Hushan Cui

719 total citations
19 papers, 426 citations indexed

About

Hushan Cui is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Hushan Cui has authored 19 papers receiving a total of 426 indexed citations (citations by other indexed papers that have themselves been cited), including 15 papers in Electrical and Electronic Engineering, 5 papers in Electronic, Optical and Magnetic Materials and 4 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Hushan Cui's work include Semiconductor materials and devices (12 papers), Advancements in Semiconductor Devices and Circuit Design (9 papers) and Integrated Circuits and Semiconductor Failure Analysis (5 papers). Hushan Cui is often cited by papers focused on Semiconductor materials and devices (12 papers), Advancements in Semiconductor Devices and Circuit Design (9 papers) and Integrated Circuits and Semiconductor Failure Analysis (5 papers). Hushan Cui collaborates with scholars based in China, Sweden and Singapore. Hushan Cui's co-authors include Xiaobin He, Jinjuan Xiang, Junjie Li, Guilei Wang, Henry H. Radamson, Jinbiao Liu, Jiahan Yu, Hong Yang, Xuewei Zhao and Yong Du and has published in prestigious journals such as Nanoscale, IEEE Electron Device Letters and IEEE Transactions on Magnetics.

In The Last Decade

Hushan Cui

19 papers receiving 418 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Hushan Cui China	9	360	111	88	88	50	19	426
Yong Du China	9	343 1.0×	132 1.2×	129 1.5×	127 1.4×	17 0.3×	18	432
Bong Ho Kim South Korea	12	437 1.2×	259 2.3×	49 0.6×	85 1.0×	62 1.2×	70	589
Ben Li China	10	385 1.1×	91 0.8×	112 1.3×	108 1.2×	16 0.3×	19	472
Yu‐Heng Hong Taiwan	14	343 1.0×	130 1.2×	135 1.5×	89 1.0×	92 1.8×	38	490
Jiahan Yu China	12	387 1.1×	220 2.0×	100 1.1×	144 1.6×	13 0.3×	35	505
Hongxiao Lin China	9	388 1.1×	118 1.1×	133 1.5×	138 1.6×	10 0.2×	27	455
Radha Raman Pal India	14	362 1.0×	176 1.6×	129 1.5×	145 1.6×	15 0.3×	51	422
Shubham Tayal India	18	719 2.0×	93 0.8×	26 0.3×	195 2.2×	32 0.6×	71	816
Xiaotian Zhu China	9	172 0.5×	81 0.7×	74 0.8×	84 1.0×	14 0.3×	41	315
N. Mohankumar India	15	638 1.8×	63 0.6×	123 1.4×	116 1.3×	279 5.6×	98	794

Countries citing papers authored by Hushan Cui

Since Specialization

Citations

This map shows the geographic impact of Hushan Cui's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hushan Cui with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hushan Cui more than expected).

Fields of papers citing papers by Hushan Cui

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Hushan Cui. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hushan Cui. The network helps show where Hushan Cui may publish in the future.

Co-authorship network of co-authors of Hushan Cui

This figure shows the co-authorship network connecting the top 25 collaborators of Hushan Cui. A scholar is included among the top collaborators of Hushan Cui based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Hushan Cui. Hushan Cui is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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19 of 19 papers shown

Liu, Jinxi, et al.. (2022). Characterization of Key Enzymes for D-lactic Acid Synthesis in Leuconostoc citreum KM20. Biotechnology and Bioprocess Engineering. 27(6). 921–929. 2 indexed citations

Zhang, Yudong, et al.. (2021). Effect of hydrogen content on dielectric strength of the silicon nitride film deposited by ICP-CVD*. Chinese Physics B. 30(4). 48103–48103. 5 indexed citations

Radamson, Henry H., Huilong Zhu, Zhenhua Wu, et al.. (2020). State of the Art and Future Perspectives in Advanced CMOS Technology. Nanomaterials. 10(8). 1555–1555. 138 indexed citations

Radamson, Henry H., Xiaobin He, Qingzhu Zhang, et al.. (2019). Miniaturization of CMOS. Micromachines. 10(5). 293–293. 89 indexed citations

