Michael D. Fleischauer

2.7k citations
58 papers · 2.4k indexed · 1 hit paper · h-index 26

Impact in

Papers in

Michael D. Fleischauer

56 papers receiving 2.4k citations

Hit Papers

Reaction of Li with Alloy Thin Films Studied by In Situ AFM 2003 · 539 citations
5392003202620102018100200300400500

Peers

Michael D. Fleischauer
Comparison fields: 5 of 61
  • Automotive Engineering 521
  • Electrical and Electronic Engineering 2.0k
  • Electronic, Optical and Magnetic Materials 485
  • Surfaces, Coatings and Films 123
  • Polymers and Plastics 225
Replace Jun Kikkawa with:
Jun Kikkawa Japan
Leif Højslet Christensen Denmark
Matthew H. Ervin United States
Julia Maibach Germany
Dongjin Byun South Korea
Shawn Sallis United States
S. D. Beattie Canada
Deniz Wong Germany
Sung Chul Jung South Korea
Binbin Xu China
Michael D. Fleischauer relative to Jun Kikkawa Japan Jun Kikkawa's profile →
Citations per field
00.5×1.5×2.0×
Jun Kikkawa · 1×
Citations per year

Countries citing papers authored by Michael D. Fleischauer

Since Specialization
Citations

This map shows the geographic impact of Michael D. Fleischauer's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Michael D. Fleischauer with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Michael D. Fleischauer more than expected).

Fields of papers citing papers by Michael D. Fleischauer

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Michael D. Fleischauer. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Michael D. Fleischauer. The network helps show where Michael D. Fleischauer may publish in the future.

Co-authors

The 25 scholars most cited alongside Michael D. Fleischauer, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Michael D. Fleischauer Line = papers co-authored together Michael D. Fleischauer links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1 20241
2 20240
3 20243
4 20198
5 201930
6 20129
7 201230
8 20114
9 20119
10 200849
11 200834
12 20086
13 20073
14 200616
15 200625
16 2005167
17
Reaction of Li with Alloy Thin Films Studied by In Situ AFM
Hit paper breakdown →
2003539
18 200387
19 200313
20 20023

About Michael D. Fleischauer

Michael D. Fleischauer is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Automotive Engineering, Atomic and Molecular Physics, and Optics and Materials Chemistry, having authored 58 papers that have together received 2.4k indexed citations. Recurring topics across this work include Advancements in Battery Materials (15 papers), Semiconductor materials and interfaces (12 papers), Optical Coatings and Gratings (12 papers), Semiconductor materials and devices (11 papers), Advanced Battery Materials and Technologies (8 papers), Thin-Film Transistor Technologies (7 papers), Advanced Battery Technologies Research (7 papers) and ZnO doping and properties (7 papers). The work is most often cited by research in Automotive Engineering (521 citations), Electrical and Electronic Engineering (2.0k citations), Electronic, Optical and Magnetic Materials (485 citations), Surfaces, Coatings and Films (123 citations) and Polymers and Plastics (225 citations). Michael D. Fleischauer has collaborated with scholars based in Canada, United States and Germany. Frequent co-authors include J. R. Dahn, T. D. Hatchard, Arman Bonakdarpour, Luc Beaulieu, Michael J. Brett, Jessica M. Topple, M. N. Obrovac, A. D. W. Todd, P. Ferguson and S. Trussler. Their work appears in journals such as Journal of The Electrochemical Society, Thin Solid Films, ACS Applied Materials & Interfaces, Electrochemical and Solid-State Letters and Advanced Functional Materials.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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