C.V. Falub
- Materials Chemistry top 10%
- Electrical and Electronic Engineering top 10%
- Atomic and Molecular Physics, and Optics top 5%
- Mechanics of Materials top 5%
- Biomedical Engineering top 10%
- Co-authors
- H. von KänelLeo MiglioFabio IsaE. MüllerRoland HauertGiovanni IsellaG. ThorwarthUlrich Müller
- Topics
- Semiconductor Quantum Structures and Devices (22 papers)Muon and positron interactions and applications (17 papers)Semiconductor materials and devices (14 papers)
- Partner nations
- SwitzerlandItalyCzechia
In The Last Decade
C.V. Falub
75 papers receiving 1.2k citations
Peers
Comparison fields: 5 of 51
- Materials Chemistry 669
- Electrical and Electronic Engineering 608
- Atomic and Molecular Physics, and Optics 447
- Mechanics of Materials 389
- Biomedical Engineering 262
Countries citing papers authored by C.V. Falub
This map shows the geographic impact of C.V. Falub's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C.V. Falub with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C.V. Falub more than expected).
Fields of papers citing papers by C.V. Falub
This network shows the impact of papers produced by C.V. Falub. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C.V. Falub. The network helps show where C.V. Falub may publish in the future.
Co-authorship network of co-authors of C.V. Falub
This figure shows the co-authorship network connecting the top 25 collaborators of C.V. Falub. A scholar is included among the top collaborators of C.V. Falub based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with C.V. Falub. C.V. Falub is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 5 | |
| 2 | 11 | |
| 3 | 7 | |
| 4 | 1 | |
| 5 | 8 | |
| 6 | 20 | |
| 7 | 31 | |
| 8 | 54 | |
| 9 | 14 | |
| 10 | 56 | |
| 11 | 1 | |
| 12 | 38 | |
| 13 | 32 | |
| 14 | 53 | |
| 15 | 4 | |
| 16 | FIBER TEXTURE DEPENDENCE OF THE ANISOTROPIC RESIDUAL STRESS STATE INDUCED BY LATTICE DISTORTION IN ARC-EVAPORATED Ti-Al-N THIN FILMS | 2 |
| 17 | 55 | |
| 18 | 15 | |
| 19 | 24 | |
| 20 | 5 |
About C.V. Falub
C.V. Falub is a scholar working on Atomic and Molecular Physics, and Optics, Mechanics of Materials and Electrical and Electronic Engineering, having authored 76 papers that have together received 1.2k indexed citations. Recurring topics across this work include Semiconductor Quantum Structures and Devices (22 papers), Muon and positron interactions and applications (17 papers) and Semiconductor materials and devices (14 papers). The work is most often cited by research in Structural Biology (25 citations), Mechanics of Materials (389 citations) and Materials Chemistry (669 citations). C.V. Falub has collaborated with scholars based in Switzerland, Italy and Czechia. Frequent co-authors include H. von Känel, Leo Miglio, Fabio Isa, E. Müller, Roland Hauert, Giovanni Isella, G. Thorwarth, Ulrich Müller, Cyril Voisard and Philippe Niedermann. Their work appears in journals such as Science, Advanced Materials and Physical review. B, Condensed matter.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.