Masataka Kase

806 total citations
111 papers, 551 citations indexed

About

Masataka Kase is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Masataka Kase has authored 111 papers receiving a total of 551 indexed citations (citations by other indexed papers that have themselves been cited), including 91 papers in Electrical and Electronic Engineering, 32 papers in Computational Mechanics and 25 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Masataka Kase's work include Semiconductor materials and devices (50 papers), Integrated Circuits and Semiconductor Failure Analysis (48 papers) and Silicon and Solar Cell Technologies (46 papers). Masataka Kase is often cited by papers focused on Semiconductor materials and devices (50 papers), Integrated Circuits and Semiconductor Failure Analysis (48 papers) and Silicon and Solar Cell Technologies (46 papers). Masataka Kase collaborates with scholars based in Japan, United States and Belgium. Masataka Kase's co-authors include Toshio Seki, Jiro Matsuo, Takaaki Aoki, J. Čatský, Shuichi Satoh, Toshihiko Mori, Takashi Saiki, T. Sugii, Kouichi Hashimoto and Tsutomu Ogawa and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Masataka Kase

100 papers receiving 500 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Masataka Kase Japan 10 438 103 98 81 67 111 551
James W. McCamy United States 12 319 0.7× 65 0.6× 316 3.2× 138 1.7× 61 0.9× 26 511
Joungchel Lee United States 12 239 0.5× 116 1.1× 320 3.3× 111 1.4× 177 2.6× 19 551
P. N. Grillot United States 9 410 0.9× 17 0.2× 181 1.8× 306 3.8× 87 1.3× 22 612
A. Álvarez‐Herrero Spain 13 166 0.4× 19 0.2× 66 0.7× 71 0.9× 123 1.8× 26 373
Miklós Serényi Hungary 12 355 0.8× 31 0.3× 208 2.1× 152 1.9× 53 0.8× 58 459
Traian Dascălu Romania 13 395 0.9× 51 0.5× 48 0.5× 326 4.0× 22 0.3× 56 506
Yiwei Lu United States 10 352 0.8× 59 0.6× 299 3.1× 73 0.9× 73 1.1× 21 449
Zachary Lingley United States 11 261 0.6× 35 0.3× 203 2.1× 112 1.4× 58 0.9× 43 397
Haowei Chen China 16 503 1.1× 36 0.3× 106 1.1× 518 6.4× 124 1.9× 60 717
Nathaniel Groothoff Australia 14 712 1.6× 80 0.8× 14 0.1× 332 4.1× 68 1.0× 48 767

Countries citing papers authored by Masataka Kase

Since Specialization
Citations

This map shows the geographic impact of Masataka Kase's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Masataka Kase with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Masataka Kase more than expected).

Fields of papers citing papers by Masataka Kase

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Masataka Kase. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Masataka Kase. The network helps show where Masataka Kase may publish in the future.

Co-authorship network of co-authors of Masataka Kase

This figure shows the co-authorship network connecting the top 25 collaborators of Masataka Kase. A scholar is included among the top collaborators of Masataka Kase based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Masataka Kase. Masataka Kase is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Matsuo, Jiro, Masataka Kase, Takaaki Aoki, & Toshio Seki. (2011). ION IMPLANTATION TECHNOLOGY 2101: 18th International Conference on Ion Implantation Technology IIT 2010. 1321. 3 indexed citations
2.
Tsukamoto, K., T. Kuroi, Yoji Kawasaki, et al.. (2011). Evolution of Ion Implantation Technology and its Contribution to Semiconductor Industry. AIP conference proceedings. 9–16. 5 indexed citations
3.
Toyoda, Noriaki, Isao Yamada, Jiro Matsuo, et al.. (2011). Vacuum Pressure Dependence On Surface Reaction Induced By Gas Cluster Ions Studied With In-situ XPS. AIP conference proceedings. 290–293. 5 indexed citations
4.
Vizir, A. V., V. I. Gushenets, A. Hershcovitch, et al.. (2011). Ion Source of Pure Single Charged Boron Based on Planar Magnetron Discharge in Self-Sputtering Mode. AIP conference proceedings. 472–475. 2 indexed citations
5.
Matsuo, Jiro, et al.. (2011). N- and P-Type Cluster Source. AIP conference proceedings. 452–455. 1 indexed citations
6.
Uchida, Takashi, M. Muramatsu, A. Kitagawa, et al.. (2011). Synthesis of Endohedral Fullerene Using ECR Ion Source. AIP conference proceedings. 480–483. 7 indexed citations
7.
Kenmotsu, Takahiro, Naoki Miyamoto, M. Wada, et al.. (2011). Erosion of Extraction Electrodes of Ion Sources due to Sputtering. AIP conference proceedings. 325–328. 3 indexed citations
8.
Matsuo, Jiro, et al.. (2011). Dose Control System in the Optima XE Single Wafer High Energy Ion Implanter. AIP conference proceedings. 380–383. 1 indexed citations
9.
Matsuo, Jiro, et al.. (2011). Angle Performance on Optima XE. AIP conference proceedings. 373–375. 5 indexed citations
10.
Matsumoto, Takeshi, Masayuki Naito, Jiro Matsuo, et al.. (2011). Nissin Ion Doping System—H[sub 2]+] Implantation for Silicon Layer Exfoliation. AIP conference proceedings. 392–395. 1 indexed citations
11.
Pavelka, T., et al.. (2011). Leakage Current Measurements by Junction Photovoltage Technique. AIP conference proceedings. 444–447. 1 indexed citations
12.
Bogdanowicz, Janusz, Trudo Clarysse, Alain Moussa, et al.. (2011). Non-Destructive Characterization of Activated Ion-Implanted Doping Profiles Based on Photomodulated Optical Reflectance. AIP conference proceedings. 220–224. 1 indexed citations
13.
Ikeda, Keiji, T. Miyashita, T. Kubo, et al.. (2008). Advanced junction profile design scheme by low-temperature millisecond annealing and co-implant for high performance CMOS. 188–189. 2 indexed citations
14.
15.
Kase, Masataka, et al.. (2006). 65nm Device Characteristics Matching on Single and Batch System Ion Implanter. AIP conference proceedings. 866. 645–648. 2 indexed citations
16.
Mori, Toshihiko, K. Inoue, K. Kobayashi, et al.. (2005). A novel strain enhanced CMOS architecture using selectively deposited high tensile and high compressive silicon nitride films. 213–216. 84 indexed citations
17.
Gotō, Kenichi, Hiromichi Ohta, Hiroshi Morioka, et al.. (2004). High performance 25 nm gate CMOSFETs for 65 nm node high speed MPUs. 27.1.1–27.1.4. 18 indexed citations
18.
Tamura, Nobumichi & Masataka Kase. (2003). A proper lifetime-prediction method of PMOSFET with 1.1 nm gate dielectrics in the lower testing voltage region. 578–579. 1 indexed citations
19.
Kase, Masataka, et al.. (1993). B diffusion in Si predamaged with Si+ or Ge+ and preannealed at 200–1000°C. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 74(1-2). 75–79. 4 indexed citations
20.
Kase, Masataka & J. Čatský. (1983). Post-illumination burst of carbon dioxide inPhaseolus vulgaris L. as affected by leaf temperature. Biologia Plantarum. 25(3). 225–230. 5 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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