Taehoon Cheon

1.1k total citations
46 papers, 848 citations indexed

About

Taehoon Cheon is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Materials Chemistry. According to data from OpenAlex, Taehoon Cheon has authored 46 papers receiving a total of 848 indexed citations (citations by other indexed papers that have themselves been cited), including 40 papers in Electrical and Electronic Engineering, 23 papers in Electronic, Optical and Magnetic Materials and 19 papers in Materials Chemistry. Recurrent topics in Taehoon Cheon's work include Semiconductor materials and devices (33 papers), Copper Interconnects and Reliability (21 papers) and Semiconductor materials and interfaces (10 papers). Taehoon Cheon is often cited by papers focused on Semiconductor materials and devices (33 papers), Copper Interconnects and Reliability (21 papers) and Semiconductor materials and interfaces (10 papers). Taehoon Cheon collaborates with scholars based in South Korea, United States and Czechia. Taehoon Cheon's co-authors include Soo‐Hyun Kim, Dip K. Nandi, Rahul Ramesh, Mohd Zahid Ansari, Hyungjun Kim, Sajid Ali Ansari, Seungmin Yeo, Tae Eun Hong, Dae-Hwan Kang and Sunjung Kim and has published in prestigious journals such as Chemistry of Materials, Advanced Functional Materials and Journal of The Electrochemical Society.

In The Last Decade

Taehoon Cheon

41 papers receiving 827 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Taehoon Cheon South Korea 19 701 424 298 177 84 46 848
Abdel‐Aziz El Mel France 16 291 0.4× 566 1.3× 200 0.7× 157 0.9× 29 0.3× 38 730
Mongur Hossain China 12 360 0.5× 607 1.4× 200 0.7× 139 0.8× 78 0.9× 21 831
Sachin R. Suryawanshi India 17 442 0.6× 690 1.6× 153 0.5× 153 0.9× 39 0.5× 53 866
Zhaohua Cheng China 11 379 0.5× 285 0.7× 307 1.0× 98 0.6× 51 0.6× 28 656
Y. C. Chen Taiwan 8 332 0.5× 432 1.0× 208 0.7× 134 0.8× 24 0.3× 16 668
Seokyoon Shin South Korea 16 626 0.9× 588 1.4× 100 0.3× 93 0.5× 29 0.3× 29 777
S. Ravi India 16 282 0.4× 397 0.9× 365 1.2× 40 0.2× 43 0.5× 48 721
Zhaoqi Sun China 15 344 0.5× 544 1.3× 125 0.4× 335 1.9× 52 0.6× 38 770
Shaoren Deng Belgium 15 417 0.6× 254 0.6× 85 0.3× 138 0.8× 110 1.3× 30 575
I.T. Zedan Egypt 16 389 0.6× 367 0.9× 114 0.4× 82 0.5× 117 1.4× 44 560

Countries citing papers authored by Taehoon Cheon

Since Specialization
Citations

This map shows the geographic impact of Taehoon Cheon's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Taehoon Cheon with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Taehoon Cheon more than expected).

Fields of papers citing papers by Taehoon Cheon

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Taehoon Cheon. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Taehoon Cheon. The network helps show where Taehoon Cheon may publish in the future.

Co-authorship network of co-authors of Taehoon Cheon

This figure shows the co-authorship network connecting the top 25 collaborators of Taehoon Cheon. A scholar is included among the top collaborators of Taehoon Cheon based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Taehoon Cheon. Taehoon Cheon is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
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Kim, Sang Bok, et al.. (2025). Advanced Atomic Layer Modulation Based Highly Homogeneous PtRu Precious Metals Alloy Thin Films. Advanced Science. 12(29). e03561–e03561.
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Ansari, Mohd Zahid, Petr Janíček, Dip K. Nandi, et al.. (2024). New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition. Surfaces and Interfaces. 46. 104014–104014. 1 indexed citations
5.
Ansari, Mohd Zahid, Petr Janíček, Dip K. Nandi, et al.. (2023). Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor. Applied Surface Science. 620. 156834–156834. 4 indexed citations
6.
Mori, Yuki, Taehoon Cheon, Yejin Park, et al.. (2023). Self‐Formation of a Ru/ZnO Multifunctional Bilayer for the Next‐Generation Interconnect Technology via Area‐Selective Atomic Layer Deposition. Small. 19(34). e2300290–e2300290. 10 indexed citations
7.
Mohapatra, Debananda, Mohd Zahid Ansari, Haekyoung Kim, et al.. (2023). Layer Engineered MXene Empowered Wearable Pressure Sensors for Non‐Invasive Vital Human–Machine Interfacing Healthcare Monitoring. Advanced Materials Technologies. 8(24). 12 indexed citations
8.
Kim, Donghyun, et al.. (2022). Development of RuS 2 for near‐infrared photodetector by atomic layer deposition and post‐sulfurization. Rare Metals. 41(9). 3086–3099. 6 indexed citations
9.
Nandi, Dip K., et al.. (2020). Atomic layer deposited Mo2N thin films using Mo(CO)6 and NH3 plasma as a Cu diffusion barrier. Journal of Alloys and Compounds. 858. 158314–158314. 14 indexed citations
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Ansari, Mohd Zahid, Nazish Parveen, Dip K. Nandi, et al.. (2019). Enhanced activity of highly conformal and layered tin sulfide (SnSx) prepared by atomic layer deposition (ALD) on 3D metal scaffold towards high performance supercapacitor electrode. Scientific Reports. 9(1). 10225–10225. 84 indexed citations
12.
Choi, Sang‐Kyung, et al.. (2015). Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization. Thin Solid Films. 590. 311–317. 7 indexed citations
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Hong, Tae Eun, Seungmin Yeo, Taehoon Cheon, et al.. (2014). Highly Conformal Amorphous W–Si–N Thin Films by Plasma-Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization. The Journal of Physical Chemistry C. 119(3). 1548–1556. 19 indexed citations
15.
Kim, Woo‐Hee, Min‐Kyu Kim, Il‐Kwon Oh, et al.. (2014). Significant Enhancement of the Dielectric Constant through the Doping of CeO 2 into HfO 2 by Atomic Layer Deposition. Journal of the American Ceramic Society. 97(4). 1164–1169. 18 indexed citations
16.
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Hong, Tae Eun, Sang‐Kyung Choi, Jiyoon Park, et al.. (2012). Atomic layer deposition of Ru thin film using N2/H2 plasma as a reactant. Thin Solid Films. 520(19). 6100–6105. 19 indexed citations
18.
Kim, Jeong‐Kyu, Taehoon Cheon, Soo‐Hyun Kim, & Young-Bae Park. (2012). Interfacial Adhesion Energy of Ru–AlO Thin Film Deposited by Atomic Layer Deposition between Cu and SiO2: Effect of the Composition of Ru–AlO Thin Film. Japanese Journal of Applied Physics. 51(5S). 05EB04–05EB04. 5 indexed citations
19.
Yoon, Jaehong, Han‐Bo‐Ram Lee, Doyoung Kim, et al.. (2011). Atomic Layer Deposition of Co Using N2∕H2 Plasma as a Reactant. Journal of The Electrochemical Society. 158(11). H1179–H1179. 30 indexed citations
20.
Cheon, Taehoon, et al.. (2011). Thermal Atomic Layer Deposition (ALD) of Ru Films for Cu Direct Plating. Journal of The Electrochemical Society. 158(6). D351–D351. 53 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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