Noboru Nomura

600 total citations
56 papers, 463 citations indexed

About

Noboru Nomura is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Noboru Nomura has authored 56 papers receiving a total of 463 indexed citations (citations by other indexed papers that have themselves been cited), including 38 papers in Electrical and Electronic Engineering, 22 papers in Biomedical Engineering and 13 papers in Surfaces, Coatings and Films. Recurrent topics in Noboru Nomura's work include Advancements in Photolithography Techniques (27 papers), Nanofabrication and Lithography Techniques (16 papers) and Electron and X-Ray Spectroscopy Techniques (9 papers). Noboru Nomura is often cited by papers focused on Advancements in Photolithography Techniques (27 papers), Nanofabrication and Lithography Techniques (16 papers) and Electron and X-Ray Spectroscopy Techniques (9 papers). Noboru Nomura collaborates with scholars based in Japan, United States and South Korea. Noboru Nomura's co-authors include Makoto Akai, Kenji Harafuji, Atsushi Inaba, Yutaka Tonooka, Masafumi Kubota, Masaru Sasago, Hideo Nakagawa, Masayuki Endo, Yukiharu Uraoka and Koji Eriguchi and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Applied Energy.

In The Last Decade

Noboru Nomura

54 papers receiving 447 citations

Peers

Noboru Nomura

EEE

SPS

MMPL

Patrick Schmidt Germany

Greer Gosnell United Kingdom

Leon Mach United States

Pierpaolo Girardi Italy

Stefan Stückrad Germany

Sibylle Braungardt Germany

Zongyi Zhang China

Aya Saito Japan

Chenyao Zhao China

K.W. Chau Hong Kong

Patrick Schmidt Germany

Noboru Nomura

98 ×0.6

EEE

45 ×0.3

34 ×0.3

SPS

21 ×0.2

MMPL

42 ×0.6

Citations per year, relative to Noboru Nomura Noboru Nomura (= 1×) peers Patrick Schmidt

Countries citing papers authored by Noboru Nomura

Since Specialization

Citations

This map shows the geographic impact of Noboru Nomura's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Noboru Nomura with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Noboru Nomura more than expected).

Fields of papers citing papers by Noboru Nomura

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Noboru Nomura. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Noboru Nomura. The network helps show where Noboru Nomura may publish in the future.

Co-authorship network of co-authors of Noboru Nomura

This figure shows the co-authorship network connecting the top 25 collaborators of Noboru Nomura. A scholar is included among the top collaborators of Noboru Nomura based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Noboru Nomura. Noboru Nomura is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Nomura, Noboru. (2012). Computation of multivariate normal probabilities with polar coordinate systems. Journal of Statistical Computation and Simulation. 84(3). 491–512. 4 indexed citations

Nomura, Noboru & Masayuki Sagisaka. (2012). A Survey on Awareness for Biofuel in Kingdom of Thailand. Journal of the Japan Institute of Energy. 91(10). 1007–1015.

Nomura, Noboru. (2011). A Social Survey for Economic Valuation of Health Risk Reduction in Shanghai. Journal of the Japan Institute of Energy. 90(1). 51–58. 1 indexed citations

Nomura, Noboru & Makoto Akai. (2003). Willingness to pay for green electricity in Japan as estimated through contingent valuation method. Applied Energy. 78(4). 453–463. 210 indexed citations

Nomura, Noboru & Hitoshi Ohya. (2001). Interrelationship of Household Electricity Consumption and Family Member Ages.. Journal of the Japan Institute of Energy. 80(8). 727–735. 3 indexed citations

Sasago, Masaru, Masayuki Endo, Satoshi Kobayashi, et al.. (1993). Quarter micron KrF excimer laser lithography. IEICE Transactions on Electronics. 582–587. 2 indexed citations

Yamashita, Kazuhiro, Masayuki Endo, Masaru Sasago, et al.. (1993). Performance of 0.2 μm optical lithography using KrF and ArF excimer laser sources. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 11(6). 2692–2696. 8 indexed citations

Nomura, Noboru, et al.. (1992). Lissajous Electron Plasma (LEP) Generation for Dry Etching. Japanese Journal of Applied Physics. 31(12S). 4332–4332. 3 indexed citations

Harafuji, Kenji, et al.. (1992). Novel Surface Reaction Model in Dry-Etching Process Simulator. Japanese Journal of Applied Physics. 31(12S). 4363–4363. 11 indexed citations

10.

Nakagawa, Hideo, et al.. (1991). A Novel High-Resolution Scanning Electron Microscope for the Surface Analysis of High-Aspect-Ratio Three-Dimensional Structures. Japanese Journal of Applied Physics. 30(9R). 2112–2112. 5 indexed citations

11.

Endo, Masayuki, et al.. (1991). KrF excimer laser lithography technology for 64M DRAM.. Journal of Photopolymer Science and Technology. 4(3). 361–369. 6 indexed citations

12.

Harafuji, Kenji, et al.. (1990). Determination of proximity effect parameters in electron-beam lithography. Journal of Applied Physics. 68(12). 6472–6479. 5 indexed citations

13.

Endo, Masayuki, et al.. (1990). Improved pattern fabrication of naphthoquinonediazide-based deep ultraviolet resist by alkaline surface treatment. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 8(1). 47–50. 2 indexed citations

14.

Yamashita, Kazuhiro, et al.. (1990). Heterodyne holographic nanometer alignment for a half-micron wafer stepper. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1264. 219–219. 3 indexed citations

15.

Hashimoto, Kazuhiko, et al.. (1989). A noncharging direct-write electron beam process for a trilayer resist by ion shower technology. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 39(1-4). 813–816. 4 indexed citations

16.

Endo, Masayuki, Masaru Sasago, Hideo Nakagawa, Atsushi Ueno, & Noboru Nomura. (1989). Development Methods for Submicron Optical Lithography. Japanese Journal of Applied Physics. 28(10R). 2035–2035. 4 indexed citations

17.

Endo, Masayuki, et al.. (1989). Applications of contrast enhancement material to photobleachable deep ultraviolet resist. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 7(5). 1072–1075. 1 indexed citations

18.

Hirai, Yoshihiko, et al.. (1989). Computer Aided Proximity Effect Correction System in Photolithography. Japanese Journal of Applied Physics. 28(10R). 2049–2049. 1 indexed citations

19.

Endo, Masayuki, et al.. (1988). A New Photobleachable Positive Resist for KrF Excimer Laser Lithography. Japanese Journal of Applied Physics. 27(11A). L2219–L2219. 2 indexed citations

20.

Nomura, Noboru, et al.. (1984). An Epitaxial Regrowth of Polysilicon to Single Crystal Silicon By H₂Annealing Process. MRS Proceedings. 33. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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