Ken Yukimura

1.7k total citations
144 papers, 1.4k citations indexed

About

Ken Yukimura is a scholar working on Mechanics of Materials, Materials Chemistry and Electrical and Electronic Engineering. According to data from OpenAlex, Ken Yukimura has authored 144 papers receiving a total of 1.4k indexed citations (citations by other indexed papers that have themselves been cited), including 111 papers in Mechanics of Materials, 97 papers in Materials Chemistry and 94 papers in Electrical and Electronic Engineering. Recurrent topics in Ken Yukimura's work include Metal and Thin Film Mechanics (105 papers), Diamond and Carbon-based Materials Research (76 papers) and Plasma Diagnostics and Applications (59 papers). Ken Yukimura is often cited by papers focused on Metal and Thin Film Mechanics (105 papers), Diamond and Carbon-based Materials Research (76 papers) and Plasma Diagnostics and Applications (59 papers). Ken Yukimura collaborates with scholars based in Japan, China and United Kingdom. Ken Yukimura's co-authors include Koichi Takaki, Chuanxian Ding, Pingyu Zhang, Yingchun Zhu, Toshiro Maruyama, Shinji Kambara, Hisato Ogiso, S. Masamune, Shizuka Nakano and Xinxin Ma and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and International Journal of Hydrogen Energy.

In The Last Decade

Ken Yukimura

138 papers receiving 1.3k citations

Peers

Countries citing papers authored by Ken Yukimura

Since Specialization

Citations

This map shows the geographic impact of Ken Yukimura's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ken Yukimura with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ken Yukimura more than expected).

Fields of papers citing papers by Ken Yukimura

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ken Yukimura. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ken Yukimura. The network helps show where Ken Yukimura may publish in the future.

Co-authorship network of co-authors of Ken Yukimura

This figure shows the co-authorship network connecting the top 25 collaborators of Ken Yukimura. A scholar is included among the top collaborators of Ken Yukimura based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ken Yukimura. Ken Yukimura is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Silicon Wafer Etching Rate Characteristics with Burst Width Using 150 kHz Band High-Power Burst Inductively Coupled Plasma 2021 ·Micromachines ·(unknown), Katsuyuki Takahashi, Seiji Mukaigawa, Koichi Takaki, Ken Yukimura	3
2	Silicon wafer etching by pulsed high-power inductively coupled Ar/CF ₄ plasma with 150 kHz band frequency 2020 ·Japanese Journal of Applied Physics ·(unknown), (unknown), Katsuyuki Takahashi, Seiji Mukaigawa, Koichi Takaki, Ken Yukimura, Hisato Ogiso, Shizuka Nakano	7
3	Carbon Ion Production Using a High-Power Impulse Magnetron Sputtering Glow Plasma 2013 ·IEEE Transactions on Plasma Science ·Ken Yukimura, Hisato Ogiso, Setsuo Nakao, Koichi Takaki	12
4	The Structure and Mechanical Properties of Cr4Mo4V Steel Treated by PIII Carbonitriding 2012 ·Rare Metal Materials and Engineering ·(unknown), Zhongwen Li, (unknown), (unknown), (unknown), lt, strong gt, (unknown), Ken Yukimura	0
5	Comparative study of high-power pulsed sputtering (HPPS) glow plasma techniques using Penning discharge and hollow-cathode discharge 2011 ·Surface and Coatings Technology ·Kingo Azuma, (unknown), Ken Yukimura, (unknown), (unknown)	9
6	Metal Ionization in a High-Power Pulsed Sputtering Penning Discharge 2011 ·IEEE Transactions on Plasma Science ·Ken Yukimura, Arutiun P. Ehiasarian, Hisato Ogiso, Shizuka Nakano, Kingo Azuma	11
7	Production of Titanium-Containing Carbon Plasma Using Shunting Arc Discharge for Hybrid Film Deposition 2010 ·Japanese Journal of Applied Physics ·Koichi Takaki, Takayuki Murakami, Seiji Mukaigawa, Tamiya Fujiwara, Ken Yukimura	3
8	Generation of droplet‐free high‐power pulsed sputtering (HPPS) glow plasma with several tens of kilowatts 2008 ·physica status solidi (a) ·Ken Yukimura, (unknown), (unknown), (unknown)	17
9	Electrical Characteristics and Zirconia Film Preparation by a Zirconium-Oxygen Plasma using a Positively Biased Electrode 2007 ·Plasma Processes and Polymers ·Ken Yukimura, (unknown), Yoshiyuki Suda, Xinxin Ma, (unknown)	1
10	Influence of ion-bombardment-energy on thin zirconium oxide films prepared by dual frequency oxygen plasma sputtering 2006 ·Surface and Coatings Technology ·Yasunori Ohtsu, (unknown), T. Misawa, H. Fujita, Ken Yukimura, Morito Akiyama	16
11	Optimum Conditions for NO Reduction Using Intermittent Dielectric Barrier Discharge at Atmospheric Pressure 2005 ·Japanese Journal of Applied Physics ·Shinji Kambara, (unknown), Hiroshi Moritomi, (unknown), (unknown), Ken Yukimura, Toshiro Maruyama	7
12	Plasma Based Ion Implantation and Deposition 2003 ·Ken Yukimura	1
13	Coating and ion implantation to the inner surface of a pipe by metal plasma-based ion implantation and deposition 2003 ·Surface and Coatings Technology ·Ken Yukimura, (unknown), Masao Kumagai, (unknown), Ken Numata, Hidenori Saito, Toshiro Maruyama, Xinxin Ma	6
14	A two-switch mode pulse modulator for plasma-based ion implantation and deposition 2003 ·Ken Yukimura, (unknown)	1
15	NOx removal using ammonia radicals prepared by intermittent dielectric barrier discharge in atmospheric pressure 2000 ·Kyoto University Research Information Repository (Kyoto University) ·(unknown), Ken Yukimura, Shinji Kambara, Toshiro Maruyama	1
16	Titanium nitride coating on implanted layer using titanium plasma based ion implantation 1999 ·Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ·(unknown), Ken Yukimura, T. Maruyama, (unknown), Yoshikazu Suzuki, Akiyoshi Chayahara, A. Kinomura, Y. Horino	19
17	Titanium ion implantation into silicon substrate by plasma-based metal ion implantation system with 100-kV/2.5-A pulse modulator 1998 ·Surface and Coatings Technology ·Ken Yukimura, (unknown), (unknown), (unknown), Yoshikazu Suzuki, A. Kinomura, Akiyoshi Chayahara, Y. Horino	7
18	Shunting Arc Generation of a Heated Wire in a Low Pressure Gas =Fundamental Research of Pulsed Ion Source= 1998 ·IEEJ Transactions on Fundamentals and Materials ·Ken Yukimura	4
19	Transition characteristics to Arc Discharge of KrF Excimer-Laser Pumping Discharge 1996 ·IEEJ Transactions on Fundamentals and Materials ·Shin‐ichi Sakakibara, Ken Yukimura	1
20	Phase Change of an Exploding Wire in Water 1976 ·IEEJ Transactions on Fundamentals and Materials ·(unknown), Ken Yukimura	2

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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