Shihui Ge
- Materials Chemistry top 5%
- Electronic, Optical and Magnetic Materials top 2%
- Electrical and Electronic Engineering top 10%
- Atomic and Molecular Physics, and Optics top 5%
- Aerospace Engineering top 5%
- Topics
- Magnetic properties of thin films (45 papers)Metallic Glasses and Amorphous Alloys (26 papers)ZnO doping and properties (24 papers)
- Partner nations
- ChinaUnited StatesJapan
In The Last Decade
Shihui Ge
76 papers receiving 1.6k citations
Peers
Comparison fields: 5 of 63
- Materials Chemistry 1.0k
- Electronic, Optical and Magnetic Materials 952
- Electrical and Electronic Engineering 497
- Atomic and Molecular Physics, and Optics 412
- Aerospace Engineering 346
Countries citing papers authored by Shihui Ge
This map shows the geographic impact of Shihui Ge's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Shihui Ge with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Shihui Ge more than expected).
Fields of papers citing papers by Shihui Ge
This network shows the impact of papers produced by Shihui Ge. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Shihui Ge. The network helps show where Shihui Ge may publish in the future.
Co-authorship network of co-authors of Shihui Ge
This figure shows the co-authorship network connecting the top 25 collaborators of Shihui Ge. A scholar is included among the top collaborators of Shihui Ge based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Shihui Ge. Shihui Ge is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 15 | |
| 2 | 1 | |
| 3 | 1 | |
| 4 | 53 | |
| 5 | 5 | |
| 6 | 11 | |
| 7 | 12 | |
| 8 | 9 | |
| 9 | 15 | |
| 10 | 1 | |
| 11 | 1 | |
| 12 | 17 | |
| 13 | 6 | |
| 14 | 20 | |
| 15 | 17 | |
| 16 | 43 | |
| 17 | 4 | |
| 18 | 70 | |
| 19 | 11 | |
| 20 | 4 |
About Shihui Ge
Shihui Ge is a scholar working on Electronic, Optical and Magnetic Materials, Atomic and Molecular Physics, and Optics and Materials Chemistry, having authored 76 papers that have together received 1.7k indexed citations. Recurring topics across this work include Magnetic properties of thin films (45 papers), Metallic Glasses and Amorphous Alloys (26 papers) and ZnO doping and properties (24 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (952 citations), Materials Chemistry (1.0k citations) and Aerospace Engineering (346 citations). Shihui Ge has collaborated with scholars based in China, United States and Japan. Frequent co-authors include Yalu Zuo, Mingzhong Wu, W. A. Hines, T. D. Xiao, Y. D. Zhang, S. Hui, J. I. Budnick, G.W. Taylor, Xueyun Zhou and Li Xi. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.