M. K. Dawood

597 total citations
24 papers, 494 citations indexed

About

M. K. Dawood is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, M. K. Dawood has authored 24 papers receiving a total of 494 indexed citations (citations by other indexed papers that have themselves been cited), including 18 papers in Electrical and Electronic Engineering, 9 papers in Biomedical Engineering and 6 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in M. K. Dawood's work include Integrated Circuits and Semiconductor Failure Analysis (12 papers), Semiconductor materials and devices (11 papers) and Force Microscopy Techniques and Applications (5 papers). M. K. Dawood is often cited by papers focused on Integrated Circuits and Semiconductor Failure Analysis (12 papers), Semiconductor materials and devices (11 papers) and Force Microscopy Techniques and Applications (5 papers). M. K. Dawood collaborates with scholars based in Singapore, United States and Russia. M. K. Dawood's co-authors include W. K. Choi, Minghui Hong, Henry I. Smith, Carl V. Thompson, R. Rajagopalan, Han Zheng, Kam W. Leong, Y. L. Foo, S. Tripathy and Saif A. Khan and has published in prestigious journals such as Nano Letters, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

M. K. Dawood

22 papers receiving 480 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
M. K. Dawood Singapore 8 337 262 203 114 85 24 494
Ishan Wathuthanthri United States 15 307 0.9× 280 1.1× 184 0.9× 130 1.1× 102 1.2× 29 612
T. Clement United States 6 271 0.8× 244 0.9× 205 1.0× 141 1.2× 90 1.1× 8 488
Mariusz Graczyk Sweden 13 524 1.6× 451 1.7× 119 0.6× 67 0.6× 214 2.5× 33 680
Ulrich Plachetka Germany 15 694 2.1× 505 1.9× 94 0.5× 115 1.0× 176 2.1× 35 827
Jeff Dailey United States 7 193 0.6× 214 0.8× 149 0.7× 114 1.0× 53 0.6× 12 391
Nicholas C. Linn United States 9 322 1.0× 169 0.6× 140 0.7× 207 1.8× 130 1.5× 9 512
Kazuya Ushiyama Japan 3 225 0.7× 321 1.2× 127 0.6× 221 1.9× 117 1.4× 5 522
J.-G. Fan United States 7 154 0.5× 90 0.3× 151 0.7× 162 1.4× 46 0.5× 8 361
M. Lemiti France 16 222 0.7× 515 2.0× 360 1.8× 44 0.4× 142 1.7× 56 669
Victor Callegari Switzerland 9 429 1.3× 297 1.1× 144 0.7× 81 0.7× 141 1.7× 15 627

Countries citing papers authored by M. K. Dawood

Since Specialization
Citations

This map shows the geographic impact of M. K. Dawood's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. K. Dawood with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. K. Dawood more than expected).

Fields of papers citing papers by M. K. Dawood

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M. K. Dawood. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. K. Dawood. The network helps show where M. K. Dawood may publish in the future.

Co-authorship network of co-authors of M. K. Dawood

This figure shows the co-authorship network connecting the top 25 collaborators of M. K. Dawood. A scholar is included among the top collaborators of M. K. Dawood based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with M. K. Dawood. M. K. Dawood is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Dawood, M. K., et al.. (2020). On the Mechanism of High Forward Voltage of InGaN Light Emitting Diodes. 1–6. 1 indexed citations
2.
Tan, P.K., M. K. Dawood, Huanhuan Feng, et al.. (2015). Top-down delayering to expose large inspection area on die side-edge with Platinum (Pt) deposition technique. Microelectronics Reliability. 55(9-10). 1611–1616. 7 indexed citations
3.
Huang, Yuqiong, P.K. Tan, Haidong Feng, et al.. (2015). Two planar polishing methods by using FIB technique: Toward ultimate top-down delayering for failure analysis. AIP Advances. 5(12). 7 indexed citations
4.
Feng, Huanhuan, P.K. Tan, Yuzhe Zhao, et al.. (2015). A sample preparation methodology to reduce sample edge unevenness and improve efficiency in delayering the 20-nm node IC chips. 459–464. 4 indexed citations
5.
Tan, P.K., M. K. Dawood, Huanhuan Feng, et al.. (2014). Application of Fast Laser Deprocessing Techniques in Physical Failure Analysis on SRAM Memory of Advance Technology. Proceedings - International Symposium for Testing and Failure Analysis. 30927. 268–273. 3 indexed citations
6.
Dawood, M. K., et al.. (2014). On-chip device and circuit diagnostics on advanced technology nodes by nanoprobing. 135–139. 1 indexed citations
7.
Tan, P.K., M. K. Dawood, Seung Jae Moon, et al.. (2014). Nanoprobing EBAC technique to reveal the failure root cause of gate oxide reliability issues of an IC process. 10–15. 7 indexed citations
8.
Feng, Huanhuan, P.K. Tan, Yuzhe Zhao, et al.. (2014). Investigation of Protection Layer Materials for Ex-Situ Lift-Out TEM Sample Preparation with FIB for 14 nm FinFET. Proceedings - International Symposium for Testing and Failure Analysis. 30927. 469–473. 1 indexed citations
9.
Tan, P.K., Jeffrey Lam, Ting Hui Ng, et al.. (2013). Application of Laser Deprocessing Techniques in Physical Failure Analysis. Proceedings - International Symposium for Testing and Failure Analysis. 80224. 563–568. 5 indexed citations
10.
11.
Lam, Jeffrey, et al.. (2013). UV-Raman Microscopy on the Analysis of Ultra-Low-K Dielectric Materials on Patterned Wafers. Advanced materials research. 740. 680–689.
12.
Tan, P.K., Zhihong Mai, Ting Hui Ng, et al.. (2012). Fault Isolation Techniques and Studies on Low Resistance Gross Short Failures. Proceedings - International Symposium for Testing and Failure Analysis. 39791. 406–410.
13.
Dawood, M. K., Lei Zhou, Han Zheng, et al.. (2012). Nanostructured Si-nanowire microarrays for enhanced-performance bio-analytics. Lab on a Chip. 12(23). 5016–5016. 17 indexed citations
14.
Dawood, M. K., Han Zheng, Nicholas A. Kurniawan, et al.. (2012). Modulation of surface wettability of superhydrophobic substrates using Si nanowire arrays and capillary-force-induced nanocohesion. Soft Matter. 8(13). 3549–3549. 26 indexed citations
15.
Dawood, M. K., et al.. (2012). Hierarchical materials synthesis at soft all-aqueous interfaces. Soft Matter. 8(14). 3924–3924. 5 indexed citations
16.
17.
Zhu, Mei, Lei Zhou, M. K. Dawood, et al.. (2011). Creation of nanostructures by interference lithography for modulation of cell behavior. Nanoscale. 3(7). 2723–2723. 17 indexed citations
18.
Dawood, M. K., et al.. (2010). Interference lithographically defined and catalytically etched, large-area silicon nanocones from nanowires. Nanotechnology. 21(20). 205305–205305. 40 indexed citations
19.
Pey, K. L., et al.. (2007). Full Range Work Function Tuning of MOSFETs using Interfacial Yttrium Layer in fully Germanided Ni Gate. ECS Transactions. 6(1). 271–277. 1 indexed citations
20.
Pey, K. L., W. K. Choi, M. K. Dawood, et al.. (2007). The Effect of an Yttrium Interlayer on a Ni Germanided Metal Gate Workfunction in $\hbox{SiO}_{2}/\hbox{HfO}_{2}$. IEEE Electron Device Letters. 28(12). 1098–1101. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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