Shigeyasu Mori

553 total citations
41 papers, 449 citations indexed

About

Shigeyasu Mori is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Biomedical Engineering. According to data from OpenAlex, Shigeyasu Mori has authored 41 papers receiving a total of 449 indexed citations (citations by other indexed papers that have themselves been cited), including 31 papers in Electrical and Electronic Engineering, 14 papers in Materials Chemistry and 10 papers in Biomedical Engineering. Recurrent topics in Shigeyasu Mori's work include Advancements in Photolithography Techniques (22 papers), Thin-Film Transistor Technologies (9 papers) and Nanofabrication and Lithography Techniques (6 papers). Shigeyasu Mori is often cited by papers focused on Advancements in Photolithography Techniques (22 papers), Thin-Film Transistor Technologies (9 papers) and Nanofabrication and Lithography Techniques (6 papers). Shigeyasu Mori collaborates with scholars based in Japan, United States and United Kingdom. Shigeyasu Mori's co-authors include Takuya Matsuo, Nobuyuki Matsuzawa, Masaru Sasago, Shunpei Yamazaki, Akihiko Ishitani, Masashi Tsubuku, Masahiro Takahashi, Shinji Okazaki, Hiroaki Oizumi and Yasunari Sakai and has published in prestigious journals such as Journal of Applied Physics, Journal of Materials Chemistry and Chemical Physics Letters.

In The Last Decade

Shigeyasu Mori

39 papers receiving 422 citations

Peers

Shigeyasu Mori

EEE

SCF

David Van Steenwinckel Belgium

Brian Cardineau United States

Jarich Haitjema Netherlands

G.R. Atkins Australia

Florian Winkler Germany

Christof Pflumm Germany

Yanbo Zou China

Holger Proehl Germany

M. Mihaila Romania

Michael Toerker Germany

David Van Steenwinckel Belgium

Shigeyasu Mori

292 ×0.8

EEE

49 ×0.4

93 ×0.8

90 ×1.3

SCF

29 ×0.6

Citations per year, relative to Shigeyasu Mori Shigeyasu Mori (= 1×) peers David Van Steenwinckel

Countries citing papers authored by Shigeyasu Mori

Since Specialization

Citations

This map shows the geographic impact of Shigeyasu Mori's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Shigeyasu Mori with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Shigeyasu Mori more than expected).

Fields of papers citing papers by Shigeyasu Mori

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Shigeyasu Mori. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Shigeyasu Mori. The network helps show where Shigeyasu Mori may publish in the future.

Co-authorship network of co-authors of Shigeyasu Mori

This figure shows the co-authorship network connecting the top 25 collaborators of Shigeyasu Mori. A scholar is included among the top collaborators of Shigeyasu Mori based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Shigeyasu Mori. Shigeyasu Mori is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Yamashita, Akio, Daisuke Kubota, Mika Jikumaru, et al.. (2014). 21.1: A 513‐ppi FFS‐Mode TFT‐LCD using CAAC Oxide Semiconductor Fabricated by a 6‐Mask Proces. SID Symposium Digest of Technical Papers. 45(1). 263–266. 7 indexed citations

Tsubuku, Masashi, Ryosuke Watanabe, Hideyuki Kishida, et al.. (2013). 16.1: Negative‐Bias Photodegradation Mechanism in InGaZnO TFT. SID Symposium Digest of Technical Papers. 44(1). 166–169. 51 indexed citations

Okazaki, Ken‐ichi, Masahiro Takahashi, Shunsuke Adachi, et al.. (2013). 52.3: Development of Back‐channel‐etched TFT Using C‐Axis Aligned Crystalline In‐Ga‐Zn‐Oxide. SID Symposium Digest of Technical Papers. 44(1). 723–726. 31 indexed citations

Mori, Shigeyasu, et al.. (2010). Preparation of Rat Gingival Mitochondria with an Improved Isolation Method. International Journal of Dentistry. 2010. 1–6. 1 indexed citations

