Morito Matsuoka

637 total citations
33 papers, 528 citations indexed

About

Morito Matsuoka is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Materials Chemistry. According to data from OpenAlex, Morito Matsuoka has authored 33 papers receiving a total of 528 indexed citations (citations by other indexed papers that have themselves been cited), including 22 papers in Electrical and Electronic Engineering, 15 papers in Mechanics of Materials and 14 papers in Materials Chemistry. Recurrent topics in Morito Matsuoka's work include Metal and Thin Film Mechanics (15 papers), Plasma Diagnostics and Applications (12 papers) and Semiconductor materials and devices (7 papers). Morito Matsuoka is often cited by papers focused on Metal and Thin Film Mechanics (15 papers), Plasma Diagnostics and Applications (12 papers) and Semiconductor materials and devices (7 papers). Morito Matsuoka collaborates with scholars based in Japan. Morito Matsuoka's co-authors include Kenichi Ono, S. Tohno, Takashi Inukai, M. Naoe, Y. Hoshi, Koichi Hoshino, Atsushi Shibukawa, Shinji Mino, Akiyuki Tate and N. Sugimoto and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Japanese Journal of Applied Physics.

In The Last Decade

Morito Matsuoka

33 papers receiving 495 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Morito Matsuoka Japan 15 368 264 150 140 137 33 528
Mikiho Kiuchi Japan 6 355 1.0× 165 0.6× 121 0.8× 70 0.5× 76 0.6× 8 438
A. Durandet Australia 13 373 1.0× 201 0.8× 196 1.3× 71 0.5× 62 0.5× 22 510
Masaru Shimada Japan 14 420 1.1× 153 0.6× 72 0.5× 174 1.2× 61 0.4× 48 531
D.K. Reinhard United States 17 443 1.2× 487 1.8× 281 1.9× 159 1.1× 31 0.2× 49 727
G. A. Al‐Jumaily United States 13 321 0.9× 235 0.9× 156 1.0× 82 0.6× 61 0.4× 40 529
J. R. Flemish United States 15 472 1.3× 146 0.6× 70 0.5× 134 1.0× 123 0.9× 47 575
Tatsuo Oomori Japan 17 722 2.0× 153 0.6× 132 0.9× 114 0.8× 117 0.9× 70 798
C. Hor United States 11 395 1.1× 264 1.0× 57 0.4× 142 1.0× 25 0.2× 20 542
John P. Lehan United States 10 216 0.6× 141 0.5× 96 0.6× 78 0.6× 36 0.3× 46 399
J. Holleman Netherlands 14 537 1.5× 295 1.1× 94 0.6× 125 0.9× 79 0.6× 79 636

Countries citing papers authored by Morito Matsuoka

Since Specialization
Citations

This map shows the geographic impact of Morito Matsuoka's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Morito Matsuoka with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Morito Matsuoka more than expected).

Fields of papers citing papers by Morito Matsuoka

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Morito Matsuoka. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Morito Matsuoka. The network helps show where Morito Matsuoka may publish in the future.

