Gerd Pohlers

741 total citations
35 papers, 650 citations indexed

About

Gerd Pohlers is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Organic Chemistry. According to data from OpenAlex, Gerd Pohlers has authored 35 papers receiving a total of 650 indexed citations (citations by other indexed papers that have themselves been cited), including 24 papers in Electrical and Electronic Engineering, 15 papers in Biomedical Engineering and 14 papers in Organic Chemistry. Recurrent topics in Gerd Pohlers's work include Advancements in Photolithography Techniques (24 papers), Nanofabrication and Lithography Techniques (10 papers) and Photopolymerization techniques and applications (8 papers). Gerd Pohlers is often cited by papers focused on Advancements in Photolithography Techniques (24 papers), Nanofabrication and Lithography Techniques (10 papers) and Photopolymerization techniques and applications (8 papers). Gerd Pohlers collaborates with scholars based in Canada, United States and Germany. Gerd Pohlers's co-authors include J. C. Scaiano, Roger F. Sinta, James F. Cameron, F. Ortica, Robert D. Grober, Peter Hahn, Terrence J. Connolly, Vicente Fornés, Hermenegildo Garcı́a and Eugene N. Step and has published in prestigious journals such as Journal of the American Chemical Society, Physical Review Letters and Chemistry of Materials.

In The Last Decade

Gerd Pohlers

34 papers receiving 627 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Gerd Pohlers Canada	13	305	253	248	163	85	35	650
T. N. Nekrasova Russia	12	273 0.9×	84 0.3×	135 0.5×	65 0.4×	53 0.6×	76	534
Christopher M. Tonge Canada	18	190 0.6×	408 1.6×	539 2.2×	91 0.6×	41 0.5×	24	719
Minmin Tian United States	9	359 1.2×	92 0.4×	145 0.6×	40 0.2×	113 1.3×	15	529
Wânia C. Moreira Brazil	14	74 0.2×	246 1.0×	267 1.1×	114 0.7×	38 0.4×	23	570
Emmanuel Allard France	15	427 1.4×	99 0.4×	500 2.0×	106 0.7×	16 0.2×	33	755
Kevin W. Kittredge United States	12	193 0.6×	118 0.5×	140 0.6×	61 0.4×	20 0.2×	22	454
Uwe Hartnagel Germany	12	339 1.1×	132 0.5×	449 1.8×	78 0.5×	16 0.2×	17	597
Anwei Qin United States	10	348 1.1×	46 0.2×	120 0.5×	163 1.0×	111 1.3×	25	498
Telmo J. V. Prazeres Portugal	14	253 0.8×	29 0.1×	177 0.7×	106 0.7×	57 0.7×	16	484
Andrzej Kaim Poland	13	298 1.0×	141 0.6×	206 0.8×	68 0.4×	13 0.2×	63	528

Countries citing papers authored by Gerd Pohlers

Since Specialization

Citations

This map shows the geographic impact of Gerd Pohlers's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Gerd Pohlers with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Gerd Pohlers more than expected).

Fields of papers citing papers by Gerd Pohlers

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Gerd Pohlers. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Gerd Pohlers. The network helps show where Gerd Pohlers may publish in the future.

Co-authorship network of co-authors of Gerd Pohlers

This figure shows the co-authorship network connecting the top 25 collaborators of Gerd Pohlers. A scholar is included among the top collaborators of Gerd Pohlers based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Gerd Pohlers. Gerd Pohlers is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Scaiano, J. C., et al.. (2004). Mechanism of photoacid generation for an arylcycloalkylsulfonium salt by ring opening and aryl cleavage. Photochemical & Photobiological Sciences. 3(11-12). 1052–1057. 3 indexed citations

Mason, Michael D., Krishanu Ray, Robert D. Grober, Gerd Pohlers, & James F. Cameron. (2004). Single Molecule Acid-Base Kinetics and Thermodynamics. Physical Review Letters. 93(7). 73004–73004. 5 indexed citations

Ray, Krishanu, et al.. (2004). Quantum Yields of Photoacid Generation in 193-nm Chemically Amplified Resists by Fluorescence Imaging Spectroscopy. Chemistry of Materials. 16(26). 5726–5730. 7 indexed citations

