J.S. Suehle

496 total citations
19 papers, 380 citations indexed

About

J.S. Suehle is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, J.S. Suehle has authored 19 papers receiving a total of 380 indexed citations (citations by other indexed papers that have themselves been cited), including 19 papers in Electrical and Electronic Engineering, 4 papers in Biomedical Engineering and 2 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in J.S. Suehle's work include Semiconductor materials and devices (16 papers), Integrated Circuits and Semiconductor Failure Analysis (9 papers) and Advancements in Semiconductor Devices and Circuit Design (9 papers). J.S. Suehle is often cited by papers focused on Semiconductor materials and devices (16 papers), Integrated Circuits and Semiconductor Failure Analysis (9 papers) and Advancements in Semiconductor Devices and Circuit Design (9 papers). J.S. Suehle collaborates with scholars based in United States, Ireland and Germany. J.S. Suehle's co-authors include Richard E. Cavicchi, S. Semancik, M. Clayton Wheeler, Jason E. Tiffany, Don L. DeVoe, Balaji Panchapakesan, G. E. Poirier, R.M. Walton, P. Chaparala and K.G. Kreider and has published in prestigious journals such as Sensors and Actuators B Chemical, IEEE Electron Device Letters and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

In The Last Decade

J.S. Suehle

15 papers receiving 368 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
J.S. Suehle United States 8 333 213 155 60 40 19 380
R.M. Walton United States 7 307 0.9× 257 1.2× 193 1.2× 82 1.4× 35 0.9× 11 374
B. Kloeck Switzerland 7 317 1.0× 205 1.0× 91 0.6× 88 1.5× 98 2.5× 14 373
Shunshuo Cai China 10 303 0.9× 123 0.6× 99 0.6× 51 0.8× 53 1.3× 16 402
Huidong Li China 12 515 1.5× 135 0.6× 76 0.5× 68 1.1× 99 2.5× 28 576
Xiaoyuan Xia China 9 261 0.8× 173 0.8× 75 0.5× 58 1.0× 195 4.9× 21 377
Michael DiBattista United States 7 304 0.9× 137 0.6× 88 0.6× 165 2.8× 29 0.7× 24 353
Robert G. Manley United States 10 232 0.7× 213 1.0× 55 0.4× 110 1.8× 47 1.2× 43 412
E Siyu China 8 332 1.0× 170 0.8× 101 0.7× 16 0.3× 27 0.7× 12 384
Jiushuai Xu Germany 12 294 0.9× 264 1.2× 111 0.7× 68 1.1× 184 4.6× 40 411

Countries citing papers authored by J.S. Suehle

Since Specialization
Citations

This map shows the geographic impact of J.S. Suehle's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J.S. Suehle with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J.S. Suehle more than expected).

Fields of papers citing papers by J.S. Suehle

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J.S. Suehle. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J.S. Suehle. The network helps show where J.S. Suehle may publish in the future.

Co-authorship network of co-authors of J.S. Suehle

This figure shows the co-authorship network connecting the top 25 collaborators of J.S. Suehle. A scholar is included among the top collaborators of J.S. Suehle based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J.S. Suehle. J.S. Suehle is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

19 of 19 papers shown
1.
Chaparala, P. & J.S. Suehle. (2005). Thin Oxide Reliability. 155–155.
2.
3.
4.
Suehle, J.S., et al.. (2003). Detecting breakdown in ultra-thin dielectrics using a fast voltage ramp. 118–123. 9 indexed citations
5.
6.
Suehle, J.S., et al.. (2003). A technique to predict gate oxide reliability using fast on-line ramped Q/sub BD/ testing. 7. 292–297. 2 indexed citations
7.
8.
Wang, Bin, J.S. Suehle, Eric M. Vogel, & J.B. Bernstein. (2002). The effect of stress interruption and pulsed biased stress on ultra-thin gate dielectric reliability. 74–79. 4 indexed citations
9.
Suehle, J.S., et al.. (2002). Investigation of the intrinsic SiO/sub 2/ area dependence using TDDB testing. 22–25. 1 indexed citations
10.
Suehle, J.S., et al.. (2002). A new physics-based model for time-dependent-dielectric-breakdown. i. 72–80. 1 indexed citations
11.
Semancik, S., Richard E. Cavicchi, M. Clayton Wheeler, et al.. (2001). Microhotplate platforms for chemical sensor research. Sensors and Actuators B Chemical. 77(1-2). 579–591. 233 indexed citations
12.
Cavicchi, Richard E., S. Semancik, J.S. Suehle, et al.. (1998). In situ conductivity characterization of oxide thin film growth phenomena on microhotplates. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 16(1). 131–138. 13 indexed citations
13.
Suehle, J.S., et al.. (1998). A new technique for determining long-term TDDB acceleration parameters of thin gate oxides. IEEE Electron Device Letters. 19(7). 219–221. 10 indexed citations
14.
Suehle, J.S., et al.. (1996). A new physics-based model for time-dependent-dielectric-breakdown. 84–92. 16 indexed citations
15.
Martin, Andreas, J.S. Suehle, P. Chaparala, P. O'Sullivan, & A. Mathewson. (1996). A new oxide degradation mechanism for stresses in the Fowler-Nordheim tunneling regime. 67–76. 15 indexed citations
16.
Chaparala, P., et al.. (1996). Electric Field Dependent Dielectric Breakdown of Intrinsic Si02 Films IJnder Dynamic Stress. 5 indexed citations
17.
Semancik, S., Richard E. Cavicchi, K.G. Kreider, J.S. Suehle, & P. Chaparala. (1996). Selected-area deposition of multiple active films for conductometric microsensor arrays. Sensors and Actuators B Chemical. 34(1-3). 209–212. 38 indexed citations
18.
Suehle, J.S. & P. Chaparala. (1995). Time-Dependent Dielectric Breakdown in Thin Intrinsic SiO2 Films. MRS Proceedings. 386. 3 indexed citations
19.
Suehle, J.S., et al.. (1995). TDDB characterisation of thin SiO/sub 2/ films with bimodal failure populations. 124–130. 25 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by R.M. Walton Breakdown of academic impact, for papers by B. Kloeck Breakdown of academic impact, for papers by Shunshuo Cai Breakdown of academic impact, for papers by Huidong Li Breakdown of academic impact, for papers by Xiaoyuan Xia Breakdown of academic impact, for papers by Michael DiBattista Breakdown of academic impact, for papers by Robert G. Manley Breakdown of academic impact, for papers by E Siyu Breakdown of academic impact, for papers by Jiushuai Xu
Rankless by CCL
2026