John Åhlund

1.2k citations
25 papers · 985 indexed · h-index 19

John Åhlund

25 papers receiving 965 citations

Peers

John Åhlund
Comparison fields: 5 of 52
  • Surfaces, Coatings and Films 137
  • Electrochemistry 75
  • Renewable Energy, Sustainability and the Environment 194
  • Materials Chemistry 554
  • Electrical and Electronic Engineering 538
Replace K. Heister with:
K. Heister Germany
О. В. Молодцова Russia
Juhan Matthias Kahk United Kingdom
A. Shaporenko Germany
Shushi Suzuki Japan
Thomas Schedel‐Niedrig Germany
Mohamad Hojeij Switzerland
Ryo Toyoshima Japan
Fabrizio Evangelista Italy
Matteo Jugovac Italy
John Åhlund relative to K. Heister Germany K. Heister's profile →
Citations per field
00.5×1.5×2.3×
K. Heister · 1×
Citations per year

Countries citing papers authored by John Åhlund

Since Specialization
Citations

This map shows the geographic impact of John Åhlund's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by John Åhlund with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites John Åhlund more than expected).

Fields of papers citing papers by John Åhlund

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by John Åhlund. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by John Åhlund. The network helps show where John Åhlund may publish in the future.

Co-authorship network

The 25 scholars most cited alongside John Åhlund, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with John Åhlund Line = papers co-authored together John Åhlund links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1 201962
2 201712
3 20164
4 201524
5 201523
6 201533
7 201510
8 201459
9 201210
10 201020
11 200929
12 20083
13 200778
14 200732
15 200731
16 200752
17 2006115
18 200571
19 200496
20 200358

About John Åhlund

John Åhlund is a scholar working on Surfaces, Coatings and Films, Radiation, Atomic and Molecular Physics, and Optics, Electrochemistry and Materials Chemistry, having authored 25 papers that have together received 985 indexed citations. Recurring topics across this work include Electron and X-Ray Spectroscopy Techniques (12 papers), Molecular Junctions and Nanostructures (11 papers), Surface Chemistry and Catalysis (9 papers), Surface and Thin Film Phenomena (6 papers), X-ray Spectroscopy and Fluorescence Analysis (5 papers), Electronic and Structural Properties of Oxides (5 papers), Advanced Chemical Physics Studies (4 papers) and Porphyrin and Phthalocyanine Chemistry (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (137 citations), Electrochemistry (75 citations), Renewable Energy, Sustainability and the Environment (194 citations), Materials Chemistry (554 citations) and Electrical and Electronic Engineering (538 citations). John Åhlund has collaborated with scholars based in Sweden, United Kingdom and United States. Frequent co-authors include Carla Puglia, Katharina Nilson, N. Mårtensson, J. Schiessling, Barbara Brena, Hans Siegbahn, M. Nyberg, Yi Luo, Patrik Karlsson and Emmanuelle Göthelid. Their work appears in journals such as The Journal of Chemical Physics, Review of Scientific Instruments, Surface Science, Journal of Electron Spectroscopy and Related Phenomena and The Journal of Physical Chemistry C.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026