Min Hwan Jeon

1.0k total citations
26 papers, 908 citations indexed

About

Min Hwan Jeon is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, Min Hwan Jeon has authored 26 papers receiving a total of 908 indexed citations (citations by other indexed papers that have themselves been cited), including 21 papers in Electrical and Electronic Engineering, 14 papers in Materials Chemistry and 8 papers in Mechanics of Materials. Recurrent topics in Min Hwan Jeon's work include Plasma Diagnostics and Applications (12 papers), 2D Materials and Applications (8 papers) and Semiconductor materials and devices (8 papers). Min Hwan Jeon is often cited by papers focused on Plasma Diagnostics and Applications (12 papers), 2D Materials and Applications (8 papers) and Semiconductor materials and devices (8 papers). Min Hwan Jeon collaborates with scholars based in South Korea, United Kingdom and United States. Min Hwan Jeon's co-authors include Geun Young Yeom, Dong‐Ho Kang, Jin‐Hong Park, Sungjoo Lee, Jaewoo Shim, Sung Kyu Jang, Kyong Nam Kim, Geun Young Yeom, Jaehyeong Lee and Changhwan Choi and has published in prestigious journals such as Advanced Materials, ACS Nano and Carbon.

In The Last Decade

Min Hwan Jeon

24 papers receiving 887 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Min Hwan Jeon South Korea 12 756 524 142 86 63 26 908
Vincent Vandalon Netherlands 17 685 0.9× 679 1.3× 69 0.5× 71 0.8× 90 1.4× 28 869
Seungho Bang South Korea 12 679 0.9× 420 0.8× 171 1.2× 89 1.0× 42 0.7× 24 788
Yu‐Tung Yin Taiwan 14 365 0.5× 452 0.9× 87 0.6× 105 1.2× 89 1.4× 37 624
Weichao Huang China 15 477 0.6× 320 0.6× 39 0.3× 82 1.0× 62 1.0× 64 598
Alexandre Horth Canada 3 379 0.5× 271 0.5× 164 1.2× 62 0.7× 36 0.6× 5 600
Mengmeng Meng China 9 620 0.8× 346 0.7× 54 0.4× 151 1.8× 70 1.1× 21 808
Hyunwoong Seo Japan 13 401 0.5× 257 0.5× 80 0.6× 105 1.2× 196 3.1× 71 626
Christopher M. Smyth United States 18 993 1.3× 554 1.1× 176 1.2× 78 0.9× 73 1.2× 38 1.1k
Xiang Xu China 17 608 0.8× 395 0.8× 163 1.1× 145 1.7× 61 1.0× 35 754
Ethan Kahn United States 13 1.1k 1.4× 552 1.1× 149 1.0× 109 1.3× 176 2.8× 21 1.2k

Countries citing papers authored by Min Hwan Jeon

Since Specialization
Citations

This map shows the geographic impact of Min Hwan Jeon's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Min Hwan Jeon with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Min Hwan Jeon more than expected).

Fields of papers citing papers by Min Hwan Jeon

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Min Hwan Jeon. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Min Hwan Jeon. The network helps show where Min Hwan Jeon may publish in the future.

