in United States, China and France. T.‐M. Lu's co-authors include Yiping Zhao, G.-C. Wang, Pulickel M. Ajayan, Linda S. Schadler, Nachiket Raravikar, X.-C. Zhang, James A. Moore, G.‐R. Yang, Joseph M. Pimbley and G. Palasantzas and has published in prestigious journals such as Physical review. B, Condensed matter, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

T.‐M. Lu

70 papers receiving 1.4k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
T.‐M. Lu United States 20 724 611 579 335 259 76 1.4k
Š. Luby Slovakia 17 491 0.7× 432 0.7× 458 0.8× 252 0.8× 245 0.9× 134 1.1k
Sadafumi Yoshida Japan 26 1.6k 2.2× 623 1.0× 797 1.4× 665 2.0× 212 0.8× 147 2.3k
W. K. Choi Singapore 23 1.3k 1.8× 352 0.6× 1.1k 1.8× 298 0.9× 483 1.9× 78 1.9k
T. Wágner Germany 16 484 0.7× 300 0.5× 579 1.0× 214 0.6× 282 1.1× 62 1.2k
M. E. Twigg United States 28 1.5k 2.1× 815 1.3× 804 1.4× 461 1.4× 413 1.6× 156 2.3k
Yasushiro Nishioka Japan 28 2.3k 3.2× 575 0.9× 806 1.4× 358 1.1× 456 1.8× 197 2.7k
J. Falta Germany 25 917 1.3× 1.1k 1.8× 1.2k 2.0× 238 0.7× 272 1.1× 185 2.3k
Tatsuro Miyasato Japan 17 954 1.3× 553 0.9× 1.5k 2.5× 316 0.9× 454 1.8× 80 2.0k
Bert Brijs Belgium 25 2.0k 2.7× 648 1.1× 984 1.7× 431 1.3× 196 0.8× 118 2.4k
Mengbing Huang United States 22 808 1.1× 433 0.7× 1.1k 1.9× 206 0.6× 153 0.6× 86 1.5k

Countries citing papers authored by T.‐M. Lu

Since Specialization
Citations

This map shows the geographic impact of T.‐M. Lu's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T.‐M. Lu with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T.‐M. Lu more than expected).

Fields of papers citing papers by T.‐M. Lu

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by T.‐M. Lu. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T.‐M. Lu. The network helps show where T.‐M. Lu may publish in the future.

Co-authorship network of co-authors of T.‐M. Lu

This figure shows the co-authorship network connecting the top 25 collaborators of T.‐M. Lu. A scholar is included among the top collaborators of T.‐M. Lu based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with T.‐M. Lu. T.‐M. Lu is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Lin, C. Michael, T.‐M. Lu, Xiaomei Lü, et al.. (2025). Trinuclear Cobalt/Nickel‐Based Metal–Organic Frameworks as Fluorescent Sensor Toward Quinolone Antibiotics. Applied Organometallic Chemistry. 39(2).
2.
Lu, Yuan, Hong Xuan, Wei Xu, et al.. (2025). Recent Development in Emerging 2D Rare Earth Materials: Compositions, Syntheses, and Applications. Small Methods. 9(9). e01216–e01216.
3.
Yao, Shulei, Xiaojun Zhu, Kaiming Zhang, et al.. (2024). Gradient nanostructure enabled exceptional fretting fatigue properties of Inconel 718 superalloy through submerged abrasive waterjet peening. Chinese Journal of Aeronautics. 38(1). 103297–103297. 1 indexed citations
4.
Plawsky, Joel L., et al.. (2014). Correlation between Plasma Damage and Dielectric Reliability for Ultra-Porous Low-kMaterials. ECS Journal of Solid State Science and Technology. 3(4). N59–N61. 2 indexed citations
5.
Plawsky, Joel L., et al.. (2013). On the dynamics of Cu ions injection into low-k nanoporous materials under oscillating applied fields. Journal of Applied Physics. 113(3). 8 indexed citations
6.
Eyck, Gregory A. Ten, et al.. (2007). Plasma‐Enhanced Atomic Layer Deposition of Palladium on a Polymer Substrate. Chemical Vapor Deposition. 13(6-7). 307–311. 29 indexed citations
7.
Wang, Pei‐I, et al.. (2006). Stability of Cu on Epoxy Siloxane Polymer under Bias Temperature Stress. Journal of The Electrochemical Society. 153(4). G358–G358. 1 indexed citations
9.
Barnat, E. V. & T.‐M. Lu. (2002). Calculated sheath dynamics under the influence of an asymmetrically pulsed dc bias. Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics. 66(5). 56401–56401. 18 indexed citations
10.
Wang, Pei‐I, S. P. Murarka, G.‐R. Yang, & T.‐M. Lu. (2001). Evolution of the Cu-Al Alloy/SiO[sub 2] Interfaces during Bias Temperature Stressing. Journal of The Electrochemical Society. 148(2). G78–G78. 5 indexed citations
11.
Barnat, E. V., et al.. (2001). Pulse bias sputtering of copper onto insulating surfaces. Journal of Applied Physics. 90(10). 4946–4950. 8 indexed citations
12.
Knorr, D. B., et al.. (1998). Discrete β-Ta2O5 crystallite formation in reactively sputtered amorphous thin films. Journal of Materials Science. 33(17). 4375–4379. 8 indexed citations
13.
Murarka, S. P., et al.. (1996). Epitaxial quality of thin Ag films on GaAs(100) surfaces cleaned with various wet etching techniques. Applied Physics Letters. 68(5). 681–683. 10 indexed citations
14.
Yang, G.‐R., et al.. (1995). Vapor Deposition Of Very Low K Polymer Films, Poly(Naphthalene), Poly(Fluorinated Naphthalene). MRS Proceedings. 381. 24 indexed citations
15.
Wu, Peter, et al.. (1994). Interaction of amorphous fluoropolymer with metal. Applied Physics Letters. 65(4). 508–510. 28 indexed citations
16.
Yang, H.-N., et al.. (1991). Vacancy-induced disordering in the Pb(100) surface. Physical review. B, Condensed matter. 44(3). 1306–1310. 27 indexed citations
17.
Yang, G.‐R., et al.. (1990). Deposition of Cu film on SiO2 using a partially ionized beam. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 8(3). 1465–1469. 12 indexed citations
18.
Wong, Joey Hui Min, et al.. (1988). Extended bulk defects induced by low-energy ions during partially ionized beam deposition. Journal of Applied Physics. 64(4). 2206–2208. 7 indexed citations
19.
Lu, T.‐M., et al.. (1987). The sticking coefficient of Ar on small Ar clusters. Solid State Communications. 61(6). 351–354. 1 indexed citations
20.
Lu, T.‐M., et al.. (1984). Summary Abstract: Kinetics of antiphase domains coarsening in an overlayer. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 2(2). 1048–1048. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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