Masatoshi Kitagawa

1.6k total citations · 1 hit paper
57 papers, 1.3k citations indexed

About

Masatoshi Kitagawa is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Condensed Matter Physics. According to data from OpenAlex, Masatoshi Kitagawa has authored 57 papers receiving a total of 1.3k indexed citations (citations by other indexed papers that have themselves been cited), including 50 papers in Electrical and Electronic Engineering, 33 papers in Materials Chemistry and 6 papers in Condensed Matter Physics. Recurrent topics in Masatoshi Kitagawa's work include Thin-Film Transistor Technologies (27 papers), Semiconductor materials and devices (25 papers) and Silicon Nanostructures and Photoluminescence (14 papers). Masatoshi Kitagawa is often cited by papers focused on Thin-Film Transistor Technologies (27 papers), Semiconductor materials and devices (25 papers) and Silicon Nanostructures and Photoluminescence (14 papers). Masatoshi Kitagawa collaborates with scholars based in Japan, United Kingdom and China. Masatoshi Kitagawa's co-authors include Takashi Hirao, Yoshihiro Hamakawa, Takuya Matsui, Takashi Minemoto, Yasuhiro Hashimoto, Takeshi Uenoyama, Takayuki Negami, Hideyuki Takakura, Takeshi Kamada and Kentaro Setsune and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Applied Surface Science.

In The Last Decade

Masatoshi Kitagawa

55 papers receiving 1.3k citations

Hit Papers

Theoretical analysis of the effect of conduction band off... 2001 2026 2009 2017 2001 100 200 300 400 500

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Masatoshi Kitagawa Japan 17 1.1k 993 219 142 123 57 1.3k
Tan Fu Lei Taiwan 18 1.3k 1.2× 458 0.5× 318 1.5× 168 1.2× 160 1.3× 178 1.4k
D. Fischer Switzerland 19 1.4k 1.3× 918 0.9× 153 0.7× 145 1.0× 221 1.8× 67 1.5k
D. W. Dong United States 21 1.4k 1.3× 963 1.0× 260 1.2× 335 2.4× 149 1.2× 40 1.6k
D. Vignaud France 20 732 0.7× 890 0.9× 457 2.1× 331 2.3× 136 1.1× 69 1.4k
Peter Harrop United Kingdom 14 601 0.5× 508 0.5× 183 0.8× 133 0.9× 94 0.8× 42 860
C.B. Thomas United Kingdom 19 705 0.6× 762 0.8× 253 1.2× 80 0.6× 92 0.7× 87 1.1k
Swati Ray India 21 1.6k 1.4× 1.5k 1.5× 142 0.6× 210 1.5× 137 1.1× 109 1.8k
Shinji Nozaki Japan 16 441 0.4× 405 0.4× 202 0.9× 71 0.5× 102 0.8× 60 715
Gautam Ganguly United States 16 1.1k 1.0× 883 0.9× 112 0.5× 107 0.8× 51 0.4× 57 1.2k
David A. J. Moran United Kingdom 19 934 0.8× 729 0.7× 244 1.1× 174 1.2× 92 0.7× 68 1.3k

Countries citing papers authored by Masatoshi Kitagawa

Since Specialization
Citations

This map shows the geographic impact of Masatoshi Kitagawa's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Masatoshi Kitagawa with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Masatoshi Kitagawa more than expected).

Fields of papers citing papers by Masatoshi Kitagawa

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Masatoshi Kitagawa. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Masatoshi Kitagawa. The network helps show where Masatoshi Kitagawa may publish in the future.

