Shingo Ichimura

2.6k total citations
183 papers, 2.0k citations indexed

About

Shingo Ichimura is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Computational Mechanics. According to data from OpenAlex, Shingo Ichimura has authored 183 papers receiving a total of 2.0k indexed citations (citations by other indexed papers that have themselves been cited), including 115 papers in Electrical and Electronic Engineering, 71 papers in Materials Chemistry and 47 papers in Computational Mechanics. Recurrent topics in Shingo Ichimura's work include Semiconductor materials and devices (64 papers), Ion-surface interactions and analysis (45 papers) and Electron and X-Ray Spectroscopy Techniques (39 papers). Shingo Ichimura is often cited by papers focused on Semiconductor materials and devices (64 papers), Ion-surface interactions and analysis (45 papers) and Electron and X-Ray Spectroscopy Techniques (39 papers). Shingo Ichimura collaborates with scholars based in Japan, Poland and South Korea. Shingo Ichimura's co-authors include Akira Kurokawa, Hidehiko Nonaka, Ryōsuke Shimizu, Hiroshi Itoh, Toshiyuki Fujimoto, Shunsuke Hosokawa, Ryuichi Shimizu, Naoaki Saito, Yukio Fujiwara and Kenta Goto and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Shingo Ichimura

175 papers receiving 1.8k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Shingo Ichimura Japan 22 1.2k 813 542 519 450 183 2.0k
J. Ferrón Argentina 28 1.0k 0.9× 966 1.2× 970 1.8× 675 1.3× 833 1.9× 130 2.6k
Tadashi Narusawa Japan 22 738 0.6× 529 0.7× 659 1.2× 375 0.7× 560 1.2× 97 1.6k
P. C. Zalm Netherlands 27 1.5k 1.3× 668 0.8× 768 1.4× 198 0.4× 933 2.1× 96 2.2k
A. E. Morgan United States 20 850 0.7× 613 0.8× 624 1.2× 219 0.4× 586 1.3× 63 1.7k
H. H. Farrell United States 27 920 0.8× 880 1.1× 1.5k 2.8× 592 1.1× 177 0.4× 80 2.4k
N. Matsunami Japan 19 739 0.6× 1.1k 1.4× 315 0.6× 226 0.4× 1.1k 2.4× 67 2.1k
D. M. Riffe United States 21 694 0.6× 685 0.8× 1.2k 2.2× 410 0.8× 384 0.9× 50 2.0k
R. H. Stulen United States 19 538 0.4× 922 1.1× 818 1.5× 217 0.4× 184 0.4× 69 1.7k
R. E. Kirby United States 23 789 0.7× 387 0.5× 564 1.0× 392 0.8× 102 0.2× 60 1.6k
H. Störi Austria 23 808 0.7× 624 0.8× 466 0.9× 626 1.2× 133 0.3× 115 1.8k

Countries citing papers authored by Shingo Ichimura

Since Specialization
Citations

This map shows the geographic impact of Shingo Ichimura's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Shingo Ichimura with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Shingo Ichimura more than expected).

Fields of papers citing papers by Shingo Ichimura

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Shingo Ichimura. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Shingo Ichimura. The network helps show where Shingo Ichimura may publish in the future.

Co-authorship network of co-authors of Shingo Ichimura

This figure shows the co-authorship network connecting the top 25 collaborators of Shingo Ichimura. A scholar is included among the top collaborators of Shingo Ichimura based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Shingo Ichimura. Shingo Ichimura is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Ichimura, Shingo. (2019). Toward Construction of Measurement/Characterization Platform for Open Innovation. Journal of Surface Analysis. 26(2). 92–93.
2.
Fujiwara, Yukio, Naoaki Saito, Hidehiko Nonaka, Taisuke Nakanaga, & Shingo Ichimura. (2010). Characteristics of a charged-droplet beam generated by vacuum electrospray of an ionic liquid. Chemical Physics Letters. 501(4-6). 335–339. 19 indexed citations
3.
Kameda, N., et al.. (2009). Advantage of Highly Concentrated (≥90%) Ozone for Chemical Vapor Deposition SiO2 Grown under 200 °C Using Hexamethyldisilazane and Ultraviolet Light Excited Ozone. Japanese Journal of Applied Physics. 48(5S1). 05DB01–05DB01. 6 indexed citations
4.
Itoh, Hiroshi, et al.. (2009). Characterizing Atomic Force Microscopy Tip Shape in Use. Journal of Nanoscience and Nanotechnology. 9(2). 803–808. 9 indexed citations
5.
Ichimura, Shingo, et al.. (2009). Silicon oxidation by ozone. Journal of Physics Condensed Matter. 21(18). 183001–183001. 55 indexed citations
6.
Ichimura, Shingo. (2009). Current activities of ISO TC229/WG2 on purity evaluation and quality assurance standards for carbon nanotubes. Analytical and Bioanalytical Chemistry. 396(3). 963–971. 4 indexed citations
7.
Nonaka, Hidehiko, et al.. (2008). . Journal of the Vacuum Society of Japan. 51(3). 224–227. 4 indexed citations
8.
Kameda, N., et al.. (2007). Oxidation on Poly Silicon at Low Temperature Using UV Light-excited Ozone Gas. Shinku. 50(3). 208–210. 3 indexed citations
9.
Suzuki, Shigeru, et al.. (2005). SIMS Depth Profiling of Characteristic Thin Surface Layers Formed in Titanium by Mechanical Abrasion and Annealing. Journal of Surface Analysis. 12(2). 166–169. 1 indexed citations
10.
Suzuki, Atsushi, Akira Kurokawa, Hidehiko Nonaka, & Shingo Ichimura. (2005). Hydrogen Gas Sensing using Two Type of Pressure Gauges. Shinku. 48(7). 448–450. 1 indexed citations
11.
Nonaka, Hidehiko, et al.. (2005). Ultra-low Temperature Oxidation of Silicon using UV Light-exited Ozone in Wafer-transfer Type Chamber. Shinku. 48(5). 309–312. 4 indexed citations
12.
13.
Suzuki, Atsushi, Akira Kurokawa, Hidehiko Nonaka, & Shingo Ichimura. (2005). Influence of Temperature and Humidity on Partial Pressure Measurement using Dual Pressure Gauges. Shinku. 48(3). 139–141. 5 indexed citations
14.
Fujimoto, Toshiyuki, et al.. (2005). Application of metal cluster complex ion beam for low damage sputtering. Surface and Interface Analysis. 37(2). 164–166. 18 indexed citations
15.
Ichimura, Shingo, et al.. (2002). Effect of Highly Concentrated Ozone on the Etching Properties of Preoxide Films on Si(100) : Semiconductors. Japanese Journal of Applied Physics. 41(7). 1 indexed citations
16.
Kurokawa, Akira, et al.. (2001). Atomic force microscopy observation of layer-by-layer growth of ultrathin silicon dioxide by ozone gas at room temperature. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(2). 589–592. 12 indexed citations
17.
18.
Ichimura, Shingo, et al.. (1994). Direct Estimation of the Ionization Region for XHV Measurement by Laser Ionization. 37(9). 784–785. 1 indexed citations
19.
Ichimura, Shingo, et al.. (1993). Measurement of Extreme-High-Vacuum Pressure by Laser Ionization. Japanese Journal of Applied Physics. 32(8A). L1109–L1109. 3 indexed citations
20.
Hirata, Masahiro, et al.. (1983). Lithography Experiments Using Synchrotron Radiation from ETL Storage Ring : LATE NEWS. Japanese Journal of Applied Physics. 22(1). 611–612. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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