Thomas Waechtler

728 total citations
22 papers, 625 citations indexed

About

Thomas Waechtler is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Materials Chemistry. According to data from OpenAlex, Thomas Waechtler has authored 22 papers receiving a total of 625 indexed citations (citations by other indexed papers that have themselves been cited), including 17 papers in Electrical and Electronic Engineering, 13 papers in Electronic, Optical and Magnetic Materials and 13 papers in Materials Chemistry. Recurrent topics in Thomas Waechtler's work include Semiconductor materials and devices (13 papers), Copper Interconnects and Reliability (11 papers) and Copper-based nanomaterials and applications (5 papers). Thomas Waechtler is often cited by papers focused on Semiconductor materials and devices (13 papers), Copper Interconnects and Reliability (11 papers) and Copper-based nanomaterials and applications (5 papers). Thomas Waechtler collaborates with scholars based in Germany, China and Belgium. Thomas Waechtler's co-authors include Thomas Geßner, Michael Hietschold, Stefan E. Schulz, Dietrich R. T. Zahn, Evgeniya Sheremet, Marius Toader, Jinji Luo, Thomas Otto, Detlef Billep and Ovidiu D. Gordan and has published in prestigious journals such as Journal of The Electrochemical Society, Journal of Materials Chemistry A and Thin Solid Films.

In The Last Decade

Thomas Waechtler

21 papers receiving 616 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Thomas Waechtler Germany 11 375 343 262 169 119 22 625
Mohammad‐Reza Azani Spain 12 166 0.4× 324 0.9× 159 0.6× 273 1.6× 76 0.6× 23 557
Mihaela Alexandru Romania 13 218 0.6× 160 0.5× 139 0.5× 198 1.2× 48 0.4× 34 554
Talaat A. Hameed Egypt 25 716 1.9× 629 1.8× 238 0.9× 114 0.7× 156 1.3× 48 1.1k
Siqian Hu China 16 343 0.9× 660 1.9× 423 1.6× 67 0.4× 88 0.7× 33 857
Duokai Zhao China 10 315 0.8× 416 1.2× 402 1.5× 233 1.4× 105 0.9× 17 710
Xuemei Wen China 13 318 0.8× 505 1.5× 169 0.6× 217 1.3× 75 0.6× 24 800
Jiu‐Yu Ji China 13 309 0.8× 222 0.6× 154 0.6× 314 1.9× 111 0.9× 42 552
Nian Li Germany 14 327 0.9× 290 0.8× 237 0.9× 178 1.1× 66 0.6× 34 573
Manjiao Deng China 8 769 2.1× 387 1.1× 80 0.3× 231 1.4× 149 1.3× 10 902
Céline Bounioux Israel 9 431 1.1× 271 0.8× 328 1.3× 152 0.9× 43 0.4× 13 627

Countries citing papers authored by Thomas Waechtler

Since Specialization
Citations

This map shows the geographic impact of Thomas Waechtler's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Thomas Waechtler with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Thomas Waechtler more than expected).

Fields of papers citing papers by Thomas Waechtler

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Thomas Waechtler. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Thomas Waechtler. The network helps show where Thomas Waechtler may publish in the future.