Co-authorship network of co-authors of Min Hwan Jeon

This figure shows the co-authorship network connecting the top 25 collaborators of Min Hwan Jeon. A scholar is included among the top collaborators of Min Hwan Jeon based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Min Hwan Jeon. Min Hwan Jeon is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Park, Jin Woo, Sung Kyu Jang, Dong‐Ho Kang, et al.. (2017). Layer-controlled thinning of black phosphorus by an Ar ion beam. Journal of Materials Chemistry C. 5(41). 10888–10893. 12 indexed citations
2.
Kang, Dong‐Ho, Min Hwan Jeon, Sung Kyu Jang, et al.. (2017). Self-Assembled Layer (SAL)-Based Doping on Black Phosphorus (BP) Transistor and Photodetector. ACS Photonics. 4(7). 1822–1830. 42 indexed citations
3.
Shim, Jaewoo, Dong‐Ho Kang, Seyong Oh, et al.. (2016). High‐Performance 2D Rhenium Disulfide (ReS2) Transistors and Photodetectors by Oxygen Plasma Treatment. Advanced Materials. 28(32). 6985–6992. 232 indexed citations
4.
Jeon, Min Hwan, et al.. (2016). Etching of Magnetic Tunnel Junction Materials Using Reactive Ion Beam. Journal of Nanoscience and Nanotechnology. 16(11). 11823–11830. 7 indexed citations
5.
Park, Sung-Woo, et al.. (2016). Influence of pulsed bias frequency on the etching of magnetic tunneling junction materials. Vacuum. 127. 82–87. 7 indexed citations
6.
Jo, Seo‐Hyeon, Dong‐Ho Kang, Jaewoo Shim, et al.. (2016). A High‐Performance WSe2/h‐BN Photodetector using a Triphenylphosphine (PPh3)‐Based n‐Doping Technique. Advanced Materials. 28(24). 4824–4831. 154 indexed citations
7.
Pham, Phuong V., Ki Hyun Kim, Min Hwan Jeon, et al.. (2015). Low damage pre-doping on CVD graphene/Cu using a chlorine inductively coupled plasma. Carbon. 95. 664–671. 50 indexed citations
8.
Jeon, Min Hwan, et al.. (2015). Etch Properties of Amorphous Carbon Material Using RF Pulsing in the O<SUB>2</SUB>/N<SUB>2</SUB>/CHF<SUB>3</SUB> Plasma. Journal of Nanoscience and Nanotechnology. 15(11). 8577–8583. 5 indexed citations
9.
Shin, Jae Hee, et al.. (2015). Surface Modification of Block Copolymer Through Sulfur Containing Plasma Treatment. Journal of Nanoscience and Nanotechnology. 15(10). 8093–8098. 1 indexed citations
10.
11.
Jeon, Min Hwan, et al.. (2015). Etch residue removal of CoFeB using CO/NH3 reactive ion beam for spin transfer torque-magnetic random access memory device. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 33(6). 7 indexed citations
12.
Kang, Dong‐Ho, Jaewoo Shim, Sung Kyu Jang, et al.. (2015). Controllable Nondegenerate p-Type Doping of Tungsten Diselenide by Octadecyltrichlorosilane. ACS Nano. 9(2). 1099–1107. 148 indexed citations
13.
Jeon, Min Hwan, Chisung Ahn, Hyeong‐U Kim, et al.. (2015). Controlled MoS2 layer etching using CF4 plasma. Nanotechnology. 26(35). 355706–355706. 56 indexed citations
14.
Jeon, Min Hwan, et al.. (2015). Etch characteristics of magnetic tunnel junction materials using substrate heating in the pulse-biased inductively coupled plasma. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 33(6). 4 indexed citations
15.
Jeon, Min Hwan, et al.. (2014). Etch Characteristics of Magnetic Tunnel Junction Materials Using Bias Pulsing in the CH<SUB>4</SUB>/N<SUB>2</SUB>O Inductively Coupled Plasma. Journal of Nanoscience and Nanotechnology. 14(12). 9541–9547. 1 indexed citations
16.
Pham, Phuong V., Kyong Nam Kim, Min Hwan Jeon, Ki Seok Kim, & Geun Young Yeom. (2014). Cyclic chlorine trap-doping for transparent, conductive, thermally stable and damage-free graphene. Nanoscale. 6(24). 15301–15308. 40 indexed citations
17.
Kim, Sung Hee, et al.. (2013). Plasma Treatment of Thin Film Coated with Graphene Flakes for the Reduction of Sheet Resistance. Journal of Nanoscience and Nanotechnology. 13(12). 8090–8094. 1 indexed citations
18.
Jeon, Min Hwan, et al.. (2013). Selective Etching of Magnetic Tunnel Junction Materials Using CO/NH3 Gas Mixture in Radio Frequency Pulse-Biased Inductively Coupled Plasmas. Japanese Journal of Applied Physics. 52(5S2). 05EB03–05EB03. 11 indexed citations
19.
Mishra, Anurag, Min Hwan Jeon, Kyong Nam Kim, & Geun Young Yeom. (2012). An investigation of the temporal evolution of plasma potential in a 60 MHz/2 MHz pulsed dual-frequency capacitively coupled discharge. Plasma Sources Science and Technology. 21(5). 55006–55006. 20 indexed citations
20.
Kim, Kyong Nam, et al.. (2011). Plasma Characteristics of Internal Inductively Coupled Plasma Source with Ferrite Module. Plasma Chemistry and Plasma Processing. 31(3). 507–515. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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