Watanabe, Takeo, et al.. (2000). <title>Lithographic performance and optimization of chemically amplified single-layer resists for EUV lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3997. 600–607. 9 indexed citations

Mori, Shigeyasu, Hiroaki Oizumi, Nobuyuki Matsuzawa, et al.. (2000). Development of Resist Materials for EUVL.. Journal of Photopolymer Science and Technology. 13(3). 385–389. 4 indexed citations

Matsuzawa, Nobuyuki, et al.. (2000). Theoretical estimation of absorption coefficients of various polymers at 13 nm. Microelectronic Engineering. 53(1-4). 671–674. 22 indexed citations

Matsuzawa, Nobuyuki, et al.. (2000). Theoretical calculations of photoabsorption of molecules in the vacuum ultraviolet region. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 375–375. 16 indexed citations

Matsuzawa, Nobuyuki, et al.. (1999). Theoretical Estimation of Absorption Coefficients of Various Polymers at 13nm. Journal of Photopolymer Science and Technology. 12(4). 571–576. 10 indexed citations

10.

Matsuzawa, Nobuyuki, Hiroaki Oizumi, Shigeyasu Mori, et al.. (1999). Theoretical Calculation of Photoabsorption of Various Polymers in an Extreme Ultraviolet Region. Japanese Journal of Applied Physics. 38(12S). 7109–7109. 41 indexed citations

11.

Matsuo, Takahiro, Masayuki Endo, Shigeyasu Mori, et al.. (1998). Advanced Surface Modification Resist Process for ArF Lithography.. Journal of Photopolymer Science and Technology. 11(4). 645–650. 1 indexed citations

12.

Matsuzawa, Nobuyuki, et al.. (1998). Theoretical and Experimental Study on the Silylation of Alcohol Units in ArF Lithography Resists.. Journal of Photopolymer Science and Technology. 11(4). 625–632. 2 indexed citations

13.

Matsuzawa, Nobuyuki, Takeshi Ohfuji, Shigeyasu Mori, et al.. (1998). Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193 nm Lithography II: Protection Groups Containing an Adamantyl Unit. Japanese Journal of Applied Physics. 37(10R). 5781–5781. 3 indexed citations

14.

Mori, Shigeyasu, et al.. (1998). Sub-0.1-µm-Pattern Fabrication Using a 193-nm Top Surface Imaging (TSI) Process. Japanese Journal of Applied Physics. 37(12S). 6734–6734. 3 indexed citations

15.

Mori, Shigeyasu, et al.. (1997). High-sensitivity silylation process for 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3049. 146–146. 11 indexed citations

16.

Mori, Shigeyasu, et al.. (1997). Fabrication of 0.1 µm Patterns Using an Alternating Phase Shift Mask in ArF Excimer Laser Lithography. Japanese Journal of Applied Physics. 36(12S). 7488–7488. 2 indexed citations

17.

Fukushima, Takashi, Narihiro Morosawa, Yukihito Matsuura, & Shigeyasu Mori. (1997). Analysis of Substrate Effect in Chemically Amplified Resist.. Journal of Photopolymer Science and Technology. 10(3). 457–464. 1 indexed citations

18.

Mori, Shigeyasu, et al.. (1996). Substrate effect in chemically amplified resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2724. 131–131. 8 indexed citations

19.

Mori, Shigeyasu, et al.. (1996). Substrate-Effect of Chemically Amplified Resist.. Journal of Photopolymer Science and Technology. 9(4). 601–610. 3 indexed citations

20.

Morita, Hiroshi, Shigeyasu Mori, & Tsuguo Yamaoka. (1988). Excitation Wavelength Dependence of Phosphorescence and Hydrogen-Bonding Formation of Thioxanthone and 2,4-Diisopentylhioxanthone. Bulletin of the Chemical Society of Japan. 61(1). 191–198. 13 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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