J. Haemers

1.1k total citations
35 papers, 920 citations indexed

About

J. Haemers is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Materials Chemistry. According to data from OpenAlex, J. Haemers has authored 35 papers receiving a total of 920 indexed citations (citations by other indexed papers that have themselves been cited), including 25 papers in Electrical and Electronic Engineering, 21 papers in Mechanics of Materials and 10 papers in Materials Chemistry. Recurrent topics in J. Haemers's work include Metal and Thin Film Mechanics (19 papers), Plasma Diagnostics and Applications (16 papers) and Semiconductor materials and devices (10 papers). J. Haemers is often cited by papers focused on Metal and Thin Film Mechanics (19 papers), Plasma Diagnostics and Applications (16 papers) and Semiconductor materials and devices (10 papers). J. Haemers collaborates with scholars based in Belgium, China and Poland. J. Haemers's co-authors include Roger De Gryse, Diederik Depla, Guy Buyle, Stijn Mahieu, Jan Musschoot, J. Vénnik, Karin Eufinger, Christophe Detavernier, Veerle De Bosscher and Wouter Leroy and has published in prestigious journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Journal of Physics D Applied Physics.

In The Last Decade

J. Haemers

35 papers receiving 878 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
J. Haemers Belgium 19 646 489 482 147 119 35 920
Werner Puff Austria 17 439 0.7× 672 1.4× 495 1.0× 49 0.3× 42 0.4× 79 1.1k
T. Szörényi Hungary 15 297 0.5× 447 0.9× 293 0.6× 75 0.5× 257 2.2× 69 760
D. Lubben United States 19 962 1.5× 476 1.0× 208 0.4× 74 0.5× 198 1.7× 38 1.3k
B. Agius France 16 644 1.0× 388 0.8× 153 0.3× 78 0.5× 89 0.7× 63 817
S. Eichler Germany 15 274 0.4× 250 0.5× 306 0.6× 28 0.2× 66 0.6× 40 557
Kevin M. Hubbard United States 15 281 0.4× 571 1.2× 341 0.7× 21 0.1× 140 1.2× 42 886
K. Macák Sweden 12 773 1.2× 1.1k 2.2× 1.2k 2.5× 76 0.5× 254 2.1× 15 1.4k
A. Rahim Forouhi United States 8 673 1.0× 669 1.4× 91 0.2× 109 0.7× 114 1.0× 18 1.1k
Johan Nijs Netherlands 15 665 1.0× 437 0.9× 347 0.7× 10 0.1× 132 1.1× 67 1.1k
Dong-Jin Kim South Korea 16 672 1.0× 505 1.0× 132 0.3× 60 0.4× 17 0.1× 66 955

Countries citing papers authored by J. Haemers

Since Specialization
Citations

This map shows the geographic impact of J. Haemers's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Haemers with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Haemers more than expected).

Fields of papers citing papers by J. Haemers

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. Haemers. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Haemers. The network helps show where J. Haemers may publish in the future.

