David J. Duquette
- Electrical and Electronic Engineering top 10%
- Materials Chemistry
- Electronic, Optical and Magnetic Materials top 10%
- Biomedical Engineering
- Polymers and Plastics top 10%
- Co-authors
- Sunjung KimPulickel M. AjayanK. S. V. SanthanamFrances M. RossR. HullSee Wee CheeKhalid HattarR.J. Gutmann
- Topics
- Copper Interconnects and Reliability (13 papers)Electrodeposition and Electroless Coatings (11 papers)Corrosion Behavior and Inhibition (6 papers)
- Partner nations
- United StatesSingaporeAustralia
In The Last Decade
David J. Duquette
38 papers receiving 620 citations
Peers
Comparison fields: 5 of 49
- Electrical and Electronic Engineering 385
- Materials Chemistry 289
- Electronic, Optical and Magnetic Materials 187
- Biomedical Engineering 131
- Polymers and Plastics 104
Countries citing papers authored by David J. Duquette
This map shows the geographic impact of David J. Duquette's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David J. Duquette with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David J. Duquette more than expected).
Fields of papers citing papers by David J. Duquette
This network shows the impact of papers produced by David J. Duquette. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David J. Duquette. The network helps show where David J. Duquette may publish in the future.
Co-authorship network of co-authors of David J. Duquette
This figure shows the co-authorship network connecting the top 25 collaborators of David J. Duquette. A scholar is included among the top collaborators of David J. Duquette based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with David J. Duquette. David J. Duquette is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 2 | |
| 2 | 9 | |
| 3 | 9 | |
| 4 | 4 | |
| 5 | 18 | |
| 6 | 28 | |
| 7 | 1 | |
| 8 | 4 | |
| 9 | 2 | |
| 10 | 29 | |
| 11 | 7 | |
| 12 | 5 | |
| 13 | 32 | |
| 14 | 28 | |
| 15 | 18 | |
| 16 | 51 | |
| 17 | 16 | |
| 18 | 10 | |
| 19 | 6 | |
| 20 | 8 |
About David J. Duquette
David J. Duquette is a scholar working on Structural Biology, Metals and Alloys and Electronic, Optical and Magnetic Materials, having authored 39 papers that have together received 644 indexed citations. Recurring topics across this work include Copper Interconnects and Reliability (13 papers), Electrodeposition and Electroless Coatings (11 papers) and Corrosion Behavior and Inhibition (6 papers). The work is most often cited by research in Structural Biology (57 citations), Electrochemistry (79 citations) and Electronic, Optical and Magnetic Materials (187 citations). David J. Duquette has collaborated with scholars based in United States, Singapore and Australia. Frequent co-authors include Sunjung Kim, Pulickel M. Ajayan, K. S. V. Santhanam, Frances M. Ross, R. Hull, See Wee Chee, Khalid Hattar, R.J. Gutmann, S. P. Murarka and Christopher A. Apblett. Their work appears in journals such as Advanced Materials, Journal of Applied Physics and Journal of The Electrochemical Society.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.