Sunyoung Koo

431 total citations
17 papers, 351 citations indexed

About

Sunyoung Koo is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Sunyoung Koo has authored 17 papers receiving a total of 351 indexed citations (citations by other indexed papers that have themselves been cited), including 15 papers in Electrical and Electronic Engineering, 6 papers in Surfaces, Coatings and Films and 5 papers in Biomedical Engineering. Recurrent topics in Sunyoung Koo's work include Advancements in Photolithography Techniques (15 papers), Integrated Circuits and Semiconductor Failure Analysis (7 papers) and Electron and X-Ray Spectroscopy Techniques (6 papers). Sunyoung Koo is often cited by papers focused on Advancements in Photolithography Techniques (15 papers), Integrated Circuits and Semiconductor Failure Analysis (7 papers) and Electron and X-Ray Spectroscopy Techniques (6 papers). Sunyoung Koo collaborates with scholars based in South Korea, United States and Japan. Sunyoung Koo's co-authors include Chul‐Ho Jeong, Myung Jin Son, Soo‐Kyung Bae, Hae‐Young Chung, You Mie Lee, Mi‐Ae Yoo, Kyu‐Won Kim, James A. Raleigh, Hyun Seok Song and Jaeseung Choi and has published in prestigious journals such as Materials Science and Engineering C, Developmental Dynamics and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

In The Last Decade

Sunyoung Koo

17 papers receiving 339 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Sunyoung Koo South Korea 7 147 110 98 54 50 17 351
Song Jae Lee South Korea 9 227 1.5× 93 0.8× 81 0.8× 41 0.8× 34 0.7× 21 478
Po‐Jui Huang Taiwan 8 172 1.2× 42 0.4× 24 0.2× 42 0.8× 21 0.4× 14 322
Kyla Dunn United States 9 274 1.9× 60 0.5× 23 0.2× 34 0.6× 45 0.9× 13 580
William E. Grever United States 12 141 1.0× 58 0.5× 6 0.1× 15 0.3× 31 0.6× 18 377
Xinhong Wan China 9 130 0.9× 112 1.0× 21 0.2× 19 0.4× 25 0.5× 15 262
Eiko Nakazawa Japan 11 68 0.5× 10 0.1× 13 0.1× 40 0.7× 17 0.3× 41 284
Dekang Liu China 10 200 1.4× 84 0.8× 57 0.6× 9 0.2× 37 0.7× 43 425
Nassim E. Ajami United States 5 217 1.5× 116 1.1× 10 0.1× 24 0.4× 27 0.5× 5 319

Countries citing papers authored by Sunyoung Koo

Since Specialization
Citations

This map shows the geographic impact of Sunyoung Koo's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Sunyoung Koo with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Sunyoung Koo more than expected).

Fields of papers citing papers by Sunyoung Koo

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Sunyoung Koo. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Sunyoung Koo. The network helps show where Sunyoung Koo may publish in the future.

Co-authorship network of co-authors of Sunyoung Koo

This figure shows the co-authorship network connecting the top 25 collaborators of Sunyoung Koo. A scholar is included among the top collaborators of Sunyoung Koo based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Sunyoung Koo. Sunyoung Koo is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

17 of 17 papers shown
1.
Koo, Sunyoung, et al.. (2017). Study on restricting factors of practical k1 limit in 0.33NA EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101431B–101431B. 3 indexed citations
2.
Koo, Sunyoung, et al.. (2016). Extension of practical k1 limit in EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 97761Q–97761Q. 1 indexed citations
3.
Kim, Jieun, et al.. (2016). Study on RLS trade-off resist upgrade for production ready EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 977623–977623. 2 indexed citations
4.
Kim, Jin‐Soo, et al.. (2015). EUV mask particle adders during scanner exposure. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 94221U–94221U. 10 indexed citations
5.
Koo, Sunyoung, et al.. (2014). EUV stochastic noise analysis and LCDU mitigation by etching on dense contact-hole array patterns. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9048. 90480A–90480A. 18 indexed citations
6.
Kim, Kyuyoung, et al.. (2013). EUV mask defect analysis from mask to wafer printing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8679. 86790G–86790G. 3 indexed citations
7.
Koo, Sunyoung, et al.. (2012). Comparison study for 3x-nm contact hole CD uniformity between EUV lithography and ArF immersion double patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83221A–83221A. 12 indexed citations
8.
Kim, Seokkyun, et al.. (2012). Study on CD variation in the vicinity of the exposure field edge in EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83221O–83221O. 2 indexed citations
9.
Koo, Sunyoung, et al.. (2011). Feasibility of EUVL thin absorber mask for sub-32nm half pitch patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7969. 79690Y–79690Y. 1 indexed citations
10.
Moon, James, et al.. (2010). Practical flare compensation strategy for DRAM device. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 76362B–76362B. 1 indexed citations
11.
Koo, Sunyoung, et al.. (2010). Feasibility of EUVL thin absorber mask for minimization of mask shadowing effect. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 763614–763614. 4 indexed citations
12.
Koo, Sunyoung, et al.. (2009). EUV-patterning characterization using a 3D mask simulation and field EUV scanner. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 72711G–72711G. 2 indexed citations
13.
Koo, Sunyoung, et al.. (2009). Comparative study of DRAM cell patterning between ArF immersion and EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 727115–727115. 6 indexed citations
14.
Kang, Jung‐Hyun, et al.. (2008). Comparative study of binary intensity mask and attenuated phase shift mask using hyper-NA immersion lithography for sub-45nm era. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6924. 69240H–69240H. 4 indexed citations
15.
Koo, Sunyoung, et al.. (2007). Issues and challenges of double patterning lithography in DRAM. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6520. 65200H–65200H. 25 indexed citations
16.
Lee, Seunghyun, et al.. (2003). Fabrication of nanostructures using scanning probe microscope lithography. Materials Science and Engineering C. 24(1-2). 3–9. 15 indexed citations
17.
Lee, You Mie, Chul‐Ho Jeong, Sunyoung Koo, et al.. (2001). Determination of hypoxic region by hypoxia marker in developing mouse embryos in vivo: A possible signal for vessel development. Developmental Dynamics. 220(2). 175–186. 242 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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