Co-authorship network of co-authors of Masatoshi Kitagawa

This figure shows the co-authorship network connecting the top 25 collaborators of Masatoshi Kitagawa. A scholar is included among the top collaborators of Masatoshi Kitagawa based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Masatoshi Kitagawa. Masatoshi Kitagawa is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Akiyama, Toshiyuki, Takashi Yamada, Masatoshi Kitagawa, & Tsutae Shinoda. (2009). Discharge analysis of high‐efficacy PDP with a luminous efficacy of 5 lm/W. Journal of the Society for Information Display. 17(2). 121–130. 9 indexed citations
2.
Akiyama, Toshiyuki, Takashi Yamada, Masatoshi Kitagawa, & Tsutae Shinoda. (2008). 27.2: Analysis of Discharges in High Luminous Efficacy PDP with 5lm/W. SID Symposium Digest of Technical Papers. 39(1). 378–381. 4 indexed citations
3.
Toyoda, Hirotaka Toyoda Hirotaka, et al.. (1999). Lower Temperature Deposition of Polycrystalline Silicon Films from a Modified Inductively Coupled Silane Plasma. Japanese Journal of Applied Physics. 38(6R). 3655–3655. 29 indexed citations
4.
Kitagawa, Masatoshi, et al.. (1997). Mechanical Properties of SiO<sub><i>x</i></sub>N<sub><i>y</i></sub> Films Deposited by RF Plasma-Enhanced CVD. Journal of the Ceramic Society of Japan. 105(1218). 161–165.
5.
Deguchi, Masahiro, et al.. (1997). Piezoresistive property of CVD diamond films. Diamond and Related Materials. 6(2-4). 367–373. 22 indexed citations
6.
Toyoda, Hirotaka, Masashi Goto, Masatoshi Kitagawa, Takashi Hirao, & Hideo Sugai Hideo Sugai. (1995). Simple Direct Monitoring of SiH3Radical and Particulates in a Silane Plasma with Ultraviolet Transmission Spectroscopy. Japanese Journal of Applied Physics. 34(4A). L448–L448. 12 indexed citations
7.
Kamada, Takeshi, Shigenori Hayashi, Masatoshi Kitagawa, et al.. (1995). Preparation of La-Modified Lead Titanate Thin Films by Rf-Magnetron Sputtering Method and Their Pyroelectric Properties. Japanese Journal of Applied Physics. 34(2B). L233–L233. 7 indexed citations
8.
Kamada, Takeshi, et al.. (1994). Preparation of Pyroelectric Pb1-xLaxTi1-x/4O3 Thin Films from Ceramic Target by RF Magnetron Sputtering. Japanese Journal of Applied Physics. 33(3B). L443–L443. 10 indexed citations
9.
Kitagawa, Masatoshi, et al.. (1994). Hydrogen, fluorine ion implantation effects on polycrystalline silicon grain boundaries. Solar Energy Materials and Solar Cells. 34(1-4). 211–217. 5 indexed citations
10.
Kitagawa, Masatoshi, et al.. (1993). Substrate Potential Effects on Low-Temperature Preparation of SrTiO3 Thin Films by RF Magnetron Sputtering. Japanese Journal of Applied Physics. 32(12B). L1830–L1830. 11 indexed citations
11.
Uchino, Kiichiro, Katsunori Muraoka, M. Bowden, et al.. (1991). Thomson Scattering Diagnostics of an ECR Processing Plasma. Japanese Journal of Applied Physics. 30(8A). L1425–L1425. 16 indexed citations
13.
Deguchi, Masahiro, et al.. (1990). β-SiC Formation by Low-Energy Ion-Doping Technique. Japanese Journal of Applied Physics. 29(8A). L1493–L1493. 3 indexed citations
14.
Kamada, Takeshi, Takashi Hirao, Masatoshi Kitagawa, et al.. (1988). Annealing behavior of silicon nitride and silicon oxynitride films prepared by ECR plasma CVD method. Applied Surface Science. 33-34. 1094–1100. 2 indexed citations
15.
Hirao, Takashi, et al.. (1988). Incorporation of Constituent Atoms of Transparent Conductive Films into Hydrogenated Amorphous Silicon via Gas Phase. Japanese Journal of Applied Physics. 27(8A). L1395–L1395. 2 indexed citations
16.
Hirao, Takashi, et al.. (1988). Effects of Deposition Method on the Properties of Silicon Nitride and Silicon Oxynitride Films. Japanese Journal of Applied Physics. 27(9R). 1609–1609. 15 indexed citations
17.
Kitagawa, Masatoshi, et al.. (1988). Plasma Ion-Doping Technique with 20 kHz Biased Electron Cyclotron Resonance Discharge. Japanese Journal of Applied Physics. 27(11A). L2139–L2139. 14 indexed citations
18.
Kitagawa, Masatoshi, et al.. (1988). Large Area Doping Technique Using an Ion Source of rf Discharge with Magnetic Field. Japanese Journal of Applied Physics. 27(7A). L1355–L1355. 10 indexed citations
19.
Kitagawa, Masatoshi, et al.. (1987). Low Temperature Preparation of Hydrogenated Amorphous Silicon by Microwave Electron-Cyclotron-Resonance Plasma CVD. Japanese Journal of Applied Physics. 26(4A). L231–L231. 19 indexed citations
20.
Kitagawa, Masatoshi, et al.. (1981). Preparation of High-Conductivity p-Type a-Si:H Films by Penning Discharge. Japanese Journal of Applied Physics. 20(12). 2431–2431. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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