Dongqing Pan

832 total citations · 1 hit paper
16 papers, 670 citations indexed

About

Dongqing Pan is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, Dongqing Pan has authored 16 papers receiving a total of 670 indexed citations (citations by other indexed papers that have themselves been cited), including 16 papers in Electrical and Electronic Engineering, 12 papers in Materials Chemistry and 1 paper in Mechanics of Materials. Recurrent topics in Dongqing Pan's work include Semiconductor materials and devices (14 papers), Electronic and Structural Properties of Oxides (11 papers) and Catalytic Processes in Materials Science (8 papers). Dongqing Pan is often cited by papers focused on Semiconductor materials and devices (14 papers), Electronic and Structural Properties of Oxides (11 papers) and Catalytic Processes in Materials Science (8 papers). Dongqing Pan collaborates with scholars based in United States, South Africa and China. Dongqing Pan's co-authors include Tien‐Chien Jen, Peter Ozaveshe Oviroh, Rigardt Alfred Maarten Coetzee, Rokhsareh Akbarzadeh, Chris Yuan, Yuanyuan Xie, Lulu Ma, Dongsheng Guan, Tao Li and Jianyang Li and has published in prestigious journals such as Journal of Cleaner Production, Chemical Engineering Journal and Electrochimica Acta.

In The Last Decade

Dongqing Pan

15 papers receiving 656 citations

Hit Papers

New development of atomic layer deposition: processes, me... 2019 2026 2021 2023 2019 100 200 300
What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

  1. New development of atomic layer deposition: processes, methods and applications
    2019 381 citations Peter Ozaveshe Oviroh, Rokhsareh Akbarzadeh et al. Science and Technology of Advanced Materials profile →

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Dongqing Pan United States 11 524 434 82 81 49 16 670
Joel E. von Treifeldt Australia 10 308 0.6× 342 0.8× 91 1.1× 86 1.1× 62 1.3× 10 522
Rigardt Alfred Maarten Coetzee South Africa 6 290 0.6× 256 0.6× 51 0.6× 79 1.0× 54 1.1× 15 434
Girish Phatak India 14 499 1.0× 424 1.0× 149 1.8× 91 1.1× 35 0.7× 48 715
Janne‐Petteri Niemelä Finland 16 438 0.8× 545 1.3× 53 0.6× 72 0.9× 90 1.8× 27 699
Young-Jin Choi South Korea 13 591 1.1× 539 1.2× 214 2.6× 134 1.7× 38 0.8× 31 834
Yang Cui China 10 319 0.6× 539 1.2× 75 0.9× 104 1.3× 34 0.7× 27 657
Saima Ali Finland 10 322 0.6× 309 0.7× 51 0.6× 65 0.8× 43 0.9× 14 481
Ruvini Dharmadasa United States 16 605 1.2× 434 1.0× 65 0.8× 109 1.3× 61 1.2× 32 700
С. Н. Несов Russia 14 265 0.5× 324 0.7× 97 1.2× 114 1.4× 44 0.9× 74 508

Countries citing papers authored by Dongqing Pan

Since Specialization
Citations

This map shows the geographic impact of Dongqing Pan's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Dongqing Pan with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Dongqing Pan more than expected).

Fields of papers citing papers by Dongqing Pan

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Dongqing Pan. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Dongqing Pan. The network helps show where Dongqing Pan may publish in the future.

Co-authorship network of co-authors of Dongqing Pan

This figure shows the co-authorship network connecting the top 25 collaborators of Dongqing Pan. A scholar is included among the top collaborators of Dongqing Pan based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Dongqing Pan. Dongqing Pan is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

16 of 16 papers shown
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Oviroh, Peter Ozaveshe, Rokhsareh Akbarzadeh, Dongqing Pan, Rigardt Alfred Maarten Coetzee, & Tien‐Chien Jen. (2019). New development of atomic layer deposition: processes, methods and applications. Science and Technology of Advanced Materials. 20(1). 465–496. 381 indexed citations breakdown →
5.
Pan, Dongqing. (2019). Numerical study on the effectiveness of precursor isolation using N2 as gas barrier in spatial atomic layer deposition. International Journal of Heat and Mass Transfer. 144. 118642–118642. 17 indexed citations
6.
Guan, Dongsheng, Lulu Ma, Dongqing Pan, et al.. (2017). Atomic Layer Deposition of Alumina Coatings onto SnS2 for Lithium-Ion Battery Applications. Electrochimica Acta. 242. 117–124. 37 indexed citations
7.
Ma, Lulu, Dongqing Pan, Yuanyuan Xie, Fenfen Wang, & Chris Yuan. (2017). Experimental Study of Process Emissions From Atomic Layer Deposition of Al2O3 Under Various Temperatures and Purge Time. Journal of Manufacturing Science and Engineering. 139(5). 4 indexed citations
8.
Pan, Dongqing, Tien‐Chien Jen, & Chris Yuan. (2016). Effects of gap size, temperature and pumping pressure on the fluid dynamics and chemical kinetics of in-line spatial atomic layer deposition of Al2O3. International Journal of Heat and Mass Transfer. 96. 189–198. 33 indexed citations
9.
Xie, Yuanyuan, Dongqing Pan, Lulu Ma, & Chris Yuan. (2016). Optimizing the process efficiency of atomic layer deposition of alumina for its sustainability improvement: a combined experimental and modeling study. Journal of Cleaner Production. 133. 338–347. 10 indexed citations
10.
Pan, Dongqing, Dongsheng Guan, Tien‐Chien Jen, & Chris Yuan. (2016). Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films. Journal of Manufacturing Science and Engineering. 138(10). 23 indexed citations
11.
Pan, Dongqing. (2016). Numerical and Experimental Studies of Atomic Layer Deposition for Sustainability Improvement. UWM Digital Commons (University of Wisconsin–Milwaukee). 3 indexed citations
12.
Pan, Dongqing, Lulu Ma, Yuanyuan Xie, Tien‐Chien Jen, & Chris Yuan. (2015). On the physical and chemical details of alumina atomic layer deposition: A combined experimental and numerical approach. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 33(2). 51 indexed citations
13.
Pan, Dongqing, Lulu Ma, Yuanyuan Xie, et al.. (2015). Experimental and numerical investigations into the transient multi-wafer batch atomic layer deposition process with vertical and horizontal wafer arrangements. International Journal of Heat and Mass Transfer. 91. 416–427. 20 indexed citations
14.
Ma, Lulu, Dongqing Pan, Yuanyuan Xie, & Chris Yuan. (2015). Atomic layer deposition of Al2O3 process emissions. RSC Advances. 5(17). 12824–12829. 16 indexed citations
15.
Xie, Yuanyuan, Lulu Ma, Dongqing Pan, & Chris Yuan. (2014). Mechanistic modeling of atomic layer deposition of alumina process with detailed surface chemical kinetics. Chemical Engineering Journal. 259. 213–220. 29 indexed citations
16.
Pan, Dongqing, Tao Li, Tien‐Chien Jen, & Chris Yuan. (2013). Numerical modeling of carrier gas flow in atomic layer deposition vacuum reactor: A comparative study of lattice Boltzmann models. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 32(1). 27 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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