Thomas David

50 papers receiving 674 citations

Peers

Thomas David
Comparison fields: 5 of 52
  • Surfaces, Coatings and Films 107
  • Electronic, Optical and Magnetic Materials 124
  • Biomedical Engineering 295
  • Computational Mechanics 136
  • Materials Chemistry 302
Replace D. L. Mafra with:
D. L. Mafra United States
Yun Cui China
Gisia Beydaghyan Canada
Paul‐Tiberiu Miclea Germany
В. И. Нуждин Russia
В. Ф. Валеев Russia
A. Klini Greece
A. Axelevitch Israel
Jonathan T. Goldstein United States
R. Tomašiūnas Lithuania
Thomas David relative to D. L. Mafra United States D. L. Mafra's profile →
Citations per field
00.5×
D. L. Mafra · 1×
Citations per year

Countries citing papers authored by Thomas David

Since Specialization
Citations

This map shows the geographic impact of Thomas David's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Thomas David with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Thomas David more than expected).

Fields of papers citing papers by Thomas David

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Thomas David. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Thomas David. The network helps show where Thomas David may publish in the future.

Co-authors

The 25 scholars most cited alongside Thomas David, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Thomas David Line = papers co-authored together Thomas David links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 56 papers — load more, or switch the sort, to bring in the rest.

#Work
1 201784
2 201773
3 201534
4 200833
5 201631
6 202130
7 200830
8 201629
9 201627
10 201823
11 201923
12 201619
13 202018
14 202417
15 201715
16 201514
17 201814
18 202113
19 202012
20 201712

About Thomas David

Thomas David is a scholar working on Surfaces, Coatings and Films, Metals and Alloys, Structural Biology, Materials Chemistry and Industrial and Manufacturing Engineering, having authored 56 papers that have together received 686 indexed citations. Recurring topics across this work include Nanowire Synthesis and Applications (16 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers), Silicon Nanostructures and Photoluminescence (7 papers), Fluid Dynamics and Thin Films (7 papers), Advancements in Solid Oxide Fuel Cells (7 papers), Electrocatalysts for Energy Conversion (6 papers), Optical Coatings and Gratings (6 papers) and Chemical Synthesis and Characterization (5 papers). The work is most often cited by research in Surfaces, Coatings and Films (107 citations), Electronic, Optical and Magnetic Materials (124 citations), Biomedical Engineering (295 citations), Computational Mechanics (136 citations) and Materials Chemistry (302 citations). Thomas David has collaborated with scholars based in France, Tunisia and United States. Frequent co-authors include Marco Abbarchi, Isabelle Berbézier, Luc Favre, A. Ronda, Meher Naffouti, Abdelmalek Benkouider, D. Buttard, Jean-Benoît Claude, P. Gentile and Anne Delobbe. Their work appears in journals such as Nanotechnology, Physical Review Materials, Journal of Power Sources, Microscopy and Microanalysis and The Journal of Physical Chemistry C.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026