Co-authorship network of co-authors of Morito Matsuoka

This figure shows the co-authorship network connecting the top 25 collaborators of Morito Matsuoka. A scholar is included among the top collaborators of Morito Matsuoka based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Morito Matsuoka. Morito Matsuoka is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Matsuoka, Morito & S. Tohno. (1997). Electroluminescence of erbium-doped silicon films as grown by ion beam epitaxy. Applied Physics Letters. 71(1). 96–98. 26 indexed citations
2.
Matsuoka, Morito & S. Tohno. (1996). Ion Beam Epitaxy of in-situ Er-O Co-Doped Silicon Films. MRS Proceedings. 422. 2 indexed citations
3.
Matsuoka, Morito & S. Tohno. (1995). 1.54 μm wavelength emission of erbium-doped silicon films grown by ion beam epitaxy using sputtering-type metal ion source. Applied Physics Letters. 66(15). 1862–1864. 10 indexed citations
4.
Matsuoka, Morito & S. Tohno. (1995). Ion beam epitaxy of silicon films in an ultrahigh vacuum using a sputtering-type metal ion source. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 13(2). 305–313. 15 indexed citations
5.
Matsuoka, Morito, Koichi Hoshino, & Kenichi Ono. (1994). Low-temperature epitaxial growth of BaTiO3 films by radio-frequency-mode electron cyclotron resonance sputtering. Journal of Applied Physics. 76(3). 1768–1775. 29 indexed citations
6.
Matsuoka, Morito & Kenichi Ono. (1991). Ion extraction from microwave plasma excited by ordinary and extraordinary waves and applications to the sputtering deposition. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 9(3). 691–695. 4 indexed citations
7.
Mino, Shinji, Morito Matsuoka, Atsushi Shibukawa, & Kenichi Ono. (1990). Preparation of Bi Iron Garnet Film with a Two-Step Growth Technique. Japanese Journal of Applied Physics. 29(10A). L1823–L1823. 9 indexed citations
8.
Matsuoka, Morito & Kenichi Ono. (1989). Crystal structures and optical properties of ZnO films prepared by sputtering-type electron cyclotron resonance microwave plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 7(5). 2975–2982. 29 indexed citations
9.
Matsuoka, Morito & Kenichi Ono. (1989). New high-rate sputtering-type electron cyclotron resonance microwave plasma using an electric mirror. Applied Physics Letters. 54(17). 1645–1647. 10 indexed citations
10.
Matsuoka, Morito & Kenichi Ono. (1989). A new sputtering-type electron cyclotron resonance microwave plasma using an electric mirror and high-rate deposition. Journal of Applied Physics. 65(11). 4403–4409. 16 indexed citations
11.
Matsuoka, Morito & Kenichi Ono. (1989). Dense plasma production and film deposition by new high-rate sputtering using an electric mirror. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 7(4). 2652–2657. 8 indexed citations
12.
Sugimoto, N., Takashi Inukai, Morito Matsuoka, & Kenichi Ono. (1989). Stress-Induced Perpendicular Magnetic Anisotropy in PtMnSb Thin Films. Japanese Journal of Applied Physics. 28(6R). 1139–1139. 8 indexed citations
13.
Matsuoka, Morito & Kenichi Ono. (1988). Magnetic field gradient effects on ion energy for electron cyclotron resonance microwave plasma stream. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 6(1). 25–29. 94 indexed citations
14.
Matsuoka, Morito & Kenichi Ono. (1988). Ion energy analysis for sputtering-type electron-cyclotron-resonance microwave plasma. Journal of Applied Physics. 64(10). 5179–5182. 18 indexed citations
15.
Matsuoka, Morito, Y. Hoshi, & M. Naoe. (1988). Reactive synthesis of well-oriented zinc-oxide films by means of the facing targets sputtering method. Journal of Applied Physics. 63(6). 2098–2103. 23 indexed citations
16.
Matsuoka, Morito & Kenichi Ono. (1988). Dense plasma production for high rate sputtering by means of an electric mirror. Applied Physics Letters. 53(21). 2025–2027. 5 indexed citations
17.
Matsuoka, Morito, Y. Hoshi, & M. Naoe. (1987). Unbalanced potential discharge characteristics for opposed-targets sputtering system. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 5(1). 52–56. 1 indexed citations
18.
Matsuoka, Morito, Y. Hoshi, & M. Naoe. (1986). rf and dc discharge characteristics for opposed-targets sputtering. Journal of Applied Physics. 60(6). 2096–2102. 17 indexed citations
19.
Inukai, Takashi, Morito Matsuoka, & Kenichi Ono. (1986). Magneto-optical properties of vacuum-deposited PtMnSb thin films. Applied Physics Letters. 49(1). 52–53. 25 indexed citations
20.
Matsuoka, Morito, Y. Hoshi, M. Naoe, & S. Yamanaka. (1984). High‐rate preparation of Co‐Cr films on continuous tape substrates via a targets‐facing type sputtering method (TFTS‐method). Electronics and Communications in Japan (Part I Communications). 67(12). 86–95. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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