J. Shepard

1.8k total citations
43 papers, 1.3k citations indexed

About

J. Shepard is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Materials Chemistry. According to data from OpenAlex, J. Shepard has authored 43 papers receiving a total of 1.3k indexed citations (citations by other indexed papers that have themselves been cited), including 30 papers in Electrical and Electronic Engineering, 19 papers in Biomedical Engineering and 18 papers in Materials Chemistry. Recurrent topics in J. Shepard's work include Semiconductor materials and devices (19 papers), Acoustic Wave Resonator Technologies (15 papers) and Ferroelectric and Piezoelectric Materials (13 papers). J. Shepard is often cited by papers focused on Semiconductor materials and devices (19 papers), Acoustic Wave Resonator Technologies (15 papers) and Ferroelectric and Piezoelectric Materials (13 papers). J. Shepard collaborates with scholars based in United States, Switzerland and Germany. J. Shepard's co-authors include Susan Trolier‐McKinstry, S. Ogura, E. Kim, Roy G. Gordon, Dennis M. Hausmann, P.J. Tsang, D.L. Critchlow, William W. Walker, Paul Moses and Isaku Kanno and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

J. Shepard

43 papers receiving 1.2k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
J. Shepard United States 14 952 604 424 175 105 43 1.3k
T. Tamagawa United States 16 909 1.0× 376 0.6× 251 0.6× 89 0.5× 161 1.5× 51 1.1k
Yuichi Kurashima Japan 18 770 0.8× 295 0.5× 395 0.9× 153 0.9× 141 1.3× 122 1.0k
A. K. Kulkarni United States 13 597 0.6× 524 0.9× 210 0.5× 196 1.1× 114 1.1× 32 874
Erik Sleeckx Belgium 19 967 1.0× 422 0.7× 230 0.5× 165 0.9× 169 1.6× 74 1.1k
H.S. Reehal United Kingdom 14 549 0.6× 526 0.9× 255 0.6× 109 0.6× 154 1.5× 54 868
Chee Won Chung South Korea 16 695 0.7× 565 0.9× 193 0.5× 244 1.4× 179 1.7× 129 1.0k
Walter K. Njoroge Germany 11 1.1k 1.1× 1.3k 2.1× 357 0.8× 360 2.1× 80 0.8× 22 1.4k
I. Friedrich Germany 11 915 1.0× 1.2k 1.9× 416 1.0× 314 1.8× 116 1.1× 19 1.3k
Jeung‐hyun Jeong South Korea 24 943 1.0× 945 1.6× 141 0.3× 113 0.6× 185 1.8× 62 1.2k
Sean Wu Taiwan 18 556 0.6× 486 0.8× 440 1.0× 146 0.8× 110 1.0× 100 1.1k

Countries citing papers authored by J. Shepard

Since Specialization
Citations

This map shows the geographic impact of J. Shepard's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Shepard with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Shepard more than expected).

Fields of papers citing papers by J. Shepard

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. Shepard. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Shepard. The network helps show where J. Shepard may publish in the future.