Co-authorship network of co-authors of Thomas Waechtler

This figure shows the co-authorship network connecting the top 25 collaborators of Thomas Waechtler. A scholar is included among the top collaborators of Thomas Waechtler based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Thomas Waechtler. Thomas Waechtler is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Lang, Heinrich, Thomas Grehl, Thomas Waechtler, et al.. (2015). Atomic layer deposition of ultrathin Cu2O and subsequent reduction to Cu studied by in situ x-ray photoelectron spectroscopy. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 34(1). 5 indexed citations
2.
Jakob, Alexander, et al.. (2015). [Ag{S2CNR(C2H4OH)}] as Single‐Source Precursor for Ag2S – Synthesis, Decomposition Mechanism, and Deposition Studies. European Journal of Inorganic Chemistry. 2015(10). 1726–1733. 13 indexed citations
3.
Hapke, Marko, Indre Thiel, Alexander Hildebrandt, et al.. (2015). Half-sandwich cobalt complexes in the metal-organic chemical vapor deposition process. Thin Solid Films. 578. 180–184. 7 indexed citations
4.
Waechtler, Thomas, et al.. (2014). Surface chemistry of a Cu(I) beta-diketonate precursor and the atomic layer deposition of Cu2O on SiO2 studied by x-ray photoelectron spectroscopy. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 32(4). 11 indexed citations
5.
Hildebrandt, Alexander, et al.. (2014). A cobalt layer deposition study: Dicobaltatetrahedranes as convenient MOCVD precursor systems. Journal of Materials Chemistry C. 2(23). 4676–4676. 15 indexed citations
6.
Luo, Jinji, Detlef Billep, Thomas Waechtler, et al.. (2013). Enhancement of the thermoelectric properties of PEDOT:PSS thin films by post-treatment. Journal of Materials Chemistry A. 1(26). 7576–7576. 320 indexed citations
7.
Waechtler, Thomas, Holger Fiedler, Sascha Hermann, et al.. (2013). Copper oxide atomic layer deposition on thermally pretreated multi-walled carbon nanotubes for interconnect applications. Microelectronic Engineering. 107. 223–228. 5 indexed citations
8.
Fiedler, Holger, Marius Toader, Sascha Hermann, et al.. (2013). Carbon nanotube based via interconnects: Performance estimation based on the resistance of individual carbon nanotubes. Microelectronic Engineering. 120. 210–215. 10 indexed citations
9.
Fiedler, Holger, Marius Toader, Sascha Hermann, et al.. (2012). Distinguishing between Individual Contributions to the Via Resistance in Carbon Nanotubes Based Interconnects. ECS Journal of Solid State Science and Technology. 1(6). M47–M51. 5 indexed citations
10.
Schaarschmidt, Dieter, Tobias Rüffer, Thomas Waechtler, et al.. (2012). Ruthenocenes and Half‐Open Ruthenocenes: Synthesis, Characterization, and Their Use as CVD Precursors for Ruthenium Thin Film Deposition. European Journal of Inorganic Chemistry. 2012(30). 4867–4876. 22 indexed citations
11.
Waechtler, Thomas, Ovidiu D. Gordan, Daniel Lehmann, et al.. (2011). Thermal ALD of Cu via reduction of CuxO films for the advanced metallization in spintronic and ULSI interconnect systems. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 1–4. 3 indexed citations
12.
Xie, Qi, Thomas Waechtler, Hai‐Sheng Lu, et al.. (2011). The Inhibition of Enhanced Cu Oxidation on Ruthenium∕Diffusion Barrier Layers for Cu Interconnects by Carbon Alloying into Ru. Journal of The Electrochemical Society. 158(12). H1228–H1228. 8 indexed citations
13.
Waechtler, Thomas, Qi Xie, Steffen Oswald, et al.. (2010). ALD-grown seed layers for electrochemical copper deposition integrated with different diffusion barrier systems. Microelectronic Engineering. 88(5). 684–689. 50 indexed citations
14.
Waechtler, Thomas, Steffen Oswald, Alexander Jakob, et al.. (2009). Copper Oxide Films Grown by Atomic Layer Deposition from Bis(tri-n-butylphosphane)copper(I)acetylacetonate on Ta, TaN, Ru, and SiO[sub 2]. Journal of The Electrochemical Society. 156(6). H453–H453. 75 indexed citations
15.
Waechtler, Thomas, Steffen Schulze, Stefan E. Schulz, et al.. (2009). Copper Oxide ALD from a Cu(I) <beta>-Diketonate: Detailed Growth Studies on SiO2 and TaN. ECS Transactions. 25(4). 277–287. 19 indexed citations
16.
Norman, John A. T., et al.. (2008). New precursors for CVD copper metallization. Microelectronic Engineering. 85(10). 2159–2163. 28 indexed citations
17.
Jakob, Alexander, et al.. (2007). Phosphane copper(I) complexes as CVD precursors. Surface and Coatings Technology. 201(22-23). 9089–9094. 11 indexed citations
18.
Waechtler, Thomas, Bernd Gruska, Sven Zimmermann, Stefan E. Schulz, & Thomas Geßner. (2006). Characterization of Sputtered Ta and TaN Films by Spectroscopic Ellipsometry. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 2184–2186. 5 indexed citations
19.
Waechtler, Thomas, Michael J. Manfra, & Nils Weimann. (2004). High power AlGaN/GaN HEMTs grown by plasma-assisted MBE operating at 2 to 25 GHz. 61–62.
20.
Manfra, Michael J., Nils Weimann, Oleg Mitrofanov, Thomas Waechtler, & D. M. Tennant. (2003). High power GaN/AlGaN/GaN HEMTs operating at 2 to 25 GHz grown by plasma-assisted MBE. physica status solidi (a). 200(1). 175–178. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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