J. Ringling

778 total citations
28 papers, 604 citations indexed

About

J. Ringling is a scholar working on Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering and Condensed Matter Physics. According to data from OpenAlex, J. Ringling has authored 28 papers receiving a total of 604 indexed citations (citations by other indexed papers that have themselves been cited), including 25 papers in Atomic and Molecular Physics, and Optics, 20 papers in Electrical and Electronic Engineering and 5 papers in Condensed Matter Physics. Recurrent topics in J. Ringling's work include Laser-Matter Interactions and Applications (12 papers), Laser Design and Applications (10 papers) and Advancements in Photolithography Techniques (6 papers). J. Ringling is often cited by papers focused on Laser-Matter Interactions and Applications (12 papers), Laser Design and Applications (10 papers) and Advancements in Photolithography Techniques (6 papers). J. Ringling collaborates with scholars based in Germany, United States and Russia. J. Ringling's co-authors include O. Kittelmann, F. Noack, O. Brandt, K. H. Ploog, H.‐J. Wünsche, F. Henneberger, Valentin Petrov, Jeff Squier, G. Korn and F. Seifert and has published in prestigious journals such as Physical Review Letters, Physical review. B, Condensed matter and Applied Physics Letters.

In The Last Decade

J. Ringling

28 papers receiving 576 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
J. Ringling Germany 15 421 263 134 114 106 28 604
A. Brénac France 14 487 1.2× 173 0.7× 95 0.7× 199 1.7× 87 0.8× 38 646
Germain Guiraud France 15 430 1.0× 325 1.2× 113 0.8× 285 2.5× 99 0.9× 38 759
S. Roy India 13 293 0.7× 178 0.7× 79 0.6× 329 2.9× 112 1.1× 43 558
Yoshihiko Shibata Japan 13 280 0.7× 213 0.8× 314 2.3× 178 1.6× 154 1.5× 33 680
Kunihiko Uwai Japan 15 556 1.3× 512 1.9× 175 1.3× 361 3.2× 48 0.5× 39 788
T. Quast Germany 8 444 1.1× 226 0.9× 92 0.7× 99 0.9× 130 1.2× 21 632
S. Pawlik Switzerland 12 732 1.7× 293 1.1× 61 0.5× 158 1.4× 113 1.1× 14 870
S. Sethuraman United States 7 178 0.4× 97 0.4× 152 1.1× 387 3.4× 70 0.7× 9 693
A. Raizman Israel 16 344 0.8× 465 1.8× 57 0.4× 252 2.2× 73 0.7× 58 647
S.J. Hillenius United States 19 299 0.7× 593 2.3× 145 1.1× 178 1.6× 179 1.7× 49 951

Countries citing papers authored by J. Ringling

Since Specialization
Citations

This map shows the geographic impact of J. Ringling's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Ringling with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Ringling more than expected).

Fields of papers citing papers by J. Ringling

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. Ringling. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Ringling. The network helps show where J. Ringling may publish in the future.