Co-authorship network of co-authors of J. Shepard

This figure shows the co-authorship network connecting the top 25 collaborators of J. Shepard. A scholar is included among the top collaborators of J. Shepard based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. Shepard. J. Shepard is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Hayden, John, J. Shepard, & Jon‐Paul Maria. (2023). Ferroelectric Al1−xBxN thin films integrated on Si. Applied Physics Letters. 123(7). 8 indexed citations
2.
Cartier, E., Takashi Ando, M. Hopstaken, et al.. (2013). Characterization and optimization of charge trapping in high-k dielectrics. 5A.2.1–5A.2.7. 9 indexed citations
3.
Dai, Min, Jinping Liu, Dechao Guo, et al.. (2011). A novel atomic layer oxidation technique for EOT scaling in gate-last high-к/metal gate CMOS technology. 86. 28.5.1–28.5.4. 6 indexed citations
4.
Shepard, J., et al.. (2010). Experimental investigation of the rapid thermal process slip window. 28–31. 1 indexed citations
5.
6.
Shepard, J. & Lewis Johnson. (2009). Implementing Sustainable Institutional Practices. Journal of Education for Sustainable Development. 3(2). 217–220. 2 indexed citations
7.
Callegari, Agnese, P. Jamison, D. Neumayer, et al.. (2006). Electron mobility dependence on annealing temperature of W∕HfO2 gate stacks: The role of the interfacial layer. Journal of Applied Physics. 99(2). 4 indexed citations
8.
Maria, Jon‐Paul, J. Shepard, Susan Trolier‐McKinstry, Thomas R. Watkins, & E. Andrew Payzant. (2005). Characterization of the Piezoelectric Properties of Pb 0.98 Ba 0.02 (Mg 1/3 Nb 2/3 )O 3 –PbTiO 3 Epitaxial Thin Films. International Journal of Applied Ceramic Technology. 2(1). 51–58. 17 indexed citations
9.
Gordon, Roy G., Dennis M. Hausmann, E. Kim, & J. Shepard. (2003). A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches. Chemical Vapor Deposition. 9(2). 73–78. 322 indexed citations
10.
Zeto, Robert J., Madan Dubey, Matthew H. Ervin, et al.. (2002). High-resolution dry etch patterning of PZT for piezoelectric MEMS devices. 444. 89–92. 5 indexed citations
11.
Shepard, J.. (1998). The investigation of biaxial stress effects and the transverse piezoelectric (d(31)) characterization of lead zirconate titanate thin films. PhDT. 3 indexed citations
12.
Trolier‐McKinstry, Susan, et al.. (1998). Piezoelectricity in ferroelectric thin films: Domain and stress issues. Ferroelectrics. 206(1). 381–392. 36 indexed citations
13.
Chu, F., Fei Xu, J. Shepard, & Susan Trolier‐McKinstry. (1997). Thickness Dependence of the Electrical Properties of Sol-Gel Derived Lead Zirconate Titanate Thin Films with (111) and (100) Texture. MRS Proceedings. 493. 13 indexed citations
14.
Trolier‐McKinstry, Susan, Clive A. Randall, Jon‐Paul Maria, et al.. (1996). Size Effects and Domains in Ferroelectric Thin Film Actuators. MRS Proceedings. 433. 33 indexed citations
15.
Shepard, J., Susan Trolier‐McKinstry, Mary A. Hendrickson, & Robert J. Zeto. (1996). Properties of PZT thin films as a function of in-plane biaxial stress. 161–165 vol.1. 15 indexed citations
16.
Ogura, S., et al.. (1982). An Optimized Half Micron Device Using The Double-Implanted Lightly Doped Drain/Source Structure. Symposium on VLSI Technology. 42–43. 3 indexed citations
17.
Tsang, P.J., S. Ogura, William W. Walker, J. Shepard, & D.L. Critchlow. (1982). Fabrication of High-Performance LDDFET's with Oxide Sidewall-Spacer Technology. IEEE Journal of Solid-State Circuits. 17(2). 220–226. 2 indexed citations
18.
Tsang, P.J., S. Ogura, William W. Walker, J. Shepard, & D.L. Critchlow. (1982). Fabrication of high-performance LDDFET's with Oxide sidewall-spacer technology. IEEE Transactions on Electron Devices. 29(4). 590–596. 81 indexed citations
19.
Ogura, S., P.J. Tsang, William W. Walker, D.L. Critchlow, & J. Shepard. (1981). Elimination of hot electron gate current by the lightly doped drain-source structure. 651–654. 23 indexed citations
20.
Ogura, S., P.J. Tsang, William W. Walker, D.L. Critchlow, & J. Shepard. (1980). Design and Characteristics of the Lightly Doped Drain-Source (LDD) Insulated Gate Field-Effect Transistor. IEEE Journal of Solid-State Circuits. 15(4). 424–432. 37 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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