Cao, Kaihua, Hushan Cui, Kewen Shi, et al.. (2019). All Perpendicular Spin Nano-Oscillators with Composite Free Layer. SPIN. 9(3). 1 indexed citations

Zhang, Yu, Xiaoyang Lin, Jean‐Paul Adam, et al.. (2018). Memristors: Heterogeneous Memristive Devices Enabled by Magnetic Tunnel Junction Nanopillars Surrounded by Resistive Silicon Switches (Adv. Electron. Mater. 3/2018). Advanced Electronic Materials. 4(3). 1 indexed citations

Cao, Kaihua, Wenlong Cai, Lezhi Wang, et al.. (2018). Low-Temperature Performance of Nanoscale Perpendicular Magnetic Tunnel Junctions With Double MgO-Interface Free Layer. IEEE Transactions on Magnetics. 55(3). 1–4. 15 indexed citations

Cao, Kaihua, Wenlong Cai, Hushan Cui, et al.. (2018). In-memory direct processing based on nanoscale perpendicular magnetic tunnel junctions. Nanoscale. 10(45). 21225–21230. 23 indexed citations

Cai, Wenlong, Kaihua Cao, Mengxing Wang, et al.. (2017). Interfacial property tuning of heavy metal/CoFeB for large density STT-MRAM. 1–4. 1 indexed citations

10.

Yin, Huaxiang, Guilei Wang, Xiaolong Ma, et al.. (2017). Study of sigma-shaped source/drain recesses for embedded-SiGe pMOSFETs. Microelectronic Engineering. 181. 22–28. 9 indexed citations

11.

Radamson, Henry H., Yanbo Zhang, Xiaobin He, et al.. (2017). The Challenges of Advanced CMOS Process from 2D to 3D. Applied Sciences. 7(10). 1047–1047. 53 indexed citations

12.

Wang, Guilei, Jinbiao Liu, Huaxiang Yin, et al.. (2016). Process optimizations to recessed e-SiGe source/drain for performance enhancement in 22 nm all-last high-k/metal-gate pMOSFETs. Solid-State Electronics. 123. 38–43. 2 indexed citations

13.

Wang, Guilei, Jun Luo, Hushan Cui, et al.. (2016). Integration of Selective Epitaxial Growth of SiGe/Ge Layers in 14nm Node FinFETs. ECS Transactions. 75(8). 273–279. 3 indexed citations

14.

Liu, Zhaoyang, Sen Huang, Qilong Bao, et al.. (2016). Investigation of the interface between LPCVD-SiNx gate dielectric and III-nitride for AlGaN/GaN MIS-HEMTs. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 34(4). 43 indexed citations

15.

Cui, Hushan, Jun Luo, Jing Xu, et al.. (2015). Investigation of TaN as the wet etch stop layer for HKMG-last integration in the 22 nm and beyond nodes CMOS technology. Vacuum. 119. 185–188. 2 indexed citations

16.

Xiang, Jinjuan, Tingting Li, Yanbo Zhang, et al.. (2015). Investigation of TiAlC by Atomic Layer Deposition as N Type Work Function Metal for FinFET. ECS Journal of Solid State Science and Technology. 4(12). P441–P444. 28 indexed citations

17.

Yang, Tao, Guilei Wang, Qiang Xu, et al.. (2013). ALD W CMP for HKMG. ECS Transactions. 58(9). 49–52. 1 indexed citations

18.

Cui, Hushan, Jing Xu, Jianfeng Gao, et al.. (2013). Evaluation of TaN as the Wet Etch Stop Layer during the 22nm HKMG Gate Last CMOS Integrations. ECS Transactions. 58(6). 111–118. 1 indexed citations

19.

Xu, Jing, Hong Yang, Hushan Cui, et al.. (2013). Impact of TaN as Wet Etch Stop Layer on Device Characteristics for Dual-Metal HKMG Last Integration CMOSFETs. IEEE Electron Device Letters. 34(12). 1488–1490. 9 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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