T.‐M. Lu
Impact in
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- Advanced Fiber Laser Technologies
- Magnetic properties of thin films
- Surface and Thin Film Phenomena
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- Copper Interconnects and Reliability
Papers in ⓘ
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- Semiconductor materials and devices 32
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- Semiconductor materials and interfaces 8
- Surface and Thin Film Phenomena 6
- Advanced Chemical Physics Studies 6
- Co-authors
- Yiping Zhao (5 shared papers)G.-C. Wang (3 shared papers)X.-C. Zhang (1 shared paper)Linda S. Schadler (1 shared paper)Pulickel M. Ajayan (1 shared paper)Nachiket Raravikar (1 shared paper)James A. Moore (3 shared papers)G.‐R. Yang (12 shared papers)
- Journals
- Applied Physics Letters (15 papers)Journal of Applied Physics (14 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (6 papers)Physical review. B, Condensed matter (6 papers)Thin Solid Films (2 papers)
- Partner nations
- United StatesChinaTaiwan
In The Last Decade
T.‐M. Lu
70 papers receiving 1.4k citations
Peers
Comparison fields: 5 of 65
- Atomic and Molecular Physics, and Optics 611
- Electronic, Optical and Magnetic Materials 335
- Surfaces, Coatings and Films 114
- Electrical and Electronic Engineering 724
- Materials Chemistry 579
Countries citing papers authored by T.‐M. Lu
This map shows the geographic impact of T.‐M. Lu's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T.‐M. Lu with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T.‐M. Lu more than expected).
Fields of papers citing papers by T.‐M. Lu
This network shows the impact of papers produced by T.‐M. Lu. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T.‐M. Lu. The network helps show where T.‐M. Lu may publish in the future.
Co-authors
The 25 scholars most cited alongside T.‐M. Lu, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 76 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2002 | 347 | |
| 2 | 2001 | 162 | |
| 3 | 1992 | 89 | |
| 4 | 2015 | 45 | |
| 5 | 1987 | 43 | |
| 6 | 1984 | 41 | |
| 7 | 2001 | 40 | |
| 8 | 1997 | 33 | |
| 9 | 2001 | 30 | |
| 10 | 2007 | 29 | |
| 11 | 1994 | 28 | |
| 12 | 2004 | 28 | |
| 13 | 1991 | 27 | |
| 14 | 1994 | 26 | |
| 15 | 1998 | 26 | |
| 16 | 1992 | 25 | |
| 17 | 1995 | 24 | |
| 18 | 1991 | 24 | |
| 19 | 1987 | 20 | |
| 20 | 1993 | 19 |
About T.‐M. Lu
T.‐M. Lu is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Electronic, Optical and Magnetic Materials, Materials Chemistry and Mechanics of Materials, having authored 76 papers that have together received 1.4k indexed citations. Recurring topics across this work include Semiconductor materials and devices (32 papers), Copper Interconnects and Reliability (17 papers), Metal and Thin Film Mechanics (15 papers), Semiconductor materials and interfaces (8 papers), Ion-surface interactions and analysis (8 papers), nanoparticles nucleation surface interactions (7 papers), Surface and Thin Film Phenomena (6 papers) and Advanced Chemical Physics Studies (6 papers). The work is most often cited by research in Atomic and Molecular Physics, and Optics (611 citations), Electronic, Optical and Magnetic Materials (335 citations), Surfaces, Coatings and Films (114 citations), Electrical and Electronic Engineering (724 citations) and Materials Chemistry (579 citations). T.‐M. Lu has collaborated with scholars based in United States, China and Taiwan. Frequent co-authors include Yiping Zhao, G.-C. Wang, X.-C. Zhang, Linda S. Schadler, Pulickel M. Ajayan, Nachiket Raravikar, James A. Moore, G.‐R. Yang, Joseph M. Pimbley and J. Th. M. De Hosson. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Physical review. B, Condensed matter and Thin Solid Films.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.