Ken Yukimura

1.7k total citations
144 papers, 1.4k citations indexed

About

Ken Yukimura is a scholar working on Mechanics of Materials, Materials Chemistry and Electrical and Electronic Engineering. According to data from OpenAlex, Ken Yukimura has authored 144 papers receiving a total of 1.4k indexed citations (citations by other indexed papers that have themselves been cited), including 111 papers in Mechanics of Materials, 97 papers in Materials Chemistry and 94 papers in Electrical and Electronic Engineering. Recurrent topics in Ken Yukimura's work include Metal and Thin Film Mechanics (105 papers), Diamond and Carbon-based Materials Research (76 papers) and Plasma Diagnostics and Applications (59 papers). Ken Yukimura is often cited by papers focused on Metal and Thin Film Mechanics (105 papers), Diamond and Carbon-based Materials Research (76 papers) and Plasma Diagnostics and Applications (59 papers). Ken Yukimura collaborates with scholars based in Japan, China and United Kingdom. Ken Yukimura's co-authors include Koichi Takaki, Chuanxian Ding, Yingchun Zhu, Pingyu Zhang, Toshiro Maruyama, Shinji Kambara, Hisato Ogiso, S. Masamune, Shizuka Nakano and Xinxin Ma and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and International Journal of Hydrogen Energy.

In The Last Decade

Ken Yukimura

138 papers receiving 1.3k citations

Author Peers

Peers are selected by citation overlap in the author's most active subfields. citations · hero ref

Author Last Decade Papers Cites
Ken Yukimura 901 869 585 347 189 144 1.4k
Rodrigo Perito Cardoso 556 0.6× 557 0.6× 277 0.5× 444 1.3× 186 1.0× 71 1.1k
Vincent Rat 677 0.8× 551 0.6× 382 0.7× 394 1.1× 769 4.1× 55 1.5k
Jean-François Coudert 705 0.8× 592 0.7× 339 0.6× 454 1.3× 1.1k 5.6× 77 1.7k
V. Buck 744 0.8× 619 0.7× 255 0.4× 348 1.0× 47 0.2× 64 1.1k
Stanislav Mráz 1.2k 1.4× 1.2k 1.3× 681 1.2× 371 1.1× 155 0.8× 75 1.8k
J. Ramm 706 0.8× 913 1.1× 559 1.0× 375 1.1× 323 1.7× 84 1.4k
Sonia Patricia Brühl 657 0.7× 721 0.8× 146 0.2× 349 1.0× 78 0.4× 66 948
S. Berg 745 0.8× 877 1.0× 912 1.6× 49 0.1× 83 0.4× 33 1.4k
F. J. Worzala 800 0.9× 1.1k 1.2× 653 1.1× 306 0.9× 122 0.6× 31 1.5k
H.‐J. Spies 640 0.7× 876 1.0× 253 0.4× 306 0.9× 121 0.6× 84 1.0k

Countries citing papers authored by Ken Yukimura

Since Specialization
Citations

This map shows the geographic impact of Ken Yukimura's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ken Yukimura with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ken Yukimura more than expected).

Fields of papers citing papers by Ken Yukimura

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ken Yukimura. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ken Yukimura. The network helps show where Ken Yukimura may publish in the future.