Co-authorship network of co-authors of J. Haemers

This figure shows the co-authorship network connecting the top 25 collaborators of J. Haemers. A scholar is included among the top collaborators of J. Haemers based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. Haemers. J. Haemers is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Musschoot, Jan, et al.. (2012). Conformality of thermal and plasma enhanced atomic layer deposition on a non-woven fibrous substrate. Surface and Coatings Technology. 206(22). 4511–4517. 27 indexed citations
2.
Musschoot, Jan, Davy Deduytsche, Hilde Poelman, et al.. (2009). Comparison of Thermal and Plasma-Enhanced ALD/CVD of Vanadium Pentoxide. Journal of The Electrochemical Society. 156(7). P122–P122. 69 indexed citations
3.
Musschoot, Jan & J. Haemers. (2009). Qualitative model of the magnetron discharge. Vacuum. 84(4). 488–493. 9 indexed citations
4.
Haemers, J.. (2009). Factionalism and State Power in the Flemish Revolt (1482-1492). Journal of Social History. 42(4). 1009–1039. 4 indexed citations
5.
Depla, Diederik, et al.. (2008). Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering. Journal of Physics D Applied Physics. 41(3). 35203–35203. 18 indexed citations
6.
Depla, Diederik, et al.. (2007). Understanding the discharge voltage behavior during reactive sputtering of oxides. Journal of Applied Physics. 101(1). 156 indexed citations
7.
Musschoot, Jan, Diederik Depla, Guy Buyle, J. Haemers, & Roger De Gryse. (2007). Investigation of the sustaining mechanisms of dc magnetron discharges and consequences forI–Vcharacteristics. Journal of Physics D Applied Physics. 41(1). 15209–15209. 11 indexed citations
8.
Depla, Diederik, J. Haemers, Guy Buyle, & Roger De Gryse. (2006). Hysteresis behavior during reactive magnetron sputtering of Al2O3 using a rotating cylindrical magnetron. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 24(4). 934–938. 31 indexed citations
9.
Depla, Diederik, J. Haemers, & Roger De Gryse. (2006). Discharge voltage measurements during reactive sputtering of oxides. Thin Solid Films. 515(2). 468–471. 31 indexed citations
10.
Depla, Diederik, Guy Buyle, J. Haemers, & Roger De Gryse. (2005). Discharge voltage measurements during magnetron sputtering. Surface and Coatings Technology. 200(14-15). 4329–4338. 98 indexed citations
11.
Buyle, Guy, Diederik Depla, Karin Eufinger, et al.. (2004). Characterization of the Electron Movement in Varying Magnetic Fields and the Resulting Anomalous Erosion. Ghent University Academic Bibliography (Ghent University). 1 indexed citations
12.
Buyle, Guy, Diederik Depla, Karin Eufinger, et al.. (2004). Simplified model for the DC planar magnetron discharge. Vacuum. 74(3-4). 353–358. 25 indexed citations
13.
Buyle, Guy, Veerle De Bosscher, Diederik Depla, et al.. (2003). Recapture of secondary electrons by the target in a DC planar magnetron discharge. Vacuum. 70(1). 29–35. 43 indexed citations
14.
Buyle, Guy, Diederik Depla, Karin Eufinger, J. Haemers, & Roger De Gryse. (2002). Influence of recapture of secondary electrons on the magnetron sputtering deposition process.. Ghent University Academic Bibliography (Ghent University). 1 indexed citations
15.
Haemers, J., et al.. (1998). Chemical instability of the target surface during DC-magnetron sputtering of ITO-coatings. Thin Solid Films. 317(1-2). 405–408. 31 indexed citations
16.
Tomaszewski, H., et al.. (1997). Yttria-stabilized zirconia thin films grown by r.f. magnetron sputtering from an oxide target. Thin Solid Films. 293(1-2). 67–74. 19 indexed citations
17.
Tomaszewski, H., et al.. (1996). Yttria-stabilized zirconia thin films grown by reactive r.f. magnetron sputtering. Thin Solid Films. 287(1-2). 104–109. 23 indexed citations
18.
Poelman, Hilde, et al.. (1993). Statistical analysis of a V2O5/TiO2 model catalyst, prepared by magnetron sputtering. Ghent University Academic Bibliography (Ghent University). 2 indexed citations
19.
Haemers, J.. (1974). A simple modification to the AEI Autospark unit. Journal of Physics E Scientific Instruments. 7(4). 294–296. 3 indexed citations
20.
Haemers, J., et al.. (1973). On the electrical conductivity of V2O5 single crystals. physica status solidi (a). 20(1). 381–386. 83 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by Werner Puff Breakdown of academic impact, for papers by T. Szörényi Breakdown of academic impact, for papers by D. Lubben Breakdown of academic impact, for papers by B. Agius Breakdown of academic impact, for papers by S. Eichler Breakdown of academic impact, for papers by Kevin M. Hubbard Breakdown of academic impact, for papers by K. Macák Breakdown of academic impact, for papers by A. Rahim Forouhi Breakdown of academic impact, for papers by Johan Nijs Breakdown of academic impact, for papers by Dong-Jin Kim
Rankless by CCL
2026