John Kuehne

627 total citations
28 papers, 336 citations indexed

About

John Kuehne is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Biomedical Engineering. According to data from OpenAlex, John Kuehne has authored 28 papers receiving a total of 336 indexed citations (citations by other indexed papers that have themselves been cited), including 23 papers in Electrical and Electronic Engineering, 6 papers in Electronic, Optical and Magnetic Materials and 5 papers in Biomedical Engineering. Recurrent topics in John Kuehne's work include Semiconductor materials and devices (17 papers), Advancements in Semiconductor Devices and Circuit Design (9 papers) and Thin-Film Transistor Technologies (6 papers). John Kuehne is often cited by papers focused on Semiconductor materials and devices (17 papers), Advancements in Semiconductor Devices and Circuit Design (9 papers) and Thin-Film Transistor Technologies (6 papers). John Kuehne collaborates with scholars based in United States, Australia and China. John Kuehne's co-authors include Clark R. Wilson, Stuart Johnson, W. Ting, G. Q. Lo, Habib N. Najm, R. A. Chapman, Ajit Paranjpe, Masoud Moslehi, Man Wong and C. W. Magee and has published in prestigious journals such as Journal of Geophysical Research Atmospheres, Applied Physics Letters and IEEE Transactions on Electron Devices.

In The Last Decade

John Kuehne

26 papers receiving 305 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
John Kuehne United States 11 192 106 57 57 36 28 336
Atsushi Mukai Japan 11 45 0.2× 51 0.5× 12 0.2× 23 0.4× 13 0.4× 35 312
Chris S. Hanson United States 9 57 0.3× 34 0.3× 170 3.0× 20 0.4× 13 0.4× 24 275
Mohan Liu China 10 131 0.7× 20 0.2× 103 1.8× 13 0.2× 21 0.6× 37 310
Harunori Yoshikawa France 14 119 0.6× 14 0.1× 30 0.5× 53 0.9× 36 1.0× 51 535
Martin E. Caldwell United Kingdom 10 79 0.4× 13 0.1× 125 2.2× 9 0.2× 25 0.7× 33 323
Zahir A. Daya Canada 11 113 0.6× 14 0.1× 4 0.1× 20 0.4× 71 2.0× 21 322
P. R. Wilson Australia 10 23 0.1× 13 0.1× 150 2.6× 106 1.9× 11 0.3× 30 311
J. P. Marque France 11 202 1.1× 32 0.3× 55 1.0× 77 1.4× 18 314
Zainol Abidin Ibrahim Malaysia 13 164 0.9× 12 0.1× 347 6.1× 17 0.3× 11 0.3× 45 577

Countries citing papers authored by John Kuehne

Since Specialization
Citations

This map shows the geographic impact of John Kuehne's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by John Kuehne with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites John Kuehne more than expected).

Fields of papers citing papers by John Kuehne

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by John Kuehne. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by John Kuehne. The network helps show where John Kuehne may publish in the future.

Co-authorship network of co-authors of John Kuehne

This figure shows the co-authorship network connecting the top 25 collaborators of John Kuehne. A scholar is included among the top collaborators of John Kuehne based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with John Kuehne. John Kuehne is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Megremis, Spiro, et al.. (2012). An Evaluation of Selected Vinyl Polysiloxane and Vinyl Polysiloxane–Hybrid Elastomeric Impression Materials. The Journal of the American Dental Association. 143(4). 405–406. 2 indexed citations
2.
3.
Chapman, R. A., et al.. (2002). High performance sub-half micron CMOS using rapid thermal processing. ed 32. 101–104. 8 indexed citations
4.
Hattangady, S. V., R. Kraft, Matthew Douglas, et al.. (2002). Ultrathin nitrogen-profile engineered gate dielectric films. 495–498. 19 indexed citations
5.
Ma, Tso‐Ping, et al.. (1998). Tunneling spectroscopy of the silicon metal-oxide-semiconductor system. 261–265. 3 indexed citations
6.
Kuehne, John, et al.. (1997). Nitric Oxide Rapid Thermal Nitridation of Thin Gate Oxides. MRS Proceedings. 470. 1 indexed citations
7.
HASEGAWA, Eiji, et al.. (1997). Quantitative inelastic tunneling spectroscopy in the silicon metal-oxide-semiconductor system. Applied Physics Letters. 71(17). 2523–2525. 28 indexed citations
8.
Kuehne, John, et al.. (1997). Gate Stack Formation using a Fully Integrated Single Wafer Cluster Tool. MRS Proceedings. 470.
9.
Kuehne, John, Clark R. Wilson, & Stuart Johnson. (1996). Estimates of the Chandler wobble frequency and Q. Journal of Geophysical Research Atmospheres. 101(B6). 13573–13579. 26 indexed citations
10.
Moslehi, Mehrdad M., Ajit Paranjpe, John Kuehne, et al.. (1994). Fast-cycle-time single-wafer IC manufacturing. Microelectronic Engineering. 25(2-4). 93–130. 1 indexed citations
11.
Duncan, W. M., et al.. (1994). High-speed spectral ellipsometry for in situ diagnostics and process control. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(4). 2779–2784. 15 indexed citations
12.
Kuehne, John, Stuart Johnson, & Clark R. Wilson. (1993). Atmospheric excitation of nonseasonal polar motion. Journal of Geophysical Research Atmospheres. 98(B11). 19973–19978. 38 indexed citations
13.
Henck, Steven A., W. M. Duncan, Lee M. Loewenstein, & John Kuehne. (1993). <title>In-situ spectral ellipsometry for real-time thickness measurement and control</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1803. 299–308. 3 indexed citations
14.
Moslehi, Masoud, R. A. Chapman, Man Wong, et al.. (1992). Single-wafer integrated semiconductor device processing. IEEE Transactions on Electron Devices. 39(1). 4–32. 56 indexed citations
15.
Lo, G. Q., W. Ting, Jinho Ahn, Dim‐Lee Kwong, & John Kuehne. (1992). Thin fluorinated gate dielectrics grown by rapid thermal processing in O/sub 2/ with diluted NF/sub 3/. IEEE Transactions on Electron Devices. 39(1). 148–153. 14 indexed citations
16.
Moslehi, Mehrdad M., et al.. (1991). In-Situ Fabrication and Process Control Techniques in Rapid Thermal Processing. MRS Proceedings. 224. 9 indexed citations
17.
Kuehne, John & Clark R. Wilson. (1991). Terrestrial water storage and polar motion. Journal of Geophysical Research Atmospheres. 96(B3). 4337–4345. 47 indexed citations
18.
Ahn, Jinho, G. Q. Lo, W. Ting, et al.. (1991). Radiation hardened metal-oxide-semiconductor devices with gate dielectrics grown by rapid thermal processing in O2 with diluted NF3. Applied Physics Letters. 58(4). 425–427. 13 indexed citations
19.
Lo, G. Q., W. Ting, Dim‐Lee Kwong, John Kuehne, & C. W. Magee. (1990). MOS characteristics of fluorinated gate dielectrics grown by rapid thermal processing in O/sub 2/ with diluted NF/sub 3/. IEEE Electron Device Letters. 11(11). 511–513. 16 indexed citations
20.
Wilson, Clark R., John Kuehne, & Zhian Li. (1988). Computation of water storage contributions to polar motion. Symposium - International Astronomical Union. 128. 381–384. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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