Co-authorship network of co-authors of Ken Yukimura

This figure shows the co-authorship network connecting the top 25 collaborators of Ken Yukimura. A scholar is included among the top collaborators of Ken Yukimura based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ken Yukimura. Ken Yukimura is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Takahashi, Katsuyuki, et al.. (2021). Silicon Wafer Etching Rate Characteristics with Burst Width Using 150 kHz Band High-Power Burst Inductively Coupled Plasma. Micromachines. 12(6). 599–599. 3 indexed citations
2.
Takahashi, Katsuyuki, Seiji Mukaigawa, Koichi Takaki, et al.. (2020). Silicon wafer etching by pulsed high-power inductively coupled Ar/CF 4 plasma with 150 kHz band frequency. Japanese Journal of Applied Physics. 59(SH). SHHE04–SHHE04. 7 indexed citations
3.
Nakao, Setsuo, Ken Yukimura, Shizuka Nakano, & Hisato Ogiso. (2013). DLC Coating by HiPIMS: The Influence of Substrate Bias Voltage. IEEE Transactions on Plasma Science. 41(8). 1819–1829. 43 indexed citations
4.
Li, Zhongwen, et al.. (2012). The Structure and Mechanical Properties of Cr4Mo4V Steel Treated by PIII Carbonitriding. Rare Metal Materials and Engineering. 41. 176–179.
5.
Feng, Xingguo, et al.. (2012). Structure and properties of multi-targets magnetron sputtered ZrNbTaTiW multi-elements alloy thin films. Surface and Coatings Technology. 228. S424–S427. 45 indexed citations
6.
Azuma, Kingo, et al.. (2011). Comparative study of high-power pulsed sputtering (HPPS) glow plasma techniques using Penning discharge and hollow-cathode discharge. Surface and Coatings Technology. 206(5). 938–942. 9 indexed citations
7.
Yukimura, Ken, Arutiun P. Ehiasarian, Hisato Ogiso, Shizuka Nakano, & Kingo Azuma. (2011). Metal Ionization in a High-Power Pulsed Sputtering Penning Discharge. IEEE Transactions on Plasma Science. 39(11). 3125–3132. 11 indexed citations
8.
Takaki, Koichi, Takayuki Murakami, Seiji Mukaigawa, Tamiya Fujiwara, & Ken Yukimura. (2010). Production of Titanium-Containing Carbon Plasma Using Shunting Arc Discharge for Hybrid Film Deposition. Japanese Journal of Applied Physics. 49(4R). 46001–46001. 3 indexed citations
9.
Yukimura, Ken, et al.. (2008). Generation of droplet‐free high‐power pulsed sputtering (HPPS) glow plasma with several tens of kilowatts. physica status solidi (a). 205(4). 949–952. 17 indexed citations
10.
Kambara, Shinji, et al.. (2008). Hydrogen oxidation in H2/O2/N2 gas mixture by pulsed DBD at atmospheric pressure. International Journal of Hydrogen Energy. 33(22). 6792–6799. 4 indexed citations
11.
Yukimura, Ken, et al.. (2005). Amorphous carbon film deposition by PBII&D using shunting arc discharge. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 242(1-2). 321–323. 7 indexed citations
12.
Ma, Xinxin, Guangze Tang, Mingren Sun, & Ken Yukimura. (2004). Characteristics of TiN films deposited on a trench-shaped sample prepared by plasma-based ion implantation and deposition. Surface and Coatings Technology. 196(1-3). 100–103. 1 indexed citations
13.
Yukimura, Ken. (2003). Plasma Based Ion Implantation and Deposition. 29(5). 182–187. 1 indexed citations
14.
Yukimura, Ken, Masao Kumagai, Ken Numata, et al.. (2003). Coating and ion implantation to the inner surface of a pipe by metal plasma-based ion implantation and deposition. Surface and Coatings Technology. 169-170. 411–414. 6 indexed citations
15.
Yukimura, Ken. (2001). Plasma-based ion implantation and its application to three-dimensional materials. Surface and Coatings Technology. 136(1-3). 1–6. 8 indexed citations
16.
Yukimura, Ken, et al.. (2000). NOx removal using ammonia radicals prepared by intermittent dielectric barrier discharge in atmospheric pressure. Kyoto University Research Information Repository (Kyoto University). 486–489. 1 indexed citations
17.
Ishikawa, Shinya, et al.. (2000). The surface modification of poly(tetrafluoroethylene) film using dielectric barrier discharge of intermittent pulse voltage. Surface and Coatings Technology. 130(1). 52–56. 30 indexed citations
18.
Yukimura, Ken, T. Maruyama, Yoshikazu Suzuki, et al.. (1999). Titanium nitride coating on implanted layer using titanium plasma based ion implantation. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms. 148(1-4). 37–41. 19 indexed citations
19.
Yukimura, Ken, et al.. (1998). Titanium ion implantation into silicon substrate by plasma-based metal ion implantation system with 100-kV/2.5-A pulse modulator. Surface and Coatings Technology. 103-104. 252–256. 7 indexed citations
20.
Sakakibara, Shin‐ichi & Ken Yukimura. (1996). Transition characteristics to Arc Discharge of KrF Excimer-Laser Pumping Discharge. IEEJ Transactions on Fundamentals and Materials. 116(8). 705–711. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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