Ryan Del Re

628 total citations
11 papers, 519 citations indexed

About

Ryan Del Re is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Ryan Del Re has authored 11 papers receiving a total of 519 indexed citations (citations by other indexed papers that have themselves been cited), including 10 papers in Electrical and Electronic Engineering, 7 papers in Surfaces, Coatings and Films and 4 papers in Biomedical Engineering. Recurrent topics in Ryan Del Re's work include Advancements in Photolithography Techniques (10 papers), Electron and X-Ray Spectroscopy Techniques (7 papers) and Corrosion Behavior and Inhibition (3 papers). Ryan Del Re is often cited by papers focused on Advancements in Photolithography Techniques (10 papers), Electron and X-Ray Spectroscopy Techniques (7 papers) and Corrosion Behavior and Inhibition (3 papers). Ryan Del Re collaborates with scholars based in United States and Switzerland. Ryan Del Re's co-authors include Robert L. Brainard, Yasin Ekinci, Brian Cardineau, Daniel Freedman, Michaela Vockenhuber, Mark Neisser, James Passarelli, D. Freedman, Michael Murphy and I. Bocharova and has published in prestigious journals such as Microelectronic Engineering, Journal of Micro/Nanolithography MEMS and MOEMS and Journal of Photopolymer Science and Technology.

In The Last Decade

Ryan Del Re

11 papers receiving 505 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Ryan Del Re United States	11	449	239	174	66	39	11	519
Brian Cardineau United States	11	467 1.0×	245 1.0×	184 1.1×	73 1.1×	36 0.9×	20	540
Jarich Haitjema Netherlands	12	384 0.9×	211 0.9×	130 0.7×	81 1.2×	26 0.7×	14	460
David Van Steenwinckel Belgium	12	292 0.7×	90 0.4×	93 0.5×	49 0.7×	32 0.8×	26	392
G.R. Atkins Australia	14	450 1.0×	21 0.1×	33 0.2×	137 2.1×	11 0.3×	35	584
Felix Brauße Germany	6	163 0.4×	12 0.1×	94 0.5×	250 3.8×	55 1.4×	10	330
Derek Kozub United States	7	442 1.0×	19 0.1×	37 0.2×	78 1.2×	37 0.9×	7	473
D. Pop Germany	7	73 0.2×	32 0.1×	14 0.1×	70 1.1×	15 0.4×	9	151
Takeshi Tonegawa Japan	7	199 0.4×	8 0.0×	55 0.3×	258 3.9×	44 1.1×	12	376
Yit‐Yian Lua United States	12	225 0.5×	27 0.1×	126 0.7×	152 2.3×	13 0.3×	16	361
Christopher P. Wade United States	4	289 0.6×	17 0.1×	101 0.6×	137 2.1×	7 0.2×	8	347

Countries citing papers authored by Ryan Del Re

Since Specialization

Citations

This map shows the geographic impact of Ryan Del Re's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ryan Del Re with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ryan Del Re more than expected).

Fields of papers citing papers by Ryan Del Re

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ryan Del Re. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ryan Del Re. The network helps show where Ryan Del Re may publish in the future.

Co-authorship network of co-authors of Ryan Del Re

This figure shows the co-authorship network connecting the top 25 collaborators of Ryan Del Re. A scholar is included among the top collaborators of Ryan Del Re based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ryan Del Re. Ryan Del Re is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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11 of 11 papers shown

Re, Ryan Del, James Passarelli, Brian Cardineau, et al.. (2015). Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates. Journal of Micro/Nanolithography MEMS and MOEMS. 14(4). 43506–43506. 46 indexed citations

Re, Ryan Del, Brian Cardineau, Yasin Ekinci, et al.. (2015). Low-LER tin carboxylate photoresists using EUV. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 942221–942221. 18 indexed citations

Re, Ryan Del, James Passarelli, Michael Murphy, et al.. (2015). Platinum and palladium oxalates: positive-tone extreme ultraviolet resists. Journal of Micro/Nanolithography MEMS and MOEMS. 14(4). 43511–43511. 43 indexed citations

Passarelli, James, Michael Murphy, Ryan Del Re, et al.. (2015). High-sensitivity molecular organometallic resist for EUV (MORE). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9425. 94250T–94250T. 46 indexed citations

Re, Ryan Del, James Passarelli, Michaela Vockenhuber, et al.. (2015). Positive-tone EUV resists: complexes of platinum and palladium. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 942227–942227. 15 indexed citations

Passarelli, James, Michael Murphy, Ryan Del Re, et al.. (2015). Organometallic carboxylate resists for extreme ultraviolet with high sensitivity. Journal of Micro/Nanolithography MEMS and MOEMS. 14(4). 43503–43503. 41 indexed citations

Cardineau, Brian, Ryan Del Re, Michaela Vockenhuber, et al.. (2014). EUV resists based on tin-oxo clusters. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9051. 90511B–90511B. 49 indexed citations

Passarelli, James, Brian Cardineau, Ryan Del Re, et al.. (2014). EUV resists comprised of main group organometallic oligomeric materials. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9051. 90512A–90512A. 11 indexed citations

Cardineau, Brian, Ryan Del Re, Michaela Vockenhuber, et al.. (2014). Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm). Microelectronic Engineering. 127. 44–50. 144 indexed citations

10.

Passarelli, James, et al.. (2014). Bismuth Resists for EUV Lithography. Journal of Photopolymer Science and Technology. 27(5). 655–661. 36 indexed citations

11.

Re, Ryan Del, Henry Herbol, I. Bocharova, et al.. (2013). Secondary Electrons in EUV Lithography. Journal of Photopolymer Science and Technology. 26(5). 625–634. 70 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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