Co-authorship network of co-authors of J. Ringling

This figure shows the co-authorship network connecting the top 25 collaborators of J. Ringling. A scholar is included among the top collaborators of J. Ringling based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. Ringling. J. Ringling is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Stamm, Uwe, J. Kleinschmidt, K. Gäbel, et al.. (2005). EUV sources for EUV lithography in alpha-, beta-, and high volume chip manufacturing: an update on GDPP and LPP technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5751. 236–236. 13 indexed citations
2.
Stamm, Uwe, J. Kleinschmidt, Imtiaz Ahmad, et al.. (2004). EUV source power and lifetime: the most critical issues for EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 133–133. 13 indexed citations
3.
Stamm, Uwe, Imtiaz Ahmad, István Balogh, et al.. (2003). High-power EUV lithography sources based on gas discharges and laser-produced plasmas. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5037. 119–119. 33 indexed citations
4.
Stamm, Uwe, Imtiaz Ahmad, Alexander S. Ivanov, et al.. (2002). High-power EUV sources for lithography: a comparison of laser-produced plasma and gas-discharge-produced plasma. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4688. 122–122. 13 indexed citations
5.
Ahmad, Imtiaz, Alexander S. Ivanov, J. Kleinschmidt, et al.. (2002). Development of high-power EUV sources for lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4688. 626–626. 13 indexed citations
6.
Waltereit, Patrick, O. Brandt, J. Ringling, & K. H. Ploog. (2001). Electrostatic fields and compositional fluctuations in (In,Ga)N/GaN multiple quantum wells grown by plasma-assisted molecular-beam epitaxy. Physical review. B, Condensed matter. 64(24). 21 indexed citations
7.
Brandt, O., J. Ringling, A. Trampert, et al.. (2000). Optical properties of heavily dopedGaN/(Al,Ga)Nmultiple quantum wells grown on6H−SiC(0001)by reactive molecular-beam epitaxy. Physical review. B, Condensed matter. 61(23). 16025–16028. 21 indexed citations
8.
Petrov, Valentin, Fabıan Rotermund, F. Noack, et al.. (1999). Frequency conversion of Ti:sapphire-based femtosecond laser systems to the 200-nm spectral region using nonlinear optical crystals. IEEE Journal of Selected Topics in Quantum Electronics. 5(6). 1532–1542. 22 indexed citations
9.
Jahn, U., R. Nötzel, J. Ringling, et al.. (1999). Exciton capture and losses in a stacked submicron array of sidewall quantum wires on patternedGaAs(311)Asubstrates. Physical review. B, Condensed matter. 60(15). 11038–11044. 8 indexed citations
10.
Brandt, O., Bin Yang, H.‐J. Wünsche, et al.. (1998). Impact of exciton diffusion on the optical properties of thin GaN layers. Physical review. B, Condensed matter. 58(20). R13407–R13410. 9 indexed citations
11.
Stert, V., W. Radloff, J. Ringling, et al.. (1997). Ultrafast dynamics of ammonia clusters excited by femtosecond VUV laser pulses. Chemical Physics Letters. 269(5-6). 523–529. 21 indexed citations
12.
13.
Kittelmann, O., J. Ringling, G. Korn, A. Nazarkin, & I. V. Hertel. (1996). Generation of broadly tunable femtosecond vacuum-ultraviolet pulses. Optics Letters. 21(15). 1159–1159. 14 indexed citations
14.
Kittelmann, O., J. Ringling, A. Nazarkin, G. Korn, & I. V. Hertel. (1996). Direct Observation of Coherent Medium Response under the Condition of Two-Photon Excitation of Krypton by Femtosecond UV-Laser Pulses. Physical Review Letters. 76(15). 2682–2685. 17 indexed citations
15.
Seifert, F., J. Ringling, F. Noack, O. Kittelmann, & Valentin Petrov. (1995). All-solid-state laser system for the generation of tunable femtosecond light pulses in the vacuum UV down to 172.7 nm. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2380. 73–73. 1 indexed citations
16.
Kittelmann, O. & J. Ringling. (1994). Intensity-dependent transmission properties of window materials at 193-nm irradiation. Optics Letters. 19(24). 2053–2053. 19 indexed citations
17.
Ringling, J., et al.. (1994). <title>Femtosecond solid state light sources tunable around 193 nm</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2116. 56–65. 3 indexed citations
18.
Petrov, Valentin, F. Seifert, O. Kittelmann, J. Ringling, & F. Noack. (1994). Extension of the tuning range of a femtosecond Ti:sapphire laser amplifier through cascaded second-order nonlinear frequency conversion processes. Journal of Applied Physics. 76(12). 7704–7712. 17 indexed citations
19.
Ringling, J., et al.. (1994). High-repetition-rate high-power femtosecond ArF laser source. Optics Letters. 19(20). 1639–1639. 11 indexed citations
20.
Ringling, J., G. Korn, Jeff Squier, O. Kittelmann, & F. Noack. (1993). Tunable femtosecond pulses in the near vacuum ultraviolet generated by frequency conversion of amplified Ti:sapphire laser pulses. Optics Letters. 18(23). 2035–2035. 81 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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