J. Hoekstra

12 papers receiving 484 citations

Peers

J. Hoekstra
Comparison fields: 5 of 35
  • Electrical and Electronic Engineering 390
  • Atomic and Molecular Physics, and Optics 297
  • Materials Chemistry 173
  • Mechanical Engineering 58
  • Electrochemistry 49
Replace Hiroshi Osanai with:
Hiroshi Osanai Japan
C. Horie Japan
A. R. Chourasia United States
P. Sibillot France
A.M. Bonnot France
L. Grazulis United States
P C Jaussaud France
A. T. Blumenau Germany
H. K. Yow Malaysia
C. C. Tsai United States
J. Hoekstra relative to Hiroshi Osanai Japan Hiroshi Osanai's profile →
Citations per field
00.5×2.6×
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Citations per year

Countries citing papers authored by J. Hoekstra

Since Specialization
Citations

This map shows the geographic impact of J. Hoekstra's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Hoekstra with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Hoekstra more than expected).

Fields of papers citing papers by J. Hoekstra

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. Hoekstra. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Hoekstra. The network helps show where J. Hoekstra may publish in the future.

Co-authorship network of co-authors of J. Hoekstra

This figure shows the co-authorship network connecting the top 25 collaborators of J. Hoekstra. A scholar is included among the top collaborators of J. Hoekstra based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. Hoekstra. J. Hoekstra is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

12 of 12 papers shown
#WorkIndexed citations
1 48
2 4
3 126
4 33
5 65
6 22
7 62
8 72
9 5
10 8
11 59
12 2

About J. Hoekstra

J. Hoekstra is a scholar working on Metals and Alloys, Ceramics and Composites and Fluid Flow and Transfer Processes, having authored 12 papers that have together received 506 indexed citations. Recurring topics across this work include Molecular Junctions and Nanostructures (4 papers), Force Microscopy Techniques and Applications (3 papers) and Copper Interconnects and Reliability (3 papers). The work is most often cited by research in Atomic and Molecular Physics, and Optics (297 citations), Electrochemistry (49 citations) and Electrical and Electronic Engineering (390 citations). J. Hoekstra has collaborated with scholars based in United Kingdom, United States and Germany. Frequent co-authors include Tchavdar N. Todorov, Adrian P. Sutton, Masanori Kohyama, D. Trivich, Bacon Kê, M. J. Cawkwell, Andrew P. Horsfield, G. Kalonji, Hong Yan and Hannes Jónsson. Their work appears in journals such as Physical Review Letters, Physical review. B, Condensed matter and Journal of The Electrochemical Society.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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