Thomas E. Seidel
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- Semiconductor materials and devices 29
- Integrated Circuits and Semiconductor Failure Analysis 14
- Silicon and Solar Cell Technologies 14
- Advancements in Semiconductor Devices and Circuit Design 12
- Radio Frequency Integrated Circuit Design 5
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- Semiconductor materials and interfaces 10
- Surface and Thin Film Phenomena 5
- Materials Chemistry top 10%
- Electronic and Structural Properties of Oxides 6
- Condensed Matter Physics top 10%
- Co-authors
- I. KudmanOfer SnehR. Clark-PhelpsM. WittmerC. H. TingSasangan RamanathanXinye LiuD.L. Scharfetter
- Cited by
- Electrical and Electronic EngineeringAtomic and Molecular Physics, and OpticsMaterials Chemistry
- Journals
- Journal of Applied Physics (8 papers)IEEE Transactions on Electron Devices (6 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (4 papers)
- Partner nations
- United StatesGermanyJapan
In The Last Decade
Thomas E. Seidel
59 papers receiving 1.2k citations
Peers
Comparison fields: 5 of 83
- Electrical and Electronic Engineering 1.0k
- Atomic and Molecular Physics, and Optics 392
- Materials Chemistry 449
- Condensed Matter Physics 91
- Electronic, Optical and Magnetic Materials 120
Countries citing papers authored by Thomas E. Seidel
This map shows the geographic impact of Thomas E. Seidel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Thomas E. Seidel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Thomas E. Seidel more than expected).
Fields of papers citing papers by Thomas E. Seidel
This network shows the impact of papers produced by Thomas E. Seidel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Thomas E. Seidel. The network helps show where Thomas E. Seidel may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Thomas E. Seidel, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2022 | 11 | |
| 2 | 2022 | 1 | |
| 3 | 2020 | 2 | |
| 4 | 2020 | 2 | |
| 5 | 2015 | 8 | |
| 6 | 2004 | 69 | |
| 7 | 2004 | 32 | |
| 8 | 2002 | 10 | |
| 9 | 2002 | 224 | |
| 10 | 1996 | 13 | |
| 11 | 1980 | 18 | |
| 12 | 1978 | 21 | |
| 13 | 1975 | 1 | |
| 14 | 1973 | 6 | |
| 15 | 1973 | 23 | |
| 16 | 1971 | 39 | |
| 17 | 1970 | 8 | |
| 18 | 1970 | 2 | |
| 19 | 1966 | 4 | |
| 20 | 1966 | 67 |
About Thomas E. Seidel
Thomas E. Seidel is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Condensed Matter Physics, Materials Chemistry and Instrumentation, having authored 65 papers that have together received 1.3k indexed citations. Recurring topics across this work include Semiconductor materials and devices (29 papers), Integrated Circuits and Semiconductor Failure Analysis (14 papers), Silicon and Solar Cell Technologies (14 papers), Advancements in Semiconductor Devices and Circuit Design (12 papers), Semiconductor materials and interfaces (10 papers), Electronic and Structural Properties of Oxides (6 papers), Radio Frequency Integrated Circuit Design (5 papers) and Surface and Thin Film Phenomena (5 papers). The work is most often cited by research in Electrical and Electronic Engineering (1.0k citations), Atomic and Molecular Physics, and Optics (392 citations), Materials Chemistry (449 citations), Condensed Matter Physics (91 citations) and Electronic, Optical and Magnetic Materials (120 citations). Thomas E. Seidel has collaborated with scholars based in United States, Germany and Japan. Frequent co-authors include I. Kudman, Ofer Sneh, R. Clark-Phelps, M. Wittmer, C. H. Ting, Sasangan Ramanathan, Xinye Liu, D.L. Scharfetter, A. U. Mac Rae and Roy G. Gordon. Their work appears in journals such as Journal of Applied Physics, IEEE Transactions on Electron Devices, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of The Electrochemical Society and Journal of Visualized Experiments.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.