R. Zedlitz

464 total citations
16 papers, 385 citations indexed

About

R. Zedlitz is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, R. Zedlitz has authored 16 papers receiving a total of 385 indexed citations (citations by other indexed papers that have themselves been cited), including 16 papers in Electrical and Electronic Engineering, 9 papers in Materials Chemistry and 1 paper in Mechanics of Materials. Recurrent topics in R. Zedlitz's work include Thin-Film Transistor Technologies (14 papers), Plasma Diagnostics and Applications (6 papers) and Silicon and Solar Cell Technologies (6 papers). R. Zedlitz is often cited by papers focused on Thin-Film Transistor Technologies (14 papers), Plasma Diagnostics and Applications (6 papers) and Silicon and Solar Cell Technologies (6 papers). R. Zedlitz collaborates with scholars based in Germany, United Kingdom and United States. R. Zedlitz's co-authors include M. Heintze, M.B. Schubert, G.H. Bauer, F. R. Keßler, S.J. Jones, D. L. Williamson, Felix Hippauf, Stefan Kaskel, Susanne Dörfler and E. Lotter and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Electrochimica Acta.

In The Last Decade

R. Zedlitz

16 papers receiving 375 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
R. Zedlitz Germany 10 331 257 27 26 22 16 385
D. Hrunski Germany 9 337 1.0× 262 1.0× 16 0.6× 28 1.1× 24 1.1× 14 369
Toshiyuki Yoshida Japan 12 197 0.6× 174 0.7× 27 1.0× 50 1.9× 29 1.3× 47 327
T. Roschek Germany 10 487 1.5× 417 1.6× 14 0.5× 24 0.9× 43 2.0× 24 515
E. Leoni France 10 198 0.6× 233 0.9× 24 0.9× 72 2.8× 31 1.4× 20 320
Peter De Schepper Belgium 12 297 0.9× 66 0.3× 16 0.6× 31 1.2× 72 3.3× 43 347
G.H. Lin United States 8 209 0.6× 224 0.9× 26 1.0× 34 1.3× 20 0.9× 18 348
Alessandro Veneroni Italy 10 251 0.8× 57 0.2× 16 0.6× 40 1.5× 22 1.0× 19 313
Lindsey Hall United States 9 325 1.0× 136 0.5× 33 1.2× 64 2.5× 70 3.2× 20 395
Masaaki Tamatani Japan 8 94 0.3× 168 0.7× 5 0.2× 23 0.9× 26 1.2× 21 208
Mike Oertel Germany 6 306 0.9× 280 1.1× 21 0.8× 19 0.7× 18 0.8× 10 348

Countries citing papers authored by R. Zedlitz

Since Specialization
Citations

This map shows the geographic impact of R. Zedlitz's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. Zedlitz with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. Zedlitz more than expected).

Fields of papers citing papers by R. Zedlitz

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by R. Zedlitz. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. Zedlitz. The network helps show where R. Zedlitz may publish in the future.

Co-authorship network of co-authors of R. Zedlitz

This figure shows the co-authorship network connecting the top 25 collaborators of R. Zedlitz. A scholar is included among the top collaborators of R. Zedlitz based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with R. Zedlitz. R. Zedlitz is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

16 of 16 papers shown
1.
Hippauf, Felix, et al.. (2014). Continuous electrooxdiation of sulfuric acid on boron-doped diamond electrodes. Electrochimica Acta. 147. 589–595. 17 indexed citations
2.
Zedlitz, R., M. Heintze, & M.B. Schubert. (1996). Properties of amorphous boron nitride thin films. Journal of Non-Crystalline Solids. 198-200. 403–406. 51 indexed citations
3.
Heintze, M. & R. Zedlitz. (1996). New diagnostic aspects of high rate a-Si:H deposition in a VHF plasma. Journal of Non-Crystalline Solids. 198-200. 1038–1041. 33 indexed citations
4.
Zedlitz, R., et al.. (1996). The Effect of Hydrogen Dilution on the Hot-Wire Deposition of Microcrystalline Silicon. MRS Proceedings. 420. 11 indexed citations
5.
Heintze, M., et al.. (1996). Amorphous and microcrystalline silicon by hot wire chemical vapor deposition. Journal of Applied Physics. 79(5). 2699–2706. 69 indexed citations
6.
Heintze, M., R. Zedlitz, & W. E. Westlake. (1994). Microcrystalline Silicon Thin film Growth and Simultaneous Etching of Amorphous Material. MRS Proceedings. 358. 1 indexed citations
7.
Zedlitz, R., F. R. Keßler, & M. Heintze. (1993). Deposition of a-Si:H with the hot-wire technique. Journal of Non-Crystalline Solids. 164-166. 83–86. 31 indexed citations
8.
Heintze, M., R. Zedlitz, & G.H. Bauer. (1993). Mechanism of High Rate a-Si:H Deposition in a VHF Plasma. MRS Proceedings. 297. 6 indexed citations
9.
Zedlitz, R., E. Lotter, & M. Heintze. (1993). Amorphous hydrogenated silicon carbon from VHF deposition. Journal of Non-Crystalline Solids. 164-166. 1031–1034. 5 indexed citations
10.
Heintze, M. & R. Zedlitz. (1993). VHF plasma deposition for thin‐film solar cells. Progress in Photovoltaics Research and Applications. 1(3). 213–224. 13 indexed citations
11.
Heintze, M., R. Zedlitz, & G.H. Bauer. (1993). Analysis of high-rate a-Si:H deposition in a VHF plasma. Journal of Physics D Applied Physics. 26(10). 1781–1786. 70 indexed citations
12.
Zedlitz, R., M. Heintze, & G.H. Bauer. (1993). An Approach to High Quality a-Ge:H by VHF Deposition. MRS Proceedings. 297. 4 indexed citations
13.
Heintze, M. & R. Zedlitz. (1993). Control of a-Si:H deposition by the ion flux in a VHF plasma. Journal of Non-Crystalline Solids. 164-166. 55–58. 26 indexed citations
14.
Jones, S.J., et al.. (1993). Microstructural transition and degraded opto-electronic properties in amorphous SiGe:H alloys. Applied Physics Letters. 62(25). 3267–3269. 33 indexed citations
15.
Zedlitz, R., M. Heintze, & G.H. Bauer. (1992). Analysis of VHF Glow Discharge of A-SI:H Over a Wide Frequency Range. MRS Proceedings. 258. 9 indexed citations
16.
Schubert, M.B., et al.. (1991). Equilibration temperature of a-Si:H and a-Ge:H from Raman measurements. Journal of Non-Crystalline Solids. 137-138. 195–198. 6 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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