Pohlers, Gerd, et al.. (2004). Why do weak acids not work in 193-nm photoresists?: matrix effects on acid-catalyzed deprotection. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5 indexed citations

Pohlers, Gerd, et al.. (2004). Evidence of homolytic and heterolytic pathways in the photodissociation of iminosulfonates and direct detection of the p-toluenesulfonyloxyl radical. Photochemical & Photobiological Sciences. 3(9). 864–869. 15 indexed citations

Barclay, George G., Gerd Pohlers, Kao Xiong, et al.. (2003). Bilayer technology for ArF and F 2 lithography: the development of resists to minimize silicon outgassing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 433–433. 8 indexed citations

Cameron, James F., et al.. (2002). Transparency versus Efficiency: Important Considerations in the Design of Photoacid Generators for ArF Lithography.. Journal of Photopolymer Science and Technology. 15(3). 453–464. 4 indexed citations

Grober, Robert D., et al.. (2002). Calibration and validation of projection lithography focusing by fluorescence detection of latent photoacid images in chemically amplified resist. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(1). 164–166. 1 indexed citations

Pohlers, Gerd, et al.. (2002). Transparency vs. efficiency in 193-nm photoacid generator design. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4690. 178–178. 8 indexed citations

10.

Grober, Robert D., et al.. (2001). On-Wafer Spectrofluorometric Method for Determination of Relative Quantum Yields of Photoacid Generation in Chemically Amplified Resists. Analytical Chemistry. 73(14). 3472–3480. 21 indexed citations

11.

Ortica, F., et al.. (2001). Mechanism of Reaction and Photoacid Generation of N-Oxysuccinimidoarylsulfonate PAGs: A Laser Flash Photolytic Study. Chemistry of Materials. 13(7). 2297–2304. 23 indexed citations

12.

Cameron, James F., et al.. (2001). Performance Tradeoffs in the Design of Photoacid Generators for ArF Lithography.. Journal of Photopolymer Science and Technology. 14(3). 345–356. 5 indexed citations

13.

Kim, Hyunwoo, Sook Lee, Sang-Jun Choi, et al.. (2001). Design and performance of photoresist materials for ArF lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4345. 776–776. 3 indexed citations

14.

Cameron, James F., et al.. (2000). Comparison of methods for acid quantification: impact of resist components on acid-generating efficiency. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 190–190. 8 indexed citations

15.

Ortica, F., et al.. (2000). Laser Flash Photolysis of 2-Diazo-1,3-diphenyl-1,3-propanedione: An Unusual Long-Lived Triplet as a Reaction Intermediate. Organic Letters. 2(10). 1357–1360. 8 indexed citations

16.

Cameron, James F., et al.. (1999). Exploratory approaches to the study of acid diffusion and acid loss from polymer films using absorption and fluorescence spectroscopy. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3678. 1062–1062. 16 indexed citations

17.

Trefonas, Peter, et al.. (1999). Organic antireflective coatings for 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3678. 702–702. 1 indexed citations

18.

Hahn, Peter, Gerd Pohlers, Terrence J. Connolly, et al.. (1998). Intrazeolite Photochemistry. 22. Acid−Base Properties of Coumarin 6. Characterization in Solution, the Solid State, and Incorporated into Supramolecular Systems. The Journal of Physical Chemistry B. 102(30). 5852–5858. 70 indexed citations

19.

Pohlers, Gerd, H. Dreeskamp, & Stefan Grimme. (1996). The mechanism of photochemical CO or CS bond cleavage in aryl (thio) ethers. Journal of Photochemistry and Photobiology A Chemistry. 95(1). 41–49. 11 indexed citations

20.

Pohlers, Gerd, Stefan Grimme, & H. Dreeskamp. (1994). Chemically induced dynamic nuclear polarization and fluorescence spectroscopy studies of the CO bond cleavage of α- and β-1,1-dimethylallyl-naphthylether. Journal of Photochemistry and Photobiology A Chemistry. 79(3). 153–